JP4110601B2 - 炭化珪素単結晶の製造方法 - Google Patents
炭化珪素単結晶の製造方法 Download PDFInfo
- Publication number
- JP4110601B2 JP4110601B2 JP00501898A JP501898A JP4110601B2 JP 4110601 B2 JP4110601 B2 JP 4110601B2 JP 00501898 A JP00501898 A JP 00501898A JP 501898 A JP501898 A JP 501898A JP 4110601 B2 JP4110601 B2 JP 4110601B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon carbide
- crucible
- raw material
- carbon material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000013078 crystal Substances 0.000 title claims description 76
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 58
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 58
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000003575 carbonaceous material Substances 0.000 claims description 36
- 239000002994 raw material Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000005092 sublimation method Methods 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 239000007789 gas Substances 0.000 description 20
- 229910002804 graphite Inorganic materials 0.000 description 12
- 239000010439 graphite Substances 0.000 description 12
- 238000000859 sublimation Methods 0.000 description 12
- 230000008022 sublimation Effects 0.000 description 12
- 230000007547 defect Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 7
- 229910003468 tantalcarbide Inorganic materials 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 4
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
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- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00501898A JP4110601B2 (ja) | 1998-01-13 | 1998-01-13 | 炭化珪素単結晶の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP00501898A JP4110601B2 (ja) | 1998-01-13 | 1998-01-13 | 炭化珪素単結晶の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11199395A JPH11199395A (ja) | 1999-07-27 |
| JPH11199395A5 JPH11199395A5 (enExample) | 2005-08-04 |
| JP4110601B2 true JP4110601B2 (ja) | 2008-07-02 |
Family
ID=11599790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP00501898A Expired - Lifetime JP4110601B2 (ja) | 1998-01-13 | 1998-01-13 | 炭化珪素単結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4110601B2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4593099B2 (ja) * | 2003-03-10 | 2010-12-08 | 学校法人関西学院 | 単結晶炭化ケイ素の液相エピタキシャル成長法及びそれに用いられる熱処理装置 |
| JP2006001786A (ja) * | 2004-06-17 | 2006-01-05 | Hitachi Chem Co Ltd | フッ化カルシウム結晶育成ルツボ、フッ化カルシウム結晶の製造方法及びフッ化カルシウム結晶 |
| JP4941099B2 (ja) * | 2007-05-24 | 2012-05-30 | 株式会社デンソー | 炭化珪素単結晶の製造装置 |
| KR100848810B1 (ko) | 2007-08-03 | 2008-07-28 | 한국전기연구원 | 단결정 성장 방법 및 그 장치 |
| JP5087489B2 (ja) * | 2008-07-23 | 2012-12-05 | 株式会社ブリヂストン | 炭化珪素単結晶の製造装置及び炭化珪素単結晶の製造方法 |
| JP5327259B2 (ja) * | 2011-03-30 | 2013-10-30 | 株式会社デンソー | 炭化珪素単結晶の製造装置 |
| JP5548174B2 (ja) * | 2011-09-12 | 2014-07-16 | 東洋炭素株式会社 | PIT炭素芯TaCチューブの製造方法、及び、PIT炭素芯TaCチューブ |
| KR101882321B1 (ko) * | 2011-12-26 | 2018-07-27 | 엘지이노텍 주식회사 | 잉곳 제조 장치 |
| CN105734671B (zh) * | 2014-12-10 | 2018-11-30 | 北京天科合达半导体股份有限公司 | 一种高质量碳化硅晶体生长的方法 |
| CN110129880A (zh) * | 2019-04-26 | 2019-08-16 | 河北同光晶体有限公司 | 一种低碳包裹物密度SiC单晶的生长装置及生长方法 |
| RU2745736C1 (ru) * | 2020-03-26 | 2021-03-31 | Акционерное общество "ОКБ-Планета" АО "ОКБ-Планета" | Способ модификации поверхности кристаллов карбида кремния |
| CN113005513B (zh) * | 2021-04-19 | 2024-08-06 | 北京昌龙智芯半导体有限公司 | 一种碳化硅蒸汽制备装置 |
| CN113584592A (zh) * | 2021-08-02 | 2021-11-02 | 哈尔滨科友半导体产业装备与技术研究院有限公司 | 一种减少石墨包裹物的碳化硅晶体生长方法 |
| CN114574946B (zh) * | 2022-02-23 | 2024-06-14 | 中国电子科技集团公司第四十六研究所 | 一种重掺锑硅单晶中锑元素掺杂的方法及掺杂装置 |
-
1998
- 1998-01-13 JP JP00501898A patent/JP4110601B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11199395A (ja) | 1999-07-27 |
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