IL158340A0 - High pressure processing chamber for semiconductor substrate including flow enhancing features - Google Patents

High pressure processing chamber for semiconductor substrate including flow enhancing features

Info

Publication number
IL158340A0
IL158340A0 IL15834002A IL15834002A IL158340A0 IL 158340 A0 IL158340 A0 IL 158340A0 IL 15834002 A IL15834002 A IL 15834002A IL 15834002 A IL15834002 A IL 15834002A IL 158340 A0 IL158340 A0 IL 158340A0
Authority
IL
Israel
Prior art keywords
semiconductor substrate
high pressure
processing chamber
substrate including
pressure processing
Prior art date
Application number
IL15834002A
Other languages
English (en)
Original Assignee
Supercritical Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Supercritical Systems Inc filed Critical Supercritical Systems Inc
Publication of IL158340A0 publication Critical patent/IL158340A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
IL15834002A 2001-04-10 2002-04-10 High pressure processing chamber for semiconductor substrate including flow enhancing features IL158340A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28313201P 2001-04-10 2001-04-10
PCT/US2002/011461 WO2002084709A2 (en) 2001-04-10 2002-04-10 High pressure processing chamber for semiconductor substrate including flow enhancing features

Publications (1)

Publication Number Publication Date
IL158340A0 true IL158340A0 (en) 2004-05-12

Family

ID=23084672

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15834002A IL158340A0 (en) 2001-04-10 2002-04-10 High pressure processing chamber for semiconductor substrate including flow enhancing features

Country Status (10)

Country Link
US (1) US20020189543A1 (xx)
EP (1) EP1573779A4 (xx)
JP (1) JP4047727B2 (xx)
KR (1) KR100777892B1 (xx)
CN (1) CN100392796C (xx)
AU (1) AU2002252637A1 (xx)
CA (1) CA2444296A1 (xx)
IL (1) IL158340A0 (xx)
TW (1) TW589657B (xx)
WO (1) WO2002084709A2 (xx)

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US7225820B2 (en) * 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
KR100794588B1 (ko) * 2006-08-10 2008-01-17 세메스 주식회사 매엽식 기판 처리 장치 및 방법
US8298338B2 (en) * 2007-12-26 2012-10-30 Samsung Electronics Co., Ltd. Chemical vapor deposition apparatus
KR101932035B1 (ko) * 2012-02-08 2018-12-26 삼성전자주식회사 기판 처리용 유체 공급 시스템 및 방법
CN105336723B (zh) 2014-07-28 2018-09-14 通用电气公司 半导体模块、半导体模块组件及半导体装置
KR101623411B1 (ko) 2014-11-03 2016-05-24 세메스 주식회사 기판 처리 장치
KR101910801B1 (ko) * 2016-10-26 2019-01-07 세메스 주식회사 기판 처리 장치 및 방법
KR102358561B1 (ko) 2017-06-08 2022-02-04 삼성전자주식회사 기판 처리 장치 및 집적회로 소자 제조 장치
FI128855B (en) * 2019-09-24 2021-01-29 Picosun Oy FLUID DISTRIBUTOR FOR THIN FILM GROWING EQUIPMENT, RELATED EQUIPMENT AND METHODS

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Also Published As

Publication number Publication date
KR100777892B1 (ko) 2007-11-21
EP1573779A2 (en) 2005-09-14
WO2002084709A2 (en) 2002-10-24
US20020189543A1 (en) 2002-12-19
EP1573779A4 (en) 2006-11-15
AU2002252637A1 (en) 2002-10-28
TW589657B (en) 2004-06-01
JP4047727B2 (ja) 2008-02-13
AU2002252637A8 (en) 2012-03-08
KR20040067871A (ko) 2004-07-30
CN100392796C (zh) 2008-06-04
JP2005504431A (ja) 2005-02-10
CN1630931A (zh) 2005-06-22
WO2002084709A3 (en) 2012-02-16
CA2444296A1 (en) 2002-10-24

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