JP2006276031A5 - - Google Patents
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- Publication number
- JP2006276031A5 JP2006276031A5 JP2006159235A JP2006159235A JP2006276031A5 JP 2006276031 A5 JP2006276031 A5 JP 2006276031A5 JP 2006159235 A JP2006159235 A JP 2006159235A JP 2006159235 A JP2006159235 A JP 2006159235A JP 2006276031 A5 JP2006276031 A5 JP 2006276031A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- extracted
- probe
- vacuum
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000523 sample Substances 0.000 claims description 394
- 238000000034 method Methods 0.000 claims description 42
- 238000012545 processing Methods 0.000 claims description 31
- 238000000151 deposition Methods 0.000 claims description 29
- 230000008021 deposition Effects 0.000 claims description 29
- 230000002950 deficient Effects 0.000 claims description 27
- 238000010884 ion-beam technique Methods 0.000 claims description 24
- 238000005464 sample preparation method Methods 0.000 claims description 19
- 230000001678 irradiating effect Effects 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000000926 separation method Methods 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 80
- 238000007689 inspection Methods 0.000 description 48
- 238000002360 preparation method Methods 0.000 description 38
- 239000000758 substrate Substances 0.000 description 27
- 238000004458 analytical method Methods 0.000 description 25
- 238000012546 transfer Methods 0.000 description 22
- 230000003287 optical effect Effects 0.000 description 13
- 238000004364 calculation method Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000007796 conventional method Methods 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 7
- 238000012284 sample analysis method Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000005856 abnormality Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 239000011163 secondary particle Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000538 analytical sample Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 1
- 238000007735 ion beam assisted deposition Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006159235A JP4177860B2 (ja) | 2006-06-08 | 2006-06-08 | 試料作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006159235A JP4177860B2 (ja) | 2006-06-08 | 2006-06-08 | 試料作製方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004167933A Division JP4096916B2 (ja) | 2004-06-07 | 2004-06-07 | 試料解析方法および装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006276031A JP2006276031A (ja) | 2006-10-12 |
| JP2006276031A5 true JP2006276031A5 (enrdf_load_stackoverflow) | 2008-08-07 |
| JP4177860B2 JP4177860B2 (ja) | 2008-11-05 |
Family
ID=37210916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006159235A Expired - Lifetime JP4177860B2 (ja) | 2006-06-08 | 2006-06-08 | 試料作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4177860B2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10312162B2 (en) * | 2016-06-21 | 2019-06-04 | Fei Company | Methods and apparatus for semiconductor sample workflow |
-
2006
- 2006-06-08 JP JP2006159235A patent/JP4177860B2/ja not_active Expired - Lifetime
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