JP4221114B2 - 磁気抵抗効果型ヘッド - Google Patents
磁気抵抗効果型ヘッド Download PDFInfo
- Publication number
- JP4221114B2 JP4221114B2 JP13675899A JP13675899A JP4221114B2 JP 4221114 B2 JP4221114 B2 JP 4221114B2 JP 13675899 A JP13675899 A JP 13675899A JP 13675899 A JP13675899 A JP 13675899A JP 4221114 B2 JP4221114 B2 JP 4221114B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- layer
- resistivity
- sensor
- shield layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005684 electric field Effects 0.000 claims description 12
- 230000000694 effects Effects 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000010408 film Substances 0.000 description 60
- 230000003068 static effect Effects 0.000 description 17
- 230000005611 electricity Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 229910052581 Si3N4 Inorganic materials 0.000 description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 12
- 230000015556 catabolic process Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000009413 insulation Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910018509 Al—N Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/40—Protective measures on heads, e.g. against excessive temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13675899A JP4221114B2 (ja) | 1999-05-18 | 1999-05-18 | 磁気抵抗効果型ヘッド |
| US09/383,214 US6219206B1 (en) | 1999-05-18 | 1999-08-26 | Magneto-resistive effect type head |
| US09/819,811 US6404604B2 (en) | 1999-05-18 | 2001-03-29 | Magneto-resistive effect type head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13675899A JP4221114B2 (ja) | 1999-05-18 | 1999-05-18 | 磁気抵抗効果型ヘッド |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000331315A JP2000331315A (ja) | 2000-11-30 |
| JP2000331315A5 JP2000331315A5 (enExample) | 2006-04-06 |
| JP4221114B2 true JP4221114B2 (ja) | 2009-02-12 |
Family
ID=15182826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13675899A Expired - Fee Related JP4221114B2 (ja) | 1999-05-18 | 1999-05-18 | 磁気抵抗効果型ヘッド |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US6219206B1 (enExample) |
| JP (1) | JP4221114B2 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG68063A1 (en) * | 1997-07-18 | 1999-10-19 | Hitachi Ltd | Magnetoresistive effect type reproducing head and magnetic disk apparatus equipped with the reproducing head |
| JP3344468B2 (ja) * | 1998-12-21 | 2002-11-11 | アルプス電気株式会社 | 薄膜磁気ヘッド |
| US6583971B1 (en) * | 1999-03-09 | 2003-06-24 | Sae Magnetics (Hk) Ltd. | Elimination of electric-pop noise in MR/GMR device |
| JP4221114B2 (ja) * | 1999-05-18 | 2009-02-12 | 株式会社日立グローバルストレージテクノロジーズ | 磁気抵抗効果型ヘッド |
| JP2001006126A (ja) * | 1999-06-17 | 2001-01-12 | Nec Corp | 磁気抵抗効果ヘッド及びそのヘッドを備えた磁気抵抗検出システム並びにそのヘッドを備えた磁気記憶システム |
| CN1451157A (zh) * | 1999-10-05 | 2003-10-22 | 西加特技术有限责任公司 | 用于保护磁阻磁头避免静电放电的集成板上器件和方法 |
| US6415500B1 (en) * | 2000-01-13 | 2002-07-09 | Headway Technologies, Inc. | Method to prevent electrostatic discharge for MR/GMR wafer fabrication |
| JP3511371B2 (ja) * | 2000-04-13 | 2004-03-29 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
| JP3929676B2 (ja) * | 2000-05-26 | 2007-06-13 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
| US6773405B2 (en) * | 2000-09-15 | 2004-08-10 | Jacob Fraden | Ear temperature monitor and method of temperature measurement |
| US6741429B1 (en) * | 2000-09-25 | 2004-05-25 | International Business Machines Corporation | Ion beam definition of magnetoresistive field sensors |
| US7292400B2 (en) * | 2001-04-23 | 2007-11-06 | Seagate Technology Llc | Device for limiting current in a sensor |
| JP3918496B2 (ja) * | 2001-10-22 | 2007-05-23 | 株式会社日立製作所 | 液晶表示装置及びその製造方法 |
| US6650511B2 (en) * | 2002-02-11 | 2003-11-18 | International Business Machines Corporation | Magnetic head assembly with electrostatic discharge (ESD) shunt/pads seed layer |
| US20030169539A1 (en) * | 2002-03-07 | 2003-09-11 | International Business Machines Corporation | Electrostatic discharge insensilive recording head with a high-resistance gap layer |
