JP4336545B2 - 光学部材、当該光学部材を有する照明装置及び露光装置 - Google Patents

光学部材、当該光学部材を有する照明装置及び露光装置 Download PDF

Info

Publication number
JP4336545B2
JP4336545B2 JP2003288567A JP2003288567A JP4336545B2 JP 4336545 B2 JP4336545 B2 JP 4336545B2 JP 2003288567 A JP2003288567 A JP 2003288567A JP 2003288567 A JP2003288567 A JP 2003288567A JP 4336545 B2 JP4336545 B2 JP 4336545B2
Authority
JP
Japan
Prior art keywords
optical member
optical
substrate
microlens
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003288567A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005055798A (ja
JP2005055798A5 (enExample
Inventor
聡 溝内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003288567A priority Critical patent/JP4336545B2/ja
Publication of JP2005055798A publication Critical patent/JP2005055798A/ja
Publication of JP2005055798A5 publication Critical patent/JP2005055798A5/ja
Application granted granted Critical
Publication of JP4336545B2 publication Critical patent/JP4336545B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2003288567A 2003-08-07 2003-08-07 光学部材、当該光学部材を有する照明装置及び露光装置 Expired - Fee Related JP4336545B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003288567A JP4336545B2 (ja) 2003-08-07 2003-08-07 光学部材、当該光学部材を有する照明装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003288567A JP4336545B2 (ja) 2003-08-07 2003-08-07 光学部材、当該光学部材を有する照明装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2005055798A JP2005055798A (ja) 2005-03-03
JP2005055798A5 JP2005055798A5 (enExample) 2006-09-07
JP4336545B2 true JP4336545B2 (ja) 2009-09-30

Family

ID=34367179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003288567A Expired - Fee Related JP4336545B2 (ja) 2003-08-07 2003-08-07 光学部材、当該光学部材を有する照明装置及び露光装置

Country Status (1)

Country Link
JP (1) JP4336545B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4760198B2 (ja) * 2005-08-01 2011-08-31 ソニー株式会社 露光用マスク、露光用マスクの設計方法および露光用マスクの設計プログラム
JP2007279458A (ja) * 2006-04-07 2007-10-25 Miraial Kk サブ波長格子光学素子
JP4384259B2 (ja) 2007-07-23 2009-12-16 パナソニック株式会社 保護膜付きレンズ及びその製造方法
JP2014197166A (ja) * 2013-03-07 2014-10-16 セイコーエプソン株式会社 光学素子、光学素子の製造方法およびプロジェクター

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0241613Y2 (enExample) * 1979-02-01 1990-11-06
JPS60232552A (ja) * 1984-05-02 1985-11-19 Canon Inc 照明光学系
US4709066A (en) * 1985-07-15 1987-11-24 Fused Kontacts Of Chicago Acrylic silicate compositions and methods and highly oxygen-permeable polyacrylates made therefrom
JPS62118379A (ja) * 1985-11-19 1987-05-29 Fujitsu Ltd ホログラムの作成方法
JPH07104563B2 (ja) * 1986-09-24 1995-11-13 株式会社ニコン 露光装置用照明光学装置
JPH0451201A (ja) * 1990-06-19 1992-02-19 Canon Inc 透過型回折格子及び該回折格子を用いたエンコーダ
US5417743A (en) * 1994-01-21 1995-05-23 W. L. Gore & Associates, Inc. Self-adhesive vent filter and adsorbent assembly with a diffusion tube
JP2873573B2 (ja) * 1997-01-13 1999-03-24 協和電機化学株式会社 プロジェクションテレビ用スクリーン板
JP2000147227A (ja) * 1998-11-04 2000-05-26 Canon Inc 回折光学素子及びそれを用いた光学系
JP2000274532A (ja) * 1999-03-25 2000-10-03 Canon Inc シールド方法及び保持方法
JP3335134B2 (ja) * 1999-03-25 2002-10-15 キヤノン株式会社 光学素子
JP2002268147A (ja) * 2001-03-07 2002-09-18 Toppan Printing Co Ltd 透過型スクリーンおよび画像表示装置
JP2002025933A (ja) * 2001-04-04 2002-01-25 Sumitomo Heavy Ind Ltd ビームホモジナイザ及び半導体薄膜作製方法

Also Published As

Publication number Publication date
JP2005055798A (ja) 2005-03-03

Similar Documents

Publication Publication Date Title
JP4497968B2 (ja) 照明装置、露光装置及びデバイス製造方法
JP4545874B2 (ja) 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
JP2006222222A (ja) 投影光学系及びそれを有する露光装置
JP4095376B2 (ja) 露光装置及び方法、並びに、デバイス製造方法
US8085384B2 (en) Exposure apparatus
JP4332460B2 (ja) 照明光学系及び当該照明光学系を有する露光装置
JP3984950B2 (ja) 照明光学系及びそれを有する露光装置
JP2006245157A (ja) 露光方法及び露光装置
JP2005243953A (ja) 露光装置及び方法
US20040218164A1 (en) Exposure apparatus
JP4336545B2 (ja) 光学部材、当該光学部材を有する照明装置及び露光装置
JP4838430B2 (ja) 露光装置及びデバイス製造方法
JP2004207709A (ja) 露光方法及び装置
JP2008218653A (ja) 露光装置及びデバイス製造方法
JP3958122B2 (ja) 照明装置、およびそれを用いた露光装置、デバイス製造方法
JP2006245270A (ja) 露光装置及び露光方法
JP2006245115A (ja) 露光方法及び装置
JP2005209769A (ja) 露光装置
JP2007242775A (ja) 露光装置及びデバイス製造方法
JP3673731B2 (ja) 露光装置及び方法
JP4235410B2 (ja) 露光方法
JP2006080444A (ja) 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2005310942A (ja) 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP2002217083A (ja) 照明装置及び露光装置
JP4566722B2 (ja) 測定方法及び測定装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060725

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060725

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080925

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081007

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081126

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090331

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090529

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090623

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090629

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120703

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees