JP4259871B2 - ヒドロキシプロピルセルロースのアリールウレタン類を含む熱硬化性の反射防止コーティング - Google Patents
ヒドロキシプロピルセルロースのアリールウレタン類を含む熱硬化性の反射防止コーティング Download PDFInfo
- Publication number
- JP4259871B2 JP4259871B2 JP2002570012A JP2002570012A JP4259871B2 JP 4259871 B2 JP4259871 B2 JP 4259871B2 JP 2002570012 A JP2002570012 A JP 2002570012A JP 2002570012 A JP2002570012 A JP 2002570012A JP 4259871 B2 JP4259871 B2 JP 4259871B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- composition
- isocyanates
- polymer
- antireflective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000006117 anti-reflective coating Substances 0.000 title description 27
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 title description 10
- 239000001863 hydroxypropyl cellulose Substances 0.000 title description 10
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 title description 10
- 229920001187 thermosetting polymer Polymers 0.000 title description 2
- 239000000203 mixture Substances 0.000 claims description 55
- 229920000642 polymer Polymers 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 24
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 23
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 19
- 239000012948 isocyanate Substances 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 230000003667 anti-reflective effect Effects 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- -1 aryl isocyanate Chemical class 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 10
- 229920013821 hydroxy alkyl cellulose Polymers 0.000 claims description 9
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical class O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 claims description 9
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 8
- SUVCZZADQDCIEQ-UHFFFAOYSA-N 1-isocyanato-2-methoxybenzene Chemical class COC1=CC=CC=C1N=C=O SUVCZZADQDCIEQ-UHFFFAOYSA-N 0.000 claims description 7
- JRVZITODZAQRQM-UHFFFAOYSA-N 1-isocyanato-2-nitrobenzene Chemical class [O-][N+](=O)C1=CC=CC=C1N=C=O JRVZITODZAQRQM-UHFFFAOYSA-N 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- YDNLNVZZTACNJX-UHFFFAOYSA-N isocyanatomethylbenzene Chemical class O=C=NCC1=CC=CC=C1 YDNLNVZZTACNJX-UHFFFAOYSA-N 0.000 claims description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000003431 cross linking reagent Substances 0.000 claims description 6
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims description 6
- 150000002513 isocyanates Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 239000000178 monomer Substances 0.000 claims description 5
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical compound NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229940070891 pyridium Drugs 0.000 claims description 4
- 229920003180 amino resin Polymers 0.000 claims description 3
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 claims description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000009835 boiling Methods 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002243 precursor Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 46
- 229910052757 nitrogen Inorganic materials 0.000 description 23
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 16
- 238000003756 stirring Methods 0.000 description 12
- 239000011324 bead Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 10
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229940116333 ethyl lactate Drugs 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 6
- 239000004744 fabric Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 239000000779 smoke Substances 0.000 description 5
- 239000012456 homogeneous solution Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 3
- 206010001513 AIDS related complex Diseases 0.000 description 2
- 239000004971 Cross linker Substances 0.000 description 2
- 210000002945 adventitial reticular cell Anatomy 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 0 CC1C(*)OC(C)C(*)C1* Chemical compound CC1C(*)OC(C)C(*)C1* 0.000 description 1
- 229920003274 CYMEL® 303 LF Polymers 0.000 description 1
