JP4177860B2 - 試料作製方法 - Google Patents

試料作製方法 Download PDF

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Publication number
JP4177860B2
JP4177860B2 JP2006159235A JP2006159235A JP4177860B2 JP 4177860 B2 JP4177860 B2 JP 4177860B2 JP 2006159235 A JP2006159235 A JP 2006159235A JP 2006159235 A JP2006159235 A JP 2006159235A JP 4177860 B2 JP4177860 B2 JP 4177860B2
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JP
Japan
Prior art keywords
sample
extracted
probe
vacuum
ion beam
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2006159235A
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English (en)
Japanese (ja)
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JP2006276031A (ja
JP2006276031A5 (enrdf_load_stackoverflow
Inventor
馨 梅村
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP2006159235A priority Critical patent/JP4177860B2/ja
Publication of JP2006276031A publication Critical patent/JP2006276031A/ja
Publication of JP2006276031A5 publication Critical patent/JP2006276031A5/ja
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Publication of JP4177860B2 publication Critical patent/JP4177860B2/ja
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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2006159235A 2006-06-08 2006-06-08 試料作製方法 Expired - Lifetime JP4177860B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006159235A JP4177860B2 (ja) 2006-06-08 2006-06-08 試料作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006159235A JP4177860B2 (ja) 2006-06-08 2006-06-08 試料作製方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004167933A Division JP4096916B2 (ja) 2004-06-07 2004-06-07 試料解析方法および装置

Publications (3)

Publication Number Publication Date
JP2006276031A JP2006276031A (ja) 2006-10-12
JP2006276031A5 JP2006276031A5 (enrdf_load_stackoverflow) 2008-08-07
JP4177860B2 true JP4177860B2 (ja) 2008-11-05

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ID=37210916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006159235A Expired - Lifetime JP4177860B2 (ja) 2006-06-08 2006-06-08 試料作製方法

Country Status (1)

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JP (1) JP4177860B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10312162B2 (en) * 2016-06-21 2019-06-04 Fei Company Methods and apparatus for semiconductor sample workflow

Also Published As

Publication number Publication date
JP2006276031A (ja) 2006-10-12

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