KR20030038427A - 투영 광학계, 노광 장치 및 디바이스의 제조 방법 - Google Patents
투영 광학계, 노광 장치 및 디바이스의 제조 방법 Download PDFInfo
- Publication number
- KR20030038427A KR20030038427A KR1020020068092A KR20020068092A KR20030038427A KR 20030038427 A KR20030038427 A KR 20030038427A KR 1020020068092 A KR1020020068092 A KR 1020020068092A KR 20020068092 A KR20020068092 A KR 20020068092A KR 20030038427 A KR20030038427 A KR 20030038427A
- Authority
- KR
- South Korea
- Prior art keywords
- optical system
- projection optical
- lens group
- lens
- conditional expression
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 title claims description 10
- 230000014509 gene expression Effects 0.000 claims abstract description 77
- 239000000463 material Substances 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims description 20
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- 230000008569 process Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
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- 230000002349 favourable effect Effects 0.000 description 7
- 102100021257 Beta-secretase 1 Human genes 0.000 description 6
- 101710150192 Beta-secretase 1 Proteins 0.000 description 6
- 101100459248 Mus musculus Mxra8 gene Proteins 0.000 description 6
- 101150016874 asp3 gene Proteins 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 5
- 201000009310 astigmatism Diseases 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 101150014733 ASP5 gene Proteins 0.000 description 2
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001339424 | 2001-11-05 | ||
| JPJP-P-2001-00339424 | 2001-11-05 | ||
| JPJP-P-2002-00200695 | 2002-07-10 | ||
| JP2002200695A JP4228130B2 (ja) | 2001-11-05 | 2002-07-10 | 投影光学系、露光装置及びデバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20030038427A true KR20030038427A (ko) | 2003-05-16 |
Family
ID=26624347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020020068092A Ceased KR20030038427A (ko) | 2001-11-05 | 2002-11-05 | 투영 광학계, 노광 장치 및 디바이스의 제조 방법 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4228130B2 (enrdf_load_stackoverflow) |
| KR (1) | KR20030038427A (enrdf_load_stackoverflow) |
| CN (1) | CN100483172C (enrdf_load_stackoverflow) |
| TW (1) | TW588223B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130121116A (ko) * | 2010-12-01 | 2013-11-05 | 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 | 투사 대물렌즈 시스템 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005017734A (ja) * | 2003-06-26 | 2005-01-20 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
| JP4779394B2 (ja) * | 2005-03-23 | 2011-09-28 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
| JP2010091751A (ja) | 2008-10-07 | 2010-04-22 | Canon Inc | 投影光学系及び露光装置 |
| CN103105666B (zh) * | 2011-11-10 | 2015-04-15 | 上海微电子装备有限公司 | 一种曝光投影物镜 |
| CN103364928B (zh) * | 2012-03-31 | 2015-09-30 | 上海微电子装备有限公司 | 一种投影物镜光学系统 |
| CN107664809B (zh) * | 2016-07-29 | 2019-11-26 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08254652A (ja) * | 1995-03-15 | 1996-10-01 | Nikon Corp | 投影光学系 |
| KR19980018207A (ko) * | 1996-08-08 | 1998-06-05 | 고노 시게오 | 투영 노광 장치 및 그 투영 노광 장치에 사용되는 투영 광하계 및 디바이스 제조 방법 |
| JP2000056219A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影光学系 |
| JP2001051193A (en) * | 1999-06-03 | 2001-02-23 | Nikon Corp | Projection optical system projection exposing device provided with the system and manufacture of device |
-
2002
- 2002-07-10 JP JP2002200695A patent/JP4228130B2/ja not_active Expired - Fee Related
- 2002-10-22 TW TW091124319A patent/TW588223B/zh active
- 2002-11-01 CN CNB021466696A patent/CN100483172C/zh not_active Expired - Fee Related
- 2002-11-05 KR KR1020020068092A patent/KR20030038427A/ko not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08254652A (ja) * | 1995-03-15 | 1996-10-01 | Nikon Corp | 投影光学系 |
| KR19980018207A (ko) * | 1996-08-08 | 1998-06-05 | 고노 시게오 | 투영 노광 장치 및 그 투영 노광 장치에 사용되는 투영 광하계 및 디바이스 제조 방법 |
| JP2000056219A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影光学系 |
| JP2001051193A (en) * | 1999-06-03 | 2001-02-23 | Nikon Corp | Projection optical system projection exposing device provided with the system and manufacture of device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130121116A (ko) * | 2010-12-01 | 2013-11-05 | 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 | 투사 대물렌즈 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003202494A (ja) | 2003-07-18 |
| TW588223B (en) | 2004-05-21 |
| CN1417610A (zh) | 2003-05-14 |
| JP4228130B2 (ja) | 2009-02-25 |
| CN100483172C (zh) | 2009-04-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20021105 |
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| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20071101 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20021105 Comment text: Patent Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20091022 Patent event code: PE09021S01D |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20100428 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20091022 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
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| J201 | Request for trial against refusal decision | ||
| PJ0201 | Trial against decision of rejection |
Patent event date: 20100727 Comment text: Request for Trial against Decision on Refusal Patent event code: PJ02012R01D Patent event date: 20100428 Comment text: Decision to Refuse Application Patent event code: PJ02011S01I Appeal kind category: Appeal against decision to decline refusal Decision date: 20110805 Appeal identifier: 2010101005699 Request date: 20100727 |
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| J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20100727 Effective date: 20110805 |
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| PJ1301 | Trial decision |
Patent event code: PJ13011S01D Patent event date: 20110805 Comment text: Trial Decision on Objection to Decision on Refusal Appeal kind category: Appeal against decision to decline refusal Request date: 20100727 Decision date: 20110805 Appeal identifier: 2010101005699 |