JP4214265B2 - 光学測定装置、及び基板保持装置 - Google Patents

光学測定装置、及び基板保持装置 Download PDF

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Publication number
JP4214265B2
JP4214265B2 JP2008031943A JP2008031943A JP4214265B2 JP 4214265 B2 JP4214265 B2 JP 4214265B2 JP 2008031943 A JP2008031943 A JP 2008031943A JP 2008031943 A JP2008031943 A JP 2008031943A JP 4214265 B2 JP4214265 B2 JP 4214265B2
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JP
Japan
Prior art keywords
sample
support member
suction
optical measurement
adsorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008031943A
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English (en)
Japanese (ja)
Other versions
JP2009002928A (ja
Inventor
孝二 町田
智博 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lasertec Corp
Original Assignee
Lasertec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lasertec Corp filed Critical Lasertec Corp
Priority to JP2008031943A priority Critical patent/JP4214265B2/ja
Priority to TW097113757A priority patent/TWI387748B/zh
Priority to TW101121281A priority patent/TWI465713B/zh
Priority to KR1020080047582A priority patent/KR100988691B1/ko
Publication of JP2009002928A publication Critical patent/JP2009002928A/ja
Application granted granted Critical
Publication of JP4214265B2 publication Critical patent/JP4214265B2/ja
Priority to KR1020100039475A priority patent/KR100982079B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Filters (AREA)
JP2008031943A 2007-05-23 2008-02-13 光学測定装置、及び基板保持装置 Expired - Fee Related JP4214265B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008031943A JP4214265B2 (ja) 2007-05-23 2008-02-13 光学測定装置、及び基板保持装置
TW097113757A TWI387748B (zh) 2007-05-23 2008-04-16 光學測定裝置
TW101121281A TWI465713B (zh) 2007-05-23 2008-04-16 基板保持裝置
KR1020080047582A KR100988691B1 (ko) 2007-05-23 2008-05-22 광학 측정장치
KR1020100039475A KR100982079B1 (ko) 2007-05-23 2010-04-28 기판 유지장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007136301 2007-05-23
JP2008031943A JP4214265B2 (ja) 2007-05-23 2008-02-13 光学測定装置、及び基板保持装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008173228A Division JP5344545B2 (ja) 2007-05-23 2008-07-02 基板保持装置

Publications (2)

Publication Number Publication Date
JP2009002928A JP2009002928A (ja) 2009-01-08
JP4214265B2 true JP4214265B2 (ja) 2009-01-28

Family

ID=40319447

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008031943A Expired - Fee Related JP4214265B2 (ja) 2007-05-23 2008-02-13 光学測定装置、及び基板保持装置
JP2008173228A Active JP5344545B2 (ja) 2007-05-23 2008-07-02 基板保持装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008173228A Active JP5344545B2 (ja) 2007-05-23 2008-07-02 基板保持装置

Country Status (3)

Country Link
JP (2) JP4214265B2 (zh)
KR (1) KR100982079B1 (zh)
TW (2) TWI465713B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5495313B2 (ja) * 2010-03-12 2014-05-21 Ｎｔｎ株式会社 チャック装置、基板観察装置、および欠陥修正装置
JP5907759B2 (ja) * 2012-03-02 2016-04-26 大阪瓦斯株式会社 磁気探傷装置
CN104425308B (zh) * 2013-09-09 2018-03-09 东京毅力科创株式会社 测定装置、基板处理系统和测定方法
JP6246673B2 (ja) * 2013-09-09 2017-12-13 東京エレクトロン株式会社 測定装置、基板処理システムおよび測定方法
TW201732997A (zh) * 2016-01-18 2017-09-16 Ｈｏｙａ股份有限公司 基板保持裝置、描繪裝置、光罩檢查裝置、及光罩之製造方法
JP7153231B2 (ja) * 2018-12-21 2022-10-14 日本電気硝子株式会社 ガラス板の撓み測定装置及びガラス板の製造方法
KR102241646B1 (ko) * 2020-09-21 2021-04-16 엘지디스플레이 주식회사 기판 지지 장치
JP2023102048A (ja) * 2022-01-11 2023-07-24 Ｔｏｗａ株式会社 加工装置、及び、加工品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04194737A (ja) * 1990-11-28 1992-07-14 Hitachi Ltd 基板表面異物検査装置
JP4130552B2 (ja) * 2002-03-22 2008-08-06 株式会社ブイ・テクノロジー ガラス基板の検査装置
JP4307872B2 (ja) * 2003-03-18 2009-08-05 オリンパス株式会社 基板検査装置
JP4443353B2 (ja) * 2004-08-31 2010-03-31 東京応化工業株式会社 基板載置ステージ及び基板の吸着・剥離方法
JP4793851B2 (ja) * 2005-05-31 2011-10-12 レーザーテック株式会社 カラーフィルタ基板のステージ装置及び検査装置

Also Published As

Publication number Publication date
TW201243316A (en) 2012-11-01
KR20100062984A (ko) 2010-06-10
TWI465713B (zh) 2014-12-21
TWI387748B (zh) 2013-03-01
JP5344545B2 (ja) 2013-11-20
JP2009002954A (ja) 2009-01-08
TW200907332A (en) 2009-02-16
KR100982079B1 (ko) 2010-09-13
JP2009002928A (ja) 2009-01-08

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