JP4256902B2 - 荷電粒子用モノクロメータ - Google Patents
荷電粒子用モノクロメータ Download PDFInfo
- Publication number
- JP4256902B2 JP4256902B2 JP2007330812A JP2007330812A JP4256902B2 JP 4256902 B2 JP4256902 B2 JP 4256902B2 JP 2007330812 A JP2007330812 A JP 2007330812A JP 2007330812 A JP2007330812 A JP 2007330812A JP 4256902 B2 JP4256902 B2 JP 4256902B2
- Authority
- JP
- Japan
- Prior art keywords
- monochromator
- wien
- magnetic
- wien filter
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/284—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer
- H01J49/286—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter
- H01J49/288—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter using crossed electric and magnetic fields perpendicular to the beam, e.g. Wien filter
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
Description
Journal of Physicsの論文E: Scienfique Instruments Volume 3 (1970)、第121頁以下 Tanaka, Institute of Physics Conferences寄稿論文 シリーズ番号165,シンポジウム6,第217〜218頁 Tanaka, Institute of Physics Conferences寄稿論文 シリーズ番号165,シンポジウム6,第211および212頁
Claims (4)
- 少なくとも1つのウィーンフィルタを有する荷電粒子用モノクロメータにおいて、
該ウィーンフィルタは、光軸周りの90°の回動に対して相互に対称な位置に構成される4つの磁極片セグメントを含み、該磁極片セグメントには、それぞれ磁気コイルおよび電気的コンタクト部が設けられ、電流を流す前記磁気コイルを選択しまた電圧を加える前記電気的コンタクト部を選択することにより、前記ウィーンフィルタの磁気双極子を規定する磁極片と、電気双極子を規定する電極とを前記光軸の周りに90°ステップで回転可能であるように構成したことを特徴とするモノクロメータ。 - 前記磁極片と前記電極とが、軟磁性材料からなる請求項1に記載のモノクロメータ。
- 電気的な絶縁部が、各々の前記磁極片セグメントの間に設けられている請求項1または2に記載のモノクロメータ。
- 前記磁極片および前記電極は、それぞれ相互に対向する同心の部分球面または同軸の部分円筒面として構成される面を有する請求項1〜3のいずれか1項に記載のモノクロメータ。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10061798A DE10061798A1 (de) | 2000-12-12 | 2000-12-12 | Monochromator für geladene Teilchen |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001378406A Division JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008098184A JP2008098184A (ja) | 2008-04-24 |
JP4256902B2 true JP4256902B2 (ja) | 2009-04-22 |
Family
ID=7666780
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001378406A Expired - Fee Related JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
JP2007330812A Expired - Fee Related JP4256902B2 (ja) | 2000-12-12 | 2007-12-21 | 荷電粒子用モノクロメータ |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001378406A Expired - Fee Related JP4089774B2 (ja) | 2000-12-12 | 2001-12-12 | 荷電粒子用モノクロメータ |
Country Status (5)
Country | Link |
---|---|
US (1) | US6580073B2 (ja) |
EP (1) | EP1220292B1 (ja) |
JP (2) | JP4089774B2 (ja) |
CZ (1) | CZ302133B6 (ja) |
DE (2) | DE10061798A1 (ja) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0662819U (ja) * | 1993-02-16 | 1994-09-06 | 三栄源エフ・エフ・アイ株式会社 | カードホルダー |
JP4074185B2 (ja) * | 2002-12-17 | 2008-04-09 | 日本電子株式会社 | エネルギーフィルタ及び電子顕微鏡 |
CA2525777A1 (en) * | 2003-06-02 | 2004-12-16 | Fox Chase Cancer Center | High energy polyenergetic ion selection systems, ion beam therapy systems, and ion beam treatment centers |
EP1517353B1 (en) * | 2003-09-11 | 2008-06-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam energy width reduction system for charged particle beam system |
EP1517354B1 (en) * | 2003-09-11 | 2008-05-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Double stage charged particle beam energy width reduction system for charged particle beam system |
GB2406704B (en) * | 2003-09-30 | 2007-02-07 | Ims Nanofabrication Gmbh | Particle-optic electrostatic lens |
