JP4228130B2 - 投影光学系、露光装置及びデバイスの製造方法 - Google Patents

投影光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP4228130B2
JP4228130B2 JP2002200695A JP2002200695A JP4228130B2 JP 4228130 B2 JP4228130 B2 JP 4228130B2 JP 2002200695 A JP2002200695 A JP 2002200695A JP 2002200695 A JP2002200695 A JP 2002200695A JP 4228130 B2 JP4228130 B2 JP 4228130B2
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JP
Japan
Prior art keywords
lens group
optical system
projection optical
lens
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002200695A
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English (en)
Japanese (ja)
Other versions
JP2003202494A (ja
JP2003202494A5 (enrdf_load_stackoverflow
Inventor
幸二 重松
慎太郎 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2002200695A priority Critical patent/JP4228130B2/ja
Priority to TW091124319A priority patent/TW588223B/zh
Priority to CNB021466696A priority patent/CN100483172C/zh
Priority to KR1020020068092A priority patent/KR20030038427A/ko
Publication of JP2003202494A publication Critical patent/JP2003202494A/ja
Publication of JP2003202494A5 publication Critical patent/JP2003202494A5/ja
Application granted granted Critical
Publication of JP4228130B2 publication Critical patent/JP4228130B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002200695A 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP4228130B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002200695A JP4228130B2 (ja) 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法
TW091124319A TW588223B (en) 2001-11-05 2002-10-22 Projection optical system and exposure device
CNB021466696A CN100483172C (zh) 2001-11-05 2002-11-01 投影光学系统，曝光装置以及设备的制造方法
KR1020020068092A KR20030038427A (ko) 2001-11-05 2002-11-05 투영 광학계, 노광 장치 및 디바이스의 제조 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-339424 2001-11-05
JP2001339424 2001-11-05
JP2002200695A JP4228130B2 (ja) 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2003202494A JP2003202494A (ja) 2003-07-18
JP2003202494A5 JP2003202494A5 (enrdf_load_stackoverflow) 2008-03-21
JP4228130B2 true JP4228130B2 (ja) 2009-02-25

Family

ID=26624347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002200695A Expired - Fee Related JP4228130B2 (ja) 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法

Country Status (4)

Country Link
JP (1) JP4228130B2 (enrdf_load_stackoverflow)
KR (1) KR20030038427A (enrdf_load_stackoverflow)
CN (1) CN100483172C (enrdf_load_stackoverflow)
TW (1) TW588223B (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP4779394B2 (ja) * 2005-03-23 2011-09-28 株式会社ニコン 投影光学系、露光装置、および露光方法
JP2010091751A (ja) 2008-10-07 2010-04-22 Canon Inc 投影光学系及び露光装置
CN102486569B (zh) * 2010-12-01 2014-06-18 上海微电子装备有限公司 一种投影物镜系统
CN103105666B (zh) * 2011-11-10 2015-04-15 上海微电子装备有限公司 一种曝光投影物镜
CN103364928B (zh) * 2012-03-31 2015-09-30 上海微电子装备有限公司 一种投影物镜光学系统
CN107664809B (zh) * 2016-07-29 2019-11-26 上海微电子装备（集团）股份有限公司 一种投影物镜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3864399B2 (ja) * 1996-08-08 2006-12-27 株式会社ニコン 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JP2000056219A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影光学系
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device

Also Published As

Publication number Publication date
JP2003202494A (ja) 2003-07-18
TW588223B (en) 2004-05-21
CN1417610A (zh) 2003-05-14
KR20030038427A (ko) 2003-05-16
CN100483172C (zh) 2009-04-29

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