JP4182360B2 - 液体噴射ヘッド及び液体噴射装置 - Google Patents
液体噴射ヘッド及び液体噴射装置 Download PDFInfo
- Publication number
- JP4182360B2 JP4182360B2 JP2006156566A JP2006156566A JP4182360B2 JP 4182360 B2 JP4182360 B2 JP 4182360B2 JP 2006156566 A JP2006156566 A JP 2006156566A JP 2006156566 A JP2006156566 A JP 2006156566A JP 4182360 B2 JP4182360 B2 JP 4182360B2
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- pressure generating
- path forming
- diaphragm
- forming substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims description 38
- 239000000758 substrate Substances 0.000 claims description 95
- 238000005192 partition Methods 0.000 claims description 36
- 230000001681 protective effect Effects 0.000 claims description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 239000013078 crystal Substances 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 238000005530 etching Methods 0.000 description 42
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 13
- 238000004891 communication Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000012212 insulator Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14241—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14419—Manifold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14491—Electrical connection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
また、傾斜面を複数のテーパ部で構成することで、液体噴射特性を向上することができると共に、振動板と隔壁との剥離を確実に防止でき、振動板の隔壁と圧力発生室との境界部分の剛性を向上して、この境界部分に亀裂等が発生するのを確実に防止することができる。
さらに、複数のテーパ部を、前記圧力発生素子側ほど前記振動板の厚さ方向に対して傾斜角度が小さくすることで、振動板の隔壁と圧力発生室との境界部分の剛性をさらに向上することができ、境界部分に亀裂等が発生するのを確実に防止することができる。
図1は、本発明の実施形態1に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの分解斜視図であり、図2は、図1の平面図及びそのA−A′断面図であり、図3は、図2(a)のB−B′断面図及びその要部断面図である。図示するように、流路形成基板10は、本実施形態では結晶面方位が(110)面のシリコン単結晶基板からなり、その一方の面には予め熱酸化によって二酸化シリコンからなる厚さ0.5〜2μmの弾性膜50が形成されている。
以上、本発明の実施形態1について説明したが、本発明の基本的構成は、上述したものに限定されるものではない。例えば、上述した実施形態1では、凹部51の側面を第1テーパ部53及び第2テーパ部54で構成される傾斜面52としたが、凹部51の側面の形状は、特にこれに限定されず、例えば、エッチング液の温度及び濃度を調整することで、第1テーパ部の傾斜角度を弾性膜50の厚さ方向に対して小さくし、第2テーパ部の傾斜角度を厚さ方向に対して大きくするようにしてもよい。すなわち、上述した実施形態1では、第1テーパ部53と第2テーパ部54とで、凸状の傾斜面52を形成したが、第1テーパ部と第2テーパ部とで凹状の傾斜面を形成するようにしてもよい。また、上述した実施形態1では、凹部51の傾斜面52を第1テーパ部53と第2テーパ部54とで構成したが、特にこれに限定されず、例えば、角度の異なる3つ以上のテーパ部で凹部を構成するようにしてもよい。
Claims (4)
- 液体を噴射するノズル開口に連通すると共に複数の隔壁で区画されて短手方向に並設された複数の圧力発生室を有する流路形成基板と、該流路形成基板の一方面側に振動板を介して設けられて前記圧力発生室に圧力変化を付与する圧力発生素子とを具備し、
前記振動板の前記圧力発生室に相対向する領域には、当該圧力発生室側に開口する凹部が設けられていると共に、該凹部の開口縁部が、前記隔壁の前記圧力発生室の側面を画成する内面と前記振動板と接合された面とで画成された角部と同一位置に設けられ、且つ前記凹部の側面が、前記凹部の開口縁部側よりも当該凹部の底面側が幅狭となるように傾斜した傾斜面となっていると共に、前記傾斜面が互いに傾斜角度の異なる複数のテーパ部で構成され、複数のテーパ部が、前記圧力発生素子側ほど前記振動板の厚さ方向に対して傾斜角度が小さくなっていることを特徴とする液体噴射ヘッド。 - 前記圧力発生室の内面には、耐液体性を有する保護膜が設けられていることを特徴とする請求項1記載の液体噴射ヘッド。
- 前記流路形成基板がシリコン単結晶基板からなると共に、前記振動板の前記流路形成基板側の最下層が二酸化シリコンからなる弾性膜で構成されており、前記凹部が前記弾性膜に設けられていることを特徴とする請求項1又は2記載の液体噴射ヘッド。
- 請求項1〜3の何れかに記載の液体噴射ヘッドを具備することを特徴とする液体噴射装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006156566A JP4182360B2 (ja) | 2006-06-05 | 2006-06-05 | 液体噴射ヘッド及び液体噴射装置 |
US11/758,560 US7591544B2 (en) | 2006-06-05 | 2007-06-05 | Liquid ejecting head, method of producing the same, and liquid ejecting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006156566A JP4182360B2 (ja) | 2006-06-05 | 2006-06-05 | 液体噴射ヘッド及び液体噴射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007320298A JP2007320298A (ja) | 2007-12-13 |
JP4182360B2 true JP4182360B2 (ja) | 2008-11-19 |
Family
ID=38789575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006156566A Expired - Fee Related JP4182360B2 (ja) | 2006-06-05 | 2006-06-05 | 液体噴射ヘッド及び液体噴射装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7591544B2 (ja) |
JP (1) | JP4182360B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5566130B2 (ja) * | 2009-02-26 | 2014-08-06 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP6049321B2 (ja) * | 2012-06-22 | 2016-12-21 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
