JP4328570B2 - レジスト組成物及びそれを用いたパターン形成方法 - Google Patents

レジスト組成物及びそれを用いたパターン形成方法 Download PDF

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Publication number
JP4328570B2
JP4328570B2 JP2003185174A JP2003185174A JP4328570B2 JP 4328570 B2 JP4328570 B2 JP 4328570B2 JP 2003185174 A JP2003185174 A JP 2003185174A JP 2003185174 A JP2003185174 A JP 2003185174A JP 4328570 B2 JP4328570 B2 JP 4328570B2
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group
same
general formula
different
acid
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Japanese (ja)
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JP2004086188A (ja
JP2004086188A5 (enExample
Inventor
表 高橋
一良 水谷
浩司 白川
昭一郎 安波
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2003185174A priority Critical patent/JP4328570B2/ja
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  • Materials For Photolithography (AREA)
JP2003185174A 2002-06-28 2003-06-27 レジスト組成物及びそれを用いたパターン形成方法 Expired - Fee Related JP4328570B2 (ja)

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JP2003185174A JP4328570B2 (ja) 2002-06-28 2003-06-27 レジスト組成物及びそれを用いたパターン形成方法

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Application Number Priority Date Filing Date Title
JP2002190581 2002-06-28
JP2003185174A JP4328570B2 (ja) 2002-06-28 2003-06-27 レジスト組成物及びそれを用いたパターン形成方法

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JP2004086188A JP2004086188A (ja) 2004-03-18
JP2004086188A5 JP2004086188A5 (enExample) 2006-06-15
JP4328570B2 true JP4328570B2 (ja) 2009-09-09

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JP2003185174A Expired - Fee Related JP4328570B2 (ja) 2002-06-28 2003-06-27 レジスト組成物及びそれを用いたパターン形成方法

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005274594A (ja) * 2004-03-22 2005-10-06 Canon Inc 感光性樹脂組成物及びレジストパターンの形成方法
JP4474256B2 (ja) 2004-09-30 2010-06-02 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60203629A (ja) * 1984-03-29 1985-10-15 Toshiba Corp 光重合性エポキシ樹脂組成物
CA2187046A1 (fr) * 1996-10-03 1998-04-03 Alain Vallee Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
JP3632395B2 (ja) * 1997-09-03 2005-03-23 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4132642B2 (ja) * 1999-11-15 2008-08-13 東京応化工業株式会社 ネガ型レジスト基材及びそれを用いたイオン注入基板の製造方法
JP4253427B2 (ja) * 2000-09-19 2009-04-15 富士フイルム株式会社 ポジ型レジスト組成物
EP1308781A3 (en) * 2001-10-05 2003-09-03 Shipley Co. L.L.C. Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them
JP2003177543A (ja) * 2002-09-30 2003-06-27 Oki Electric Ind Co Ltd レジストパターンの形成方法

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JP2004086188A (ja) 2004-03-18

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