EP1610358B1 (en) * | 2004-06-21 | 2008-08-27 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Aberration correction device and method for operating same |
DE102004048496B4 (de) * | 2004-10-05 | 2008-04-30 | Bruker Daltonik Gmbh | Ionenführung mit HF-Blendenstapeln |
US7164139B1 (en) * | 2005-02-01 | 2007-01-16 | Kla-Tencor Technologies Corporation | Wien filter with reduced chromatic aberration |
US20090212213A1 (en) * | 2005-03-03 | 2009-08-27 | Ebara Corporation | Projection electron beam apparatus and defect inspection system using the apparatus |
EP1739714B1 (en) * | 2005-03-08 | 2012-04-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Imaging apparatus for high probe currents |
TW200700717A (en) * | 2005-03-22 | 2007-01-01 | Ebara Corp | Electron beam device |
US8067732B2 (en) * | 2005-07-26 | 2011-11-29 | Ebara Corporation | Electron beam apparatus |
JP2007242490A (ja) * | 2006-03-10 | 2007-09-20 | Ebara Corp | 荷電粒子線光学系用の収差補正光学装置及び光学系 |
JP4795847B2 (ja) * | 2006-05-17 | 2011-10-19 | 株式会社日立ハイテクノロジーズ | 電子レンズ及びそれを用いた荷電粒子線装置 |
JP2007335125A (ja) * | 2006-06-13 | 2007-12-27 | Ebara Corp | 電子線装置 |
JP4920385B2 (ja) * | 2006-11-29 | 2012-04-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法 |
DE102007024353B4 (de) * | 2007-05-24 | 2009-04-16 | Ceos Corrected Electron Optical Systems Gmbh | Monochromator und Strahlquelle mit Monochromator |
EP2385542B1 (en) * | 2010-05-07 | 2013-01-02 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with dispersion compensation, and method of operating same |
US8294093B1 (en) | 2011-04-15 | 2012-10-23 | Fei Company | Wide aperature wien ExB mass filter |
US8283629B1 (en) * | 2011-04-15 | 2012-10-09 | Fei Company | Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam |
US8835866B2 (en) | 2011-05-19 | 2014-09-16 | Fei Company | Method and structure for controlling magnetic field distributions in an ExB Wien filter |
US8274046B1 (en) | 2011-05-19 | 2012-09-25 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
US8592761B2 (en) | 2011-05-19 | 2013-11-26 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
US9053900B2 (en) * | 2012-04-03 | 2015-06-09 | Kla-Tencor Corporation | Apparatus and methods for high-resolution electron beam imaging |
US9443696B2 (en) | 2014-05-25 | 2016-09-13 | Kla-Tencor Corporation | Electron beam imaging with dual Wien-filter monochromator |
KR101633978B1 (ko) | 2014-06-20 | 2016-06-28 | 한국표준과학연구원 | 모노크로메이터 및 이를 구비한 하전입자빔 장치 |
TWI506666B (zh) * | 2014-08-08 | 2015-11-01 | Nat Univ Tsing Hua | 桌上型電子顯微鏡及其複合多極-聚焦可調式磁透鏡 |
US10090131B2 (en) * | 2016-12-07 | 2018-10-02 | Kla-Tencor Corporation | Method and system for aberration correction in an electron beam system |
JP6964531B2 (ja) * | 2018-02-14 | 2021-11-10 | 株式会社荏原製作所 | ウィーンフィルタ、電子光学装置 |
JP6914993B2 (ja) * | 2019-06-25 | 2021-08-04 | 日本電子株式会社 | モノクロメーターおよび荷電粒子線装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0470299B1 (en) * | 1990-08-08 | 1996-06-26 | Koninklijke Philips Electronics N.V. | Energy filter for charged particle beam apparatus |
US5097126A (en) * | 1990-09-25 | 1992-03-17 | Gatan, Inc. | High resolution electron energy loss spectrometer |
US6111253A (en) * | 1997-09-01 | 2000-08-29 | Jeol Ltd. | Transmission electron microscope |
EP1068630B1 (de) * | 1998-03-10 | 2005-07-20 | Erik Essers | Rasterelektronenmikroskop |
-
2000
- 2000-12-12 DE DE10061798A patent/DE10061798A1/de not_active Withdrawn
-
2001
