JP4047727B2 - 流体流れを強化した半導体基板用高圧プロセスチャンバ - Google Patents
流体流れを強化した半導体基板用高圧プロセスチャンバ Download PDFInfo
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- JP4047727B2 JP4047727B2 JP2002581561A JP2002581561A JP4047727B2 JP 4047727 B2 JP4047727 B2 JP 4047727B2 JP 2002581561 A JP2002581561 A JP 2002581561A JP 2002581561 A JP2002581561 A JP 2002581561A JP 4047727 B2 JP4047727 B2 JP 4047727B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
半導体基板の高圧プロセスチャンバが、高圧プロセスキャビテーと、複数の噴射ノズルと、第一及び第二出口ポートとを具備している。
該高圧プロセスキャビテーは、高圧プロセス時に該半導体基板を保持している。該複数の噴射ノズルは渦角度で該高圧プロセスキャビテーの中へ向けて配向されており、かつ該複数の噴射ノズルは該半導体基板の表面の上をおおう渦を発生するべく使用できるものである。該第一及び第二出口ポートは該複数の噴射ノズルの中心近傍に配置されていて、該第一及び第二出口ポートは、第一番目に該第一出口ポートからの出口作用を提供するセグメントであり、第二番目に該第二出口ポートからの出口作用を提供するセグメントである。
本発明における好適な圧力チャンバは、好ましくは半導体ウェーハの超臨界プロセスに使用される。好ましくは、好適な圧力チャンバは超臨界プロセスモジュールの一部を構成している。好ましくは、超臨界プロセスモジュールは、フォトレジスト、フォトレジスト残留物及び半導体ウェーハからのエッチング残留物のような材料を除去するために使用される。別に、超臨界プロセスモジュールはフォトレジストディベロップメントのような、半導体ウェーハの他超臨界プロセスのために使用される。
Claims (10)
- 半導体基板の高圧プロセスチャンバであって、超臨界プロセスキャビテーと、複数の噴射ノズルと、プレナムと、シャトルピースとを具備する高圧プロセスチャンバにおいて:
a.該超臨界プロセスキャビテーは、該半導体基板用のものであり;
b.該複数の噴射ノズルは渦角度で該高圧プロセスキャビテーの中へ向けて配向されており、該複数の噴射ノズルは該半導体基板の表面の上をおおう渦を発生するべく使用できるものであり;
c.該プレナムは、該複数の噴射ノズルに接続されていて、該プレナムの幅は該複数の噴射ノズルの幅より大きくて;
d.該シャトルピースは第一及び第二出口ポートに接続されており、該第一及び第二出口ポートは該複数の噴射ノズルの中心近傍に配置されていて、そして該半導体基板の該表面をおおって位置決めされるべく形成されており、該第一及び第二出口ポートは、第一番目に該第一出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は該第一出口ポートに集まるようになっており、第二番目に該第二出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は該第二出口ポートに集まるようになっている;高圧プロセスチャンバ。 - 該超臨界プロセスキャビテーが、半導体基板保持面と、半導体ウェーハ保持面に対向している出口ポート面と、該半導体基板保持面を該出口ポート面へ接続する柱面とを備えている、請求項1に記載の高圧プロセスチャンバ。
- 該柱面が該複数の噴射ノズルを含んでいる、請求項2に記載の高圧プロセスチャンバ。
- 該出口ポート面が該第一及び第二出口ポートを含んでいる請求項2に記載の高圧プロセスチャンバ。
- 該超臨界プロセスキャビテーが、該半導体基板保持面と、該出口面との間でほぼ一定の距離となっている、請求項4に記載の高圧プロセスチャンバ。
- 該超臨界プロセスキャビテーが、該半導体基板保持面と、該出口面との間で一定でない距離となっている、請求項4に記載の高圧プロセスチャンバ。
- 該一定でない距離が、該出口ポート面の外端部において最大であり、該出口ポート面の中心において最小である、請求項6に記載の高圧プロセスチャンバ。
- 該一定でない距離が、該出口ポート面の外端部における第一距離と、該出口ポート面の該外端部と中心との間の中間位置における第二距離と、該出口ポート面の該中心における第三距離とを備えていて;さらに該第一距離及び該第三距離は、各々該第二距離よりも長い;
請求項6に記載の高圧プロセスチャンバ。 - 半導体基板の高圧プロセスチャンバであって、超臨界プロセスキャビテーと、複数の噴射ノズルと、プレナムとシャトルピースとを具備する高圧プロセスチャンバにおいて:
a.該超臨界プロセスキャビテーが、半導体基板保持面と、半導体基板保持面に対向している出口ポート面と、該半導体基板保持面を該出口ポート面へ接続する柱面とを備えていて;
b.該複数の噴射ノズルは、該柱面に配置されかつ渦角度で配向されており、該複数の噴射ノズルは該半導体基板の表面とほぼ同一の高さに形成されていて、そして該半導体基板の表面の上をおおう渦を発生するべく使用できるものであり;
c.該プレナムは、該複数の噴射ノズルに接続されていて、該プレナムの幅は該複数の噴射ノズルの幅より大きくて;
d.該シャトルピースは第一及び第二出口ポートに接続されており、該第一及び第二出口ポートは該複数の噴射ノズルの中心近傍に配置されていて、そして該半導体基板の該表面をおおって位置決めされるべく形成されており、該第一及び第二出口ポートは、第一番目に該第一出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は 該第一出口ポートに集まるようになっており、第二番目に該第二出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は該第二出口ポートに集まるようになっている;高圧プロセスチャンバ。 - 半導体基板の高圧プロセスチャンバであって、超臨界プロセスキャビテーと、複数の噴射ノズルと、プレナムと、シャトルピースとを具備する高圧プロセスチャンバにおいて:
a.該超臨界プロセスキャビテーが、半導体基板保持面と、半導体ウェーハ保持面に対向している出口ポート面と、該半導体基板保持面を該出口ポート面へ接続する柱面とを備えていて;該超臨界プロセスキャビテーが、該半導体基板保持面と、該出口面との間で一定でない距離となっており;該一定でない距離が、該出口ポート面の外端部における第一距離と、該出口ポート面の該外端部と中心との間の中間位置における第二距離と、該出口ポート面の該中心における第三距離とを備えていて;さらに該第一距離及び該第三距離は、各々該第二距離よりも長くて;
