JP4198295B2 - 感光材料処理装置 - Google Patents

感光材料処理装置 Download PDF

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Publication number
JP4198295B2
JP4198295B2 JP2000084970A JP2000084970A JP4198295B2 JP 4198295 B2 JP4198295 B2 JP 4198295B2 JP 2000084970 A JP2000084970 A JP 2000084970A JP 2000084970 A JP2000084970 A JP 2000084970A JP 4198295 B2 JP4198295 B2 JP 4198295B2
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JP
Japan
Prior art keywords
plate
opening
photosensitive material
blades
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000084970A
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English (en)
Japanese (ja)
Other versions
JP2001272799A (ja
JP2001272799A5 (enExample
Inventor
良衛 野沢
利広 須谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2000084970A priority Critical patent/JP4198295B2/ja
Priority to DK00124447.4T priority patent/DK1099981T3/da
Priority to EP00124447A priority patent/EP1099981B1/en
Priority to US09/708,726 priority patent/US6435740B1/en
Publication of JP2001272799A publication Critical patent/JP2001272799A/ja
Priority to US10/177,106 priority patent/US6652167B2/en
Priority to US10/177,151 priority patent/US6547460B2/en
Priority to US10/177,107 priority patent/US6554508B1/en
Publication of JP2001272799A5 publication Critical patent/JP2001272799A5/ja
Application granted granted Critical
Publication of JP4198295B2 publication Critical patent/JP4198295B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2000084970A 1999-11-09 2000-03-24 感光材料処理装置 Expired - Fee Related JP4198295B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2000084970A JP4198295B2 (ja) 2000-03-24 2000-03-24 感光材料処理装置
DK00124447.4T DK1099981T3 (da) 1999-11-09 2000-11-08 Indretning til bearbejdning af fotofølsomt materiale
EP00124447A EP1099981B1 (en) 1999-11-09 2000-11-08 Photosensitive material processing device
US09/708,726 US6435740B1 (en) 1999-11-09 2000-11-09 Photosensitive material processing device
US10/177,106 US6652167B2 (en) 1999-11-09 2002-06-24 Photosensitive material processing device
US10/177,151 US6547460B2 (en) 1999-11-09 2002-06-24 Photosensitive material processing device
US10/177,107 US6554508B1 (en) 1999-11-09 2002-06-24 Photosensitive material processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000084970A JP4198295B2 (ja) 2000-03-24 2000-03-24 感光材料処理装置

Publications (3)

Publication Number Publication Date
JP2001272799A JP2001272799A (ja) 2001-10-05
JP2001272799A5 JP2001272799A5 (enExample) 2006-01-12
JP4198295B2 true JP4198295B2 (ja) 2008-12-17

Family

ID=18601368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000084970A Expired - Fee Related JP4198295B2 (ja) 1999-11-09 2000-03-24 感光材料処理装置

Country Status (1)

Country Link
JP (1) JP4198295B2 (enExample)

Also Published As

Publication number Publication date
JP2001272799A (ja) 2001-10-05

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