JP4254823B2 - 反応装置及び電子機器 - Google Patents

反応装置及び電子機器 Download PDF

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Publication number
JP4254823B2
JP4254823B2 JP2006233849A JP2006233849A JP4254823B2 JP 4254823 B2 JP4254823 B2 JP 4254823B2 JP 2006233849 A JP2006233849 A JP 2006233849A JP 2006233849 A JP2006233849 A JP 2006233849A JP 4254823 B2 JP4254823 B2 JP 4254823B2
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Prior art keywords
film
insulating film
fuel
metal substrate
oxygen
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Expired - Fee Related
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JP2006233849A
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Japanese (ja)
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JP2008056521A5 (https=
JP2008056521A (ja
Inventor
哲史 石川
剛司 藤田
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Casio Computer Co Ltd
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Casio Computer Co Ltd
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Priority to JP2006233849A priority Critical patent/JP4254823B2/ja
Priority to JP2006267832A priority patent/JP4466629B2/ja
Priority to JP2007133587A priority patent/JP4508212B2/ja
Priority to US11/893,277 priority patent/US8097301B2/en
Priority to KR1020070083183A priority patent/KR100970048B1/ko
Publication of JP2008056521A publication Critical patent/JP2008056521A/ja
Publication of JP2008056521A5 publication Critical patent/JP2008056521A5/ja
Priority to KR1020090026504A priority patent/KR100924185B1/ko
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    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
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    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69396—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing at least one rare earth metal element, e.g. oxides of lanthanides, scandium or yttrium
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    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen; Reversible storage of hydrogen
    • C01B3/02—Production of hydrogen; Production of gaseous mixtures containing hydrogen
    • C01B3/32—Production of hydrogen; Production of gaseous mixtures containing hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide or air
    • C01B3/323—Catalytic reaction of gaseous or liquid organic compounds other than hydrocarbons with gasifying agents
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
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    • H01M8/04007—Auxiliary arrangements, e.g. for control of pressure or for circulation of fluids related to heat exchange
    • H01M8/04067—Heat exchange or temperature measuring elements, thermal insulation, e.g. heat pipes, heat pumps, fins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
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    • H01M8/1286—Fuel cells applied on a support, e.g. miniature fuel cells deposited on silica supports
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    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
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    • H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6314—Formation by oxidation, e.g. oxidation of the substrate of a metallic layer
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    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
    • H10P14/6502—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed before formation of the materials
    • H10P14/6512—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed before formation of the materials by exposure to a gas or vapour
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    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/662—Laminate layers, e.g. stacks of alternating high-k metal oxides
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002—Chemical plants
    • B01J2219/00027—Process aspects
    • B01J2219/0004—Processes in series
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
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    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00891—Feeding or evacuation
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/19—Details relating to the geometry of the reactor
    • B01J2219/192—Details relating to the geometry of the reactor polygonal
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    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/02—Processes for making hydrogen or synthesis gas
    • C01B2203/0205—Processes for making hydrogen or synthesis gas containing a reforming step
    • C01B2203/0227—Processes for making hydrogen or synthesis gas containing a reforming step containing a catalytic reforming step
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  • Chemical & Material Sciences (AREA)
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  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
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  • Mechanical Engineering (AREA)
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  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Fuel Cell (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Formation Of Insulating Films (AREA)
  • Insulating Bodies (AREA)
JP2006233849A 2006-08-30 2006-08-30 反応装置及び電子機器 Expired - Fee Related JP4254823B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006233849A JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器
US11/893,277 US8097301B2 (en) 2006-08-30 2007-08-15 Electrical insulation film manufacturing method
KR1020070083183A KR100970048B1 (ko) 2006-08-30 2007-08-20 절연막의 제조방법, 반응장치, 발전장치 및 전자기기
KR1020090026504A KR100924185B1 (ko) 2006-08-30 2009-03-27 절연막의 제조방법, 반응장치, 발전장치 및 전자기기

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006233849A JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器

Publications (3)

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JP2008056521A JP2008056521A (ja) 2008-03-13
JP2008056521A5 JP2008056521A5 (https=) 2008-06-26
JP4254823B2 true JP4254823B2 (ja) 2009-04-15

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Application Number Title Priority Date Filing Date
JP2006233849A Expired - Fee Related JP4254823B2 (ja) 2006-08-30 2006-08-30 反応装置及び電子機器
JP2006267832A Expired - Fee Related JP4466629B2 (ja) 2006-08-30 2006-09-29 絶縁膜の製造方法
JP2007133587A Expired - Fee Related JP4508212B2 (ja) 2006-08-30 2007-05-21 反応装置及び電子機器

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