- 229920002274 Nalgene Polymers 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- LYRXFNHHSHZWNG-UHFFFAOYSA-N butanoic acid;4-methylbenzenesulfonic acid Chemical compound CCCC(O)=O.CC1=CC=C(S(O)(=O)=O)C=C1 LYRXFNHHSHZWNG-UHFFFAOYSA-N 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- ZVGNESXIJDCBKN-KFGPIHIUSA-N fidaxomicin Chemical compound O([C@@H]1[C@@H](C)O[C@H]([C@H]([C@H]1O)OC)OCC\1=C/C=C/C[C@H](O)/C(C)=C/[C@@H]([C@H](/C(C)=C/C(/C)=C/CC(OC/1=O)[C@@H](C)O)O[C@H]1[C@H]([C@@H](O)[C@H](OC(=O)C(C)C)C(C)(C)O1)O)CC)C(=O)C1=C(O)C(Cl)=C(O)C(Cl)=C1CC ZVGNESXIJDCBKN-KFGPIHIUSA-N 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D101/00—Coating compositions based on cellulose, modified cellulose, or cellulose derivatives
- C09D101/08—Cellulose derivatives
- C09D101/10—Esters of organic acids
- C09D101/14—Mixed esters, e.g. cellulose acetate-butyrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/64—Macromolecular compounds not provided for by groups C08G18/42 - C08G18/63
- C08G18/6484—Polysaccharides and derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/71—Monoisocyanates or monoisothiocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/71—Monoisocyanates or monoisothiocyanates
- C08G18/714—Monoisocyanates or monoisothiocyanates containing nitrogen in addition to isocyanate or isothiocyanate nitrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/798,178 US6576408B2 (en) | 1998-04-29 | 2001-03-02 | Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose |
| PCT/US2002/005658 WO2002071155A1 (en) | 2001-03-02 | 2002-02-22 | Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004519541A JP2004519541A (ja) | 2004-07-02 |
| JP2004519541A5 JP2004519541A5 (enExample) | 2009-01-29 |
| JP4259871B2 true JP4259871B2 (ja) | 2009-04-30 |
Family
ID=25172722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002570012A Expired - Fee Related JP4259871B2 (ja) | 2001-03-02 | 2002-02-22 | ヒドロキシプロピルセルロースのアリールウレタン類を含む熱硬化性の反射防止コーティング |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6576408B2 (enExample) |
| EP (1) | EP1370910A4 (enExample) |
| JP (1) | JP4259871B2 (enExample) |
| KR (1) | KR100891046B1 (enExample) |
| WO (1) | WO2002071155A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU5600200A (en) | 1999-06-10 | 2001-01-02 | Allied-Signal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US7132219B2 (en) * | 2001-02-02 | 2006-11-07 | Brewer Science Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| CN1606713B (zh) | 2001-11-15 | 2011-07-06 | 霍尼韦尔国际公司 | 用于照相平版印刷术的旋涂抗反射涂料 |
| TWI360726B (en) | 2003-10-30 | 2012-03-21 | Nissan Chemical Ind Ltd | Sublayer coating-forming composition containing de |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US7939131B2 (en) | 2004-08-16 | 2011-05-10 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
| WO2006049046A1 (ja) | 2004-11-01 | 2006-05-11 | Nissan Chemical Industries, Ltd. | シクロデキストリン化合物を含有するリソグラフィー用下層膜形成組成物 |
| JP4832955B2 (ja) * | 2005-06-07 | 2011-12-07 | 信越化学工業株式会社 | レジスト下層膜材料並びにそれを用いたパターン形成方法 |
| US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| KR101562094B1 (ko) * | 2012-12-28 | 2015-10-20 | 제일모직주식회사 | 셀룰로오스계 수지 및 그 제조방법 |
| JP6395356B2 (ja) * | 2013-08-30 | 2018-09-26 | 国立大学法人 大分大学 | 液晶性を備えたセルロース誘導体、及び、液晶性を備えたセルロース誘導体の製造方法、並びに、同セルロース誘導体を含有する樹脂材料 |
| EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| CN110183698B (zh) * | 2019-06-28 | 2021-11-16 | 陕西科技大学 | 一种hec/cnc/聚多异氰酸酯复合膜及其制备方法和应用 |
| CN111171162B (zh) * | 2020-01-13 | 2020-12-04 | 福建农林大学 | 一种纤维素电子传输聚合物及其制备方法和应用 |
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|---|---|---|---|---|
| DE1669394A1 (de) | 1965-09-28 | 1969-06-04 | Eastman Kodak Co | Verfahren zur Herstellung von Faeden,Borsten,Folien u.dgl.aus Celluloseestern |
| US3661619A (en) | 1969-04-17 | 1972-05-09 | Frye Ind Inc | Printing process employing moisture |
| US4133783A (en) | 1974-10-30 | 1979-01-09 | Eastman Kodak Company | Thermosetting cellulose ester powder coating composition |
| US4007144A (en) | 1976-02-27 | 1977-02-08 | Eastman Kodak Company | Thermosetting cellulose ester powder coating compositions |
| DE3107741A1 (de) * | 1981-02-28 | 1982-09-16 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignete mehrschichten-elemente sowie verfahren zu ihrer herstellung |
| US4910122A (en) | 1982-09-30 | 1990-03-20 | Brewer Science, Inc. | Anti-reflective coating |
| CA1264880A (en) | 1984-07-06 | 1990-01-23 | John Brooke Gardiner | Viscosity index improver - dispersant additive useful in oil compositions |