b.該複数の噴射ノズルは、該柱面に配置されかつ渦角度で配向されており、かつ該複数の噴射ノズルは該半導体基板の表面の上をおおう渦を発生するべく使用できるものであり、そして超臨界プロセス流体を用いて該半導体基板の表面から異物を除去し、かつ該半導体基板の表面の微細構造体を洗浄するべく使用できるものであって;
c.該プレナムは、該複数の噴射ノズルに接続されていて、該プレナムの幅は該複数の噴射ノズルの幅より大きくて;
d.該シャトルピースは第一及び第二出口ポートに接続されており、該第一及び第二出口ポートは該複数の噴射ノズルの中心近傍に配置されていて、そして該半導体基板の該表面をおおって位置決めされるべく形成されており、該第一及び第二出口ポートは、第一番目に該第一出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は該第一出口ポートに集まるようになっており、第二番目に該第二出口ポートだけからの出口作用を提供するセグメントであり、その場合該渦は該第二出口ポートに集まるようになっている;高圧プロセスチャンバ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US28313201P | 2001-04-10 | 2001-04-10 | |
PCT/US2002/011461 WO2002084709A2 (en) | 2001-04-10 | 2002-04-10 | High pressure processing chamber for semiconductor substrate including flow enhancing features |
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JP2005504431A JP2005504431A (ja) | 2005-02-10 |
JP4047727B2 true JP4047727B2 (ja) | 2008-02-13 |
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JP2002581561A Expired - Fee Related JP4047727B2 (ja) | 2001-04-10 | 2002-04-10 | 流体流れを強化した半導体基板用高圧プロセスチャンバ |
Country Status (10)
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US (1) | US20020189543A1 (ja) |
EP (1) | EP1573779A4 (ja) |
JP (1) | JP4047727B2 (ja) |
KR (1) | KR100777892B1 (ja) |
CN (1) | CN100392796C (ja) |
AU (1) | AU2002252637A1 (ja) |
CA (1) | CA2444296A1 (ja) |
IL (1) | IL158340A0 (ja) |
TW (1) | TW589657B (ja) |
WO (1) | WO2002084709A2 (ja) |
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-
2002
- 2002-04-10 WO PCT/US2002/011461 patent/WO2002084709A2/en active Search and Examination
- 2002-04-10 AU AU2002252637A patent/AU2002252637A1/en not_active Abandoned
- 2002-04-10 TW TW091107232A patent/TW589657B/zh not_active IP Right Cessation
- 2002-04-10 KR KR1020037013332A patent/KR100777892B1/ko not_active IP Right Cessation
- 2002-04-10 CN CNB028116585A patent/CN100392796C/zh not_active Expired - Fee Related
- 2002-04-10 CA CA002444296A patent/CA2444296A1/en not_active Abandoned
- 2002-04-10 US US10/121,791 patent/US20020189543A1/en not_active Abandoned
- 2002-04-10 JP JP2002581561A patent/JP4047727B2/ja not_active Expired - Fee Related
- 2002-04-10 IL IL15834002A patent/IL158340A0/xx unknown
- 2002-04-10 EP EP02721721A patent/EP1573779A4/en not_active Withdrawn
Also Published As
Publication number | Publication date |
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KR100777892B1 (ko) | 2007-11-21 |
EP1573779A2 (en) | 2005-09-14 |
WO2002084709A2 (en) | 2002-10-24 |
US20020189543A1 (en) | 2002-12-19 |
EP1573779A4 (en) | 2006-11-15 |
AU2002252637A1 (en) | 2002-10-28 |
TW589657B (en) | 2004-06-01 |
AU2002252637A8 (en) | 2012-03-08 |
KR20040067871A (ko) | 2004-07-30 |
CN100392796C (zh) | 2008-06-04 |
JP2005504431A (ja) | 2005-02-10 |
CN1630931A (zh) | 2005-06-22 |
WO2002084709A3 (en) | 2012-02-16 |
CA2444296A1 (en) | 2002-10-24 |
IL158340A0 (en) | 2004-05-12 |
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