JP4298067B2 - 光学薄膜の成膜方法 - Google Patents

光学薄膜の成膜方法 Download PDF

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Publication number
JP4298067B2
JP4298067B2 JP17620999A JP17620999A JP4298067B2 JP 4298067 B2 JP4298067 B2 JP 4298067B2 JP 17620999 A JP17620999 A JP 17620999A JP 17620999 A JP17620999 A JP 17620999A JP 4298067 B2 JP4298067 B2 JP 4298067B2
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Japan
Prior art keywords
thin film
niobium
evaporation source
optical thin
niobium pentoxide
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP17620999A
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Japanese (ja)
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JP2001003157A (ja
JP2001003157A5 (enExample
Inventor
時子 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Canon Optron Inc
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Canon Inc
Canon Optron Inc
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Priority to JP17620999A priority Critical patent/JP4298067B2/ja
Publication of JP2001003157A publication Critical patent/JP2001003157A/ja
Publication of JP2001003157A5 publication Critical patent/JP2001003157A5/ja
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Publication of JP4298067B2 publication Critical patent/JP4298067B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
JP17620999A 1999-06-23 1999-06-23 光学薄膜の成膜方法 Expired - Lifetime JP4298067B2 (ja)

Priority Applications (1)

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JP17620999A JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17620999A JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

Publications (3)

Publication Number Publication Date
JP2001003157A JP2001003157A (ja) 2001-01-09
JP2001003157A5 JP2001003157A5 (enExample) 2005-10-20
JP4298067B2 true JP4298067B2 (ja) 2009-07-15

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JP17620999A Expired - Lifetime JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7655214B2 (en) * 2003-02-26 2010-02-02 Cabot Corporation Phase formation of oxygen reduced valve metal oxides and granulation methods
DE102004049996A1 (de) * 2004-10-14 2006-04-20 Merck Patent Gmbh Aufdampfmaterial zur Herstellung hochbrechender Schichten
JP5284821B2 (ja) * 2008-03-03 2013-09-11 東邦チタニウム株式会社 金属酸化物蒸着材、その製造方法、および金属酸化物蒸着膜の製造方法
CN116282950B (zh) * 2023-03-17 2024-11-22 有研资源环境技术研究院(北京)有限公司 一种多元光学镀膜材料、制备方法及其应用

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JP2001003157A (ja) 2001-01-09

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