| US5674648A (en) | 1984-08-06 | 1997-10-07 | Brewer Science, Inc. | Anti-reflective coating |
| US4656202A (en) | 1985-08-28 | 1987-04-07 | Reliance Universal, Inc. | Acrylated cellulosic furniture coatings |
| US4861629A (en) | 1987-12-23 | 1989-08-29 | Hercules Incorporated | Polyfunctional ethylenically unsaturated cellulosic polymer-based photocurable compositions |
| US4855184A (en) | 1988-02-02 | 1989-08-08 | Minnesota Mining And Manufacturing Company | Radiation-curable protective coating composition |
| US5010155A (en) * | 1988-09-28 | 1991-04-23 | Ciba-Geigy Corporation | Vinyl-urethane substituted hydroxyethyl cellulose |
| US5140086A (en) | 1988-11-25 | 1992-08-18 | Weyerhaeuser Company | Isocyanate modified cellulose products and method for their manufacture |
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| US5094765A (en) | 1990-04-30 | 1992-03-10 | Texaco Inc. | Lubricating oil composition |
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| US5382495A (en) | 1991-05-01 | 1995-01-17 | Rexham Graphics, Inc. | Overcoats for diazo-containing layers with chemicals and abrasion resistance |
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| US5234990A (en) | 1992-02-12 | 1993-08-10 | Brewer Science, Inc. | Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography |
| US5578676A (en) | 1992-02-12 | 1996-11-26 | Flaim; Tony | Method for making polymers with intrinsic light-absorbing properties |
| DE4205281A1 (de) * | 1992-02-21 | 1993-08-26 | Wolff Walsrode Ag | Verfahren zur herstellung von ammoniumgruppen enthaltenden polymeren |
| JP2694097B2 (ja) | 1992-03-03 | 1997-12-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 反射防止コーティング組成物 |
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| JP3198184B2 (ja) | 1993-02-02 | 2001-08-13 | 株式会社ジェーシービー | 磁気ストライプ付きプラスチックカード |
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| US5731385A (en) | 1993-12-16 | 1998-03-24 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| AU1733695A (en) | 1994-01-25 | 1995-08-08 | Eastern Michigan University | Polymeric vehicle for high solids coatings |
| US5597868A (en) | 1994-03-04 | 1997-01-28 | Massachusetts Institute Of Technology | Polymeric anti-reflective compounds |
| US5607824A (en) | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
| US5688987A (en) | 1994-11-09 | 1997-11-18 | Brewer Science, Inc. | Non-subliming Mid-UV dyes and ultra-thin organic arcs having differential solubility |
| US5693691A (en) | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| DE19613990A1 (de) * | 1996-04-09 | 1997-10-16 | Wolff Walsrode Ag | Thermoplastischer Werkstoff bestehend aus aliphatischen Carbamidsäurederivaten von Polysacchariden und niedermolekularen Harnstoffderivaten sowie ein Verfahren zu dessen Herstellung und Verwendung desselben |
| US5652297A (en) | 1996-08-16 | 1997-07-29 | Hoechst Celanese Corporation | Aqueous antireflective coatings for photoresist compositions |
| TW473653B (en) | 1997-05-27 | 2002-01-21 | Clariant Japan Kk | Composition for anti-reflective film or photo absorption film and compound used therein |
| EP0909766A3 (de) * | 1997-10-15 | 1999-09-29 | Borchers GmbH | Urethan-modifizierte nichtionische Cellulosen, ein Verfahren zu deren Herstellung und deren Verwendung als verdickend wirkendes Zusatzmittel |
| KR100281903B1 (ko) * | 1998-12-24 | 2001-03-02 | 윤종용 | 백본이 환상 구조를가지는 감광성 폴리머 및 이를 포함하는 레지스트 조성물 |
-
2001
- 2001-03-02 US US09/798,178 patent/US6576408B2/en not_active Expired - Fee Related
-
2002
- 2002-02-22 EP EP02717502A patent/EP1370910A4/en not_active Withdrawn
- 2002-02-22 WO PCT/US2002/005658 patent/WO2002071155A1/en not_active Ceased
- 2002-02-22 KR KR1020037011458A patent/KR100891046B1/ko not_active Expired - Fee Related
- 2002-02-22 JP JP2002570012A patent/JP4259871B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1370910A4 (en) | 2004-09-15 |
| WO2002071155A1 (en) | 2002-09-12 |
| KR20040030522A (ko) | 2004-04-09 |
| KR100891046B1 (ko) | 2009-03-31 |
| EP1370910A1 (en) | 2003-12-17 |
| US6576408B2 (en) | 2003-06-10 |
| JP2004519541A (ja) | 2004-07-02 |
| US20010031428A1 (en) | 2001-10-18 |
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