| US6870706B1 (en) * | 2002-08-07 | 2005-03-22 | Headway Technologies, Inc. | Method for suppressing tribocharge in the assembly of magnetic heads |
| US7369370B2 (en) * | 2002-08-07 | 2008-05-06 | Headway Technologies, Inc. | GMR head design that suppresses tribocharge during its assembly |
| JP2004110941A (ja) * | 2002-09-19 | 2004-04-08 | Hitachi Ltd | 磁気記録媒体および磁気記憶装置 |
| US7639459B2 (en) * | 2005-01-10 | 2009-12-29 | Hitachi Global Storage Technologies Netherlands B.V. | Three terminal magnetic sensor having an in-stack longitudinal biasing layer structure |
| US8004795B2 (en) * | 2007-12-26 | 2011-08-23 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head design having reduced susceptibility to electrostatic discharge from media surfaces |
| US8223462B2 (en) * | 2008-05-30 | 2012-07-17 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetoresistive sensor design for signal noise pickup reduction for use with deep gap electrostatic discharge shunt |
| DE102016105380A1 (de) | 2016-03-22 | 2017-09-28 | Infineon Technologies Ag | Elektrischer Schirm zwischen magnetoresistiven Sensorelementen |
| US10354679B2 (en) | 2016-12-13 | 2019-07-16 | International Business Machines Corporation | Magnetic recording module having tunnel valve sensors with dissimilar tunnel barrier resistivities |
| US10014014B1 (en) | 2017-06-14 | 2018-07-03 | International Business Machines Corporation | Magnetic recording apparatus having circuits with differing tunnel valve sensors and about the same resistance |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4639806A (en) * | 1983-09-09 | 1987-01-27 | Sharp Kabushiki Kaisha | Thin film magnetic head having a magnetized ferromagnetic film on the MR element |
| JPH05205224A (ja) * | 1992-01-27 | 1993-08-13 | Hitachi Ltd | 磁気ヘッド |
| US5609948A (en) * | 1992-08-21 | 1997-03-11 | Minnesota Mining And Manufacturing Company | Laminate containing diamond-like carbon and thin-film magnetic head assembly formed thereon |
| JPH06223331A (ja) * | 1993-01-26 | 1994-08-12 | Matsushita Electric Ind Co Ltd | 磁気抵抗効果型薄膜磁気ヘッド |
| JPH06274830A (ja) * | 1993-03-25 | 1994-09-30 | Ngk Insulators Ltd | 薄膜磁気ヘッド |
| JP2741837B2 (ja) | 1993-08-06 | 1998-04-22 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 薄膜磁気抵抗ヘッド |
| US5375022A (en) | 1993-08-06 | 1994-12-20 | International Business Machines Corporation | Magnetic disk drive with electrical shorting protection |
| US5644455A (en) * | 1993-12-30 | 1997-07-01 | Seagate Technology, Inc. | Amorphous diamond-like carbon gaps in magnetoresistive heads |
| US5539598A (en) | 1994-12-08 | 1996-07-23 | International Business Machines Corporation | Electrostatic protection for a shielded MR sensor |
| JPH08273126A (ja) * | 1995-03-28 | 1996-10-18 | Sony Corp | 磁気抵抗効果型磁気ヘッド |
| JPH10228610A (ja) * | 1997-02-13 | 1998-08-25 | Yamaha Corp | シールド型磁気抵抗効果薄膜磁気ヘッド |
| US5986857A (en) * | 1997-02-13 | 1999-11-16 | Sanyo Electric Co., Ltd. | Thin film magnetic head including adhesion enhancing interlayers, and upper and lower gap insulative layers having different hydrogen contents and internal stress states |
| JPH10247307A (ja) | 1997-03-04 | 1998-09-14 | Fujitsu Ltd | 磁気ヘッド及び磁気記憶装置 |
| JP3157770B2 (ja) * | 1997-09-17 | 2001-04-16 | アルプス電気株式会社 | 薄膜磁気ヘッド |
| JP3576361B2 (ja) * | 1997-09-18 | 2004-10-13 | 富士通株式会社 | 磁気抵抗効果型ヘッド及び磁気記録再生装置 |
| US6188549B1 (en) * | 1997-12-10 | 2001-02-13 | Read-Rite Corporation | Magnetoresistive read/write head with high-performance gap layers |
| JP4221114B2 (ja) * | 1999-05-18 | 2009-02-12 | 株式会社日立グローバルストレージテクノロジーズ | 磁気抵抗効果型ヘッド |
-
1999
- 1999-05-18 JP JP13675899A patent/JP4221114B2/ja not_active Expired - Fee Related
- 1999-08-26 US US09/383,214 patent/US6219206B1/en not_active Expired - Fee Related
-
2001
- 2001-03-29 US US09/819,811 patent/US6404604B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20010009492A1 (en) | 2001-07-26 |
| JP2000331315A (ja) | 2000-11-30 |
| US6404604B2 (en) | 2002-06-11 |
| US6219206B1 (en) | 2001-04-17 |
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