- 2001-11-14 EP EP01126990A patent/EP1220292B1/de not_active Expired - Lifetime
- 2001-11-14 DE DE50113859T patent/DE50113859D1/de not_active Expired - Lifetime
- 2001-12-07 CZ CZ20014398A patent/CZ302133B6/cs not_active IP Right Cessation
- 2001-12-12 JP JP2001378406A patent/JP4089774B2/ja not_active Expired - Fee Related
- 2001-12-12 US US10/012,512 patent/US6580073B2/en not_active Expired - Lifetime
-
2007
- 2007-12-21 JP JP2007330812A patent/JP4256902B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1220292B1 (de) | 2008-04-16 |
JP4089774B2 (ja) | 2008-05-28 |
US20020104966A1 (en) | 2002-08-08 |
US6580073B2 (en) | 2003-06-17 |
EP1220292A3 (de) | 2005-03-16 |
CZ20014398A3 (cs) | 2002-07-17 |
JP2008098184A (ja) | 2008-04-24 |
DE10061798A1 (de) | 2002-06-13 |
CZ302133B6 (cs) | 2010-11-03 |
JP2002214396A (ja) | 2002-07-31 |
DE50113859D1 (de) | 2008-05-29 |
EP1220292A2 (de) | 2002-07-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4256902B2 (ja) | 荷電粒子用モノクロメータ | |
US5449914A (en) | Imaging electron energy filter | |
US6191423B1 (en) | Correction device for correcting the spherical aberration in particle-optical apparatus | |
US9793088B2 (en) | Two-stage dodecapole aberration corrector for charged-particle beam | |
JP4368381B2 (ja) | 荷電粒子ビーム系用の荷電粒子ビームエネルギー幅低減系 | |
JP6224717B2 (ja) | 荷電粒子ビーム装置 | |
JP5826529B2 (ja) | スピン回転装置 | |
JP4133602B2 (ja) | 荷電粒子ビーム装置における収差補正方法および荷電粒子ビーム装置 | |
JP2009054581A (ja) | 荷電粒子ビーム用軌道補正器、及び、荷電粒子ビーム装置 | |
TWI788801B (zh) | 具有用於獨立聚焦多重個別粒子束的多極透鏡序列之粒子束系統,其用途及相關方法 | |
JP3899317B2 (ja) | 粒子ビーム装置のための偏向システム | |
JP4642966B2 (ja) | 粒子線装置 | |
JP4705812B2 (ja) | 収差補正装置を備えた荷電粒子ビーム装置 | |
JP4023556B2 (ja) | 間隙状の開孔横断面を有している電子光学レンズ装置 | |
Tsuno et al. | Third‐order aberration theory of Wien filters for monochromators and aberration correctors | |
JP4741181B2 (ja) | 粒子ビームのスリット・レンズの配列 | |
Tsuno et al. | Simulation of electron trajectories of Wien filter for high-resolution EELS installed in TEM | |
Plies et al. | Proposal of a novel highly symmetric Wien filter monochromator | |
Martı́nez et al. | Design of Wien filters with high resolution | |
JP3040245B2 (ja) | ウィーンフィルタ | |
JP2004214156A (ja) | 荷電粒子線用多極子レンズ、荷電粒子線用多極子レンズの使用方法及び荷電粒子線装置 | |
JPH1196955A (ja) | 並行検出型エネルギー損失分析器 | |
JP2002190273A (ja) | 電磁界重畳セクター型質量分析装置 | |
JPH0575280B2 (ja) | ||
JP2004079343A (ja) | 磁界型エネルギーフィルタ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080121 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080121 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080619 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20080730 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20080917 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20080917 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080918 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20080925 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20080925 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090106 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090130 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120206 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120206 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130206 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130206 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140206 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |