JP4073941B2 - 固相シート成長用基体および固相シートの製造方法 - Google Patents
固相シート成長用基体および固相シートの製造方法 Download PDFInfo
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- JP4073941B2 JP4073941B2 JP2006167618A JP2006167618A JP4073941B2 JP 4073941 B2 JP4073941 B2 JP 4073941B2 JP 2006167618 A JP2006167618 A JP 2006167618A JP 2006167618 A JP2006167618 A JP 2006167618A JP 4073941 B2 JP4073941 B2 JP 4073941B2
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- phase sheet
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- 239000007790 solid phase Substances 0.000 title claims description 246
- 239000000758 substrate Substances 0.000 title claims description 155
- 238000004519 manufacturing process Methods 0.000 title claims description 42
- 239000000155 melt Substances 0.000 claims description 92
- 230000002093 peripheral effect Effects 0.000 claims description 76
- 239000000463 material Substances 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000007787 solid Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 description 28
- 239000010703 silicon Substances 0.000 description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 27
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 15
- 238000007654 immersion Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000008646 thermal stress Effects 0.000 description 6
- 238000007598 dipping method Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
- H01L31/182—Special manufacturing methods for polycrystalline Si, e.g. Si ribbon, poly Si ingots, thin films of polycrystalline Si
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/14—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method characterised by the seed, e.g. its crystallographic orientation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02376—Carbon, e.g. diamond-like carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24488—Differential nonuniformity at margin
Description
またスリット溝の幅が1mm以上5mm以下である。
最初に、本発明の一実施の形態の固相シート成長用基体の構成について、図に基づいて説明する。
Claims (9)
- 主面と、前記主面を取り囲む側面とを有し、前記主面は周縁溝によって前記周縁溝より外側の周辺部と前記周縁溝より内側の内側部とに区画され、前記周辺部の前記側面には前記周縁溝から分離された複数のスリット溝が形成され、前記複数のスリット溝のうち互いに隣り合うスリット溝の間に位置する前記側面の部分が平坦面である、固相シート成長用基体。
- 前記周辺部に形成される固相シートと、前記内側部に形成される固相シートとが前記周縁溝に沿って分離して形成されるように前記周縁溝が設けられていることを特徴とする、請求項1に記載の固相シート成長用基体。
- 前記スリット溝の幅が1mm以上5mm以下であることを特徴とする、請求項1または2に記載の固相シート成長用基体。
- 前記スリット溝の深さが1mm以上であることを特徴とする、請求項1〜3のいずれかに記載の固相シート成長用基体。
- 前記スリット溝を複数個有し、隣り合う前記スリット溝の間隔が1mm以上であることを特徴とする、請求項1〜4のいずれかに記載の固相シート成長用基体。
- 請求項1〜5のいずれかに記載の前記固相シート成長用基体を融液に浸漬させ、前記融液を材料として前記固相シート成長用基体の前記主面に固相シートを成長させることを特徴とする、固相シートの製造方法。
- 前記固相シート成長用基体を前記融液に浸漬させる際に、前記スリット溝の一部分が浸漬され、前記スリット溝の一部分が浸漬されないことを特徴とする、請求項6に記載の固相シートの製造方法。
- 前記固相シート成長用基体が前記スリット溝を複数個有し、坩堝の内部に前記融液が入れられており、前記固相シート成長用基体が前記坩堝の内壁から前記スリット溝の間隔よりも長い距離を保って浸漬されることを特徴とする、請求項6または7に記載の固相シートの製造方法。
- 前記固相シートが半導体であることを特徴とする、請求項6〜8のいずれかに記載の固相シートの製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006167618A JP4073941B2 (ja) | 2006-06-16 | 2006-06-16 | 固相シート成長用基体および固相シートの製造方法 |
PCT/JP2007/060600 WO2007145063A1 (ja) | 2006-06-16 | 2007-05-24 | 固相シート成長用基体および固相シートの製造方法 |
CN2007800220353A CN101466877B (zh) | 2006-06-16 | 2007-05-24 | 固相片生长基体和固相片的制造方法 |
EP07744034A EP2037008A4 (en) | 2006-06-16 | 2007-05-24 | SUBSTRATE FOR THE GROWTH OF SOLID PHASE SURFACES AND METHOD FOR THE PRODUCTION OF SOLID PHASE SURFACES |
US12/303,811 US7883997B2 (en) | 2006-06-16 | 2007-05-24 | Solid-phase sheet growing substrate and method of manufacturing solid-phase sheet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006167618A JP4073941B2 (ja) | 2006-06-16 | 2006-06-16 | 固相シート成長用基体および固相シートの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007331997A JP2007331997A (ja) | 2007-12-27 |
JP4073941B2 true JP4073941B2 (ja) | 2008-04-09 |
Family
ID=38831582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006167618A Expired - Fee Related JP4073941B2 (ja) | 2006-06-16 | 2006-06-16 | 固相シート成長用基体および固相シートの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7883997B2 (ja) |
EP (1) | EP2037008A4 (ja) |
JP (1) | JP4073941B2 (ja) |
CN (1) | CN101466877B (ja) |
WO (1) | WO2007145063A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090091562A (ko) * | 2008-02-25 | 2009-08-28 | 엘지전자 주식회사 | 태양전지 및 그 제조방법 |
JP5213037B2 (ja) * | 2008-08-22 | 2013-06-19 | シャープ株式会社 | 半導体の製造方法および半導体製造装置 |
US9084838B2 (en) | 2011-02-04 | 2015-07-21 | Kimberly-Clark Worldwide, Inc. | Feminine care absorbent article for use in warm climates |
US8911681B2 (en) | 2011-09-12 | 2014-12-16 | Kimberly-Clark Worldwide, Inc. | Wetness indicator having varied hues |
US9102514B2 (en) * | 2013-03-22 | 2015-08-11 | Freescale Semiconductor, Inc | Inhibiting propagation of surface cracks in a MEMS Device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3902452A1 (de) | 1989-01-27 | 1990-08-02 | Heliotronic Gmbh | Mit einer strukturierten oberflaeche versehene substrate fuer das aufwachsen von erstarrenden schichten aus schmelzen, insbesondere von halbleitermaterial |
JPH0416836A (ja) | 1990-05-11 | 1992-01-21 | Canon Inc | 画像形成装置 |
JP4121697B2 (ja) * | 1999-12-27 | 2008-07-23 | シャープ株式会社 | 結晶シートの製造方法およびその製造装置 |
JP4011335B2 (ja) * | 2000-12-05 | 2007-11-21 | シャープ株式会社 | 固相シートの製造方法 |
WO2004016836A1 (ja) * | 2002-08-12 | 2004-02-26 | Sharp Kabushiki Kaisha | 板状シリコン、板状シリコンの製造方法、太陽電池および板状シリコン製造用基板 |
JP4115232B2 (ja) * | 2002-10-01 | 2008-07-09 | シャープ株式会社 | 板状シリコン、板状シリコンの製造方法、板状シリコンの製造用基板および太陽電池 |
JP2004319621A (ja) | 2003-04-14 | 2004-11-11 | Sharp Corp | 基板、板状体およびその製造方法、および板状体から作製した太陽電池 |
JP2005277186A (ja) * | 2004-03-25 | 2005-10-06 | Sharp Corp | シートおよびその製造方法、ならびにシートを用いた太陽電池 |
-
2006
- 2006-06-16 JP JP2006167618A patent/JP4073941B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-24 WO PCT/JP2007/060600 patent/WO2007145063A1/ja active Search and Examination
- 2007-05-24 US US12/303,811 patent/US7883997B2/en not_active Expired - Fee Related
- 2007-05-24 EP EP07744034A patent/EP2037008A4/en not_active Withdrawn
- 2007-05-24 CN CN2007800220353A patent/CN101466877B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20100159677A1 (en) | 2010-06-24 |
EP2037008A4 (en) | 2012-11-28 |
CN101466877A (zh) | 2009-06-24 |
CN101466877B (zh) | 2012-10-10 |
EP2037008A1 (en) | 2009-03-18 |
WO2007145063A1 (ja) | 2007-12-21 |
US7883997B2 (en) | 2011-02-08 |
JP2007331997A (ja) | 2007-12-27 |
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