JP4185962B2 - 試料作製装置 - Google Patents

試料作製装置 Download PDF

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Publication number
JP4185962B2
JP4185962B2 JP2008058689A JP2008058689A JP4185962B2 JP 4185962 B2 JP4185962 B2 JP 4185962B2 JP 2008058689 A JP2008058689 A JP 2008058689A JP 2008058689 A JP2008058689 A JP 2008058689A JP 4185962 B2 JP4185962 B2 JP 4185962B2
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JP2008058689A
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English (en)
Japanese (ja)
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JP2008153239A (ja
JP2008153239A5 (enrdf_load_stackoverflow
Inventor
馨 梅村
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Hitachi Ltd
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Hitachi Ltd
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=39655151&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP4185962(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
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Priority to JP2008058689A priority Critical patent/JP4185962B2/ja
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Publication of JP2008153239A5 publication Critical patent/JP2008153239A5/ja
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JP2008058689A 2008-03-07 2008-03-07 試料作製装置 Expired - Lifetime JP4185962B2 (ja)

Priority Applications (1)

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JP2008058689A JP4185962B2 (ja) 2008-03-07 2008-03-07 試料作製装置

Applications Claiming Priority (1)

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JP2008058689A JP4185962B2 (ja) 2008-03-07 2008-03-07 試料作製装置

Related Parent Applications (1)

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JP2006159234A Division JP4353962B2 (ja) 2006-06-08 2006-06-08 試料解析方法及び試料作製方法

Publications (3)

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JP2008153239A JP2008153239A (ja) 2008-07-03
JP2008153239A5 JP2008153239A5 (enrdf_load_stackoverflow) 2008-08-14
JP4185962B2 true JP4185962B2 (ja) 2008-11-26

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ID=39655151

Family Applications (1)

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JP2008058689A Expired - Lifetime JP4185962B2 (ja) 2008-03-07 2008-03-07 試料作製装置

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JP (1) JP4185962B2 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6708547B2 (ja) 2014-06-30 2020-06-10 株式会社日立ハイテクサイエンス 自動試料作製装置
US9620333B2 (en) 2014-08-29 2017-04-11 Hitachi High-Tech Science Corporation Charged particle beam apparatus
KR102489385B1 (ko) 2015-02-19 2023-01-17 가부시키가이샤 히다치 하이테크 사이언스 하전 입자 빔 장치
JP6700897B2 (ja) 2016-03-25 2020-05-27 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6931214B2 (ja) 2017-01-19 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6885576B2 (ja) 2017-01-19 2021-06-16 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6900027B2 (ja) 2017-03-28 2021-07-07 株式会社日立ハイテクサイエンス 試料トレンチ埋込方法
JP6541161B2 (ja) 2017-11-17 2019-07-10 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6885637B2 (ja) * 2020-04-30 2021-06-16 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2807715B2 (ja) * 1988-01-22 1998-10-08 セイコーインスツルメンツ株式会社 イオンビーム加工装置
JPH0215648A (ja) * 1988-07-04 1990-01-19 Hitachi Ltd 微細素子の断面観察装置
JP2708547B2 (ja) * 1989-05-10 1998-02-04 株式会社日立製作所 デバイス移植方法
JP2926426B2 (ja) * 1990-03-30 1999-07-28 セイコーインスツルメンツ株式会社 集束イオンビーム加工方法
JP2774884B2 (ja) * 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
JPH06232238A (ja) * 1993-02-05 1994-08-19 Hitachi Ltd 試料処理装置および試料処理方法
JP3221797B2 (ja) * 1994-06-14 2001-10-22 株式会社日立製作所 試料作成方法及びその装置
JP3751062B2 (ja) * 1996-01-22 2006-03-01 株式会社リコー 断面ｔｅｍ観察用試料ホルダー及びそれを備えたｔｅｍ装置
US6194720B1 (en) * 1998-06-24 2001-02-27 Micron Technology, Inc. Preparation of transmission electron microscope samples
US6188072B1 (en) * 1999-06-08 2001-02-13 Mosel Vitelic Inc. Apparatus for extracting TEM specimens of semiconductor devices

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JP2008153239A (ja) 2008-07-03

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