IT201700082961A1 (it) | 2017-07-20 | 2019-01-20 | St Microelectronics Srl | Dispositivo microfluidico mems per la stampa a getto di inchiostro ad attuazione piezoelettrica e relativo metodo di fabbricazione |
JP7452106B2 (ja) | 2020-03-06 | 2024-03-19 | セイコーエプソン株式会社 | 液体吐出ヘッド、液体吐出装置、および、液体吐出ヘッドの製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3473611B2 (ja) | 1992-04-23 | 2003-12-08 | セイコーエプソン株式会社 | 液体噴射ヘッドの製造方法 |
JPH0671882A (ja) | 1992-06-05 | 1994-03-15 | Seiko Epson Corp | インクジェットヘッド及びその製造方法 |
JP3713921B2 (ja) | 1996-10-24 | 2005-11-09 | セイコーエプソン株式会社 | インクジェット式記録ヘッドの製造方法 |
JP3740807B2 (ja) | 1997-11-04 | 2006-02-01 | セイコーエプソン株式会社 | インクジェットヘッドおよびその製造方法 |
JP3019845B1 (ja) * | 1997-11-25 | 2000-03-13 | セイコーエプソン株式会社 | インクジェット式記録ヘッド及びインクジェット式記録装置 |
JP3684815B2 (ja) | 1998-02-13 | 2005-08-17 | セイコーエプソン株式会社 | インクジェット式記録ヘッドおよびそれらの製造方法 |
US20040134881A1 (en) | 2002-07-04 | 2004-07-15 | Seiko Epson Corporation | Method of manufacturing liquid jet head |
JP3726909B2 (ja) | 2002-07-10 | 2005-12-14 | セイコーエプソン株式会社 | 液体噴射ヘッドの製造方法 |
JP2004090279A (ja) | 2002-08-29 | 2004-03-25 | Seiko Epson Corp | 液体噴射ヘッド及び液体噴射装置 |
JP2004209874A (ja) | 2003-01-07 | 2004-07-29 | Canon Inc | 液体吐出ヘッド |
JP4192794B2 (ja) * | 2004-01-26 | 2008-12-10 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエーター、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、周波数フィルタ、発振器、電子回路、薄膜圧電共振器、及び電子機器 |
-
2006
- 2006-06-05 JP JP2006156566A patent/JP4182360B2/ja not_active Expired - Fee Related
-
2007
- 2007-06-05 US US11/758,560 patent/US7591544B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20070279456A1 (en) | 2007-12-06 |
US7591544B2 (en) | 2009-09-22 |
JP2007320298A (ja) | 2007-12-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4321552B2 (ja) | アクチュエータ装置及び液体噴射ヘッド | |
JP3726909B2 (ja) | 液体噴射ヘッドの製造方法 | |
JP4258668B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2009160841A (ja) | 液体噴射ヘッドの製造方法及び液体噴射ヘッド並びに液体噴射装置 | |
JP4645831B2 (ja) | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 | |
JP2009214522A (ja) | 液体噴射ヘッド及び液体噴射ヘッドの製造方法並びに液体噴射装置 | |
US6923528B2 (en) | Liquid-jet head and liquid-jet apparatus | |
JP4553129B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP4182360B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2009018551A (ja) | アクチュエータ、液体噴射ヘッド及び液体噴射装置 | |
JP2009029011A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2010221434A (ja) | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 | |
JP4831325B2 (ja) | 液体噴射ヘッドの製造方法及び液体噴射ヘッド並びに液体噴射装置 | |
JP5447786B2 (ja) | 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター装置 | |
JP2009226756A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2010228274A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2009061729A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP4475042B2 (ja) | 液体噴射ヘッドの製造方法 | |
JP4492059B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP4911301B2 (ja) | マイクロデバイスの製造方法及び液体噴射ヘッドの製造方法 | |
JP5024509B2 (ja) | マイクロデバイスの製造方法及び液体噴射ヘッドの製造方法 | |
JP3882915B2 (ja) | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 | |
JP2009073186A (ja) | 液体噴射ヘッド及び液体噴射ヘッドの製造方法並びに液体噴射装置 | |
JP5690476B2 (ja) | 液体噴射ヘッドの製造方法、液体噴射ヘッド及び液体噴射装置 | |
JP2006224609A (ja) | 液体噴射ヘッドの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080424 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080430 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080630 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080806 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080819 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110912 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4182360 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120912 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130912 Year of fee payment: 5 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |