JP4036928B2 - 成膜装置とそのターゲット交換方法 - Google Patents

成膜装置とそのターゲット交換方法 Download PDF

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Publication number
JP4036928B2
JP4036928B2 JP25343297A JP25343297A JP4036928B2 JP 4036928 B2 JP4036928 B2 JP 4036928B2 JP 25343297 A JP25343297 A JP 25343297A JP 25343297 A JP25343297 A JP 25343297A JP 4036928 B2 JP4036928 B2 JP 4036928B2
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JP
Japan
Prior art keywords
target
electrode plate
holding
opening
replacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP25343297A
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English (en)
Japanese (ja)
Other versions
JPH10147863A (ja
JPH10147863A5 (enExample
Inventor
貴志 末吉
健太郎 新郷
初彦 柴崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP25343297A priority Critical patent/JP4036928B2/ja
Publication of JPH10147863A publication Critical patent/JPH10147863A/ja
Publication of JPH10147863A5 publication Critical patent/JPH10147863A5/ja
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Publication of JP4036928B2 publication Critical patent/JP4036928B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP25343297A 1996-09-18 1997-09-18 成膜装置とそのターゲット交換方法 Expired - Fee Related JP4036928B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25343297A JP4036928B2 (ja) 1996-09-18 1997-09-18 成膜装置とそのターゲット交換方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-246005 1996-09-18
JP24600596 1996-09-18
JP25343297A JP4036928B2 (ja) 1996-09-18 1997-09-18 成膜装置とそのターゲット交換方法

Publications (3)

Publication Number Publication Date
JPH10147863A JPH10147863A (ja) 1998-06-02
JPH10147863A5 JPH10147863A5 (enExample) 2005-06-16
JP4036928B2 true JP4036928B2 (ja) 2008-01-23

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JP25343297A Expired - Fee Related JP4036928B2 (ja) 1996-09-18 1997-09-18 成膜装置とそのターゲット交換方法

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JP (1) JP4036928B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3834757B2 (ja) * 2004-05-31 2006-10-18 信喜 六倉 多層薄膜連続形成用超高真空スパッタリング装置及び多層薄膜連続形成用超高真空スパッタリング方法
JP4667057B2 (ja) * 2005-02-08 2011-04-06 キヤノン株式会社 成膜装置および成膜方法
JP4734020B2 (ja) * 2005-05-02 2011-07-27 株式会社アルバック 成膜装置
CN101815806B (zh) 2007-10-04 2014-03-12 株式会社爱发科 成膜装置及成膜方法
JP4633816B2 (ja) * 2008-03-31 2011-02-16 株式会社フェローテック ターゲット交換式プラズマ発生装置
JP5443181B2 (ja) * 2010-01-16 2014-03-19 独立行政法人国立高等専門学校機構 マルチターゲットスパッタ装置
CN104233192A (zh) * 2014-08-27 2014-12-24 宁波英飞迈材料科技有限公司 一种换靶装置及其使用方法
SG11201901359PA (en) * 2017-07-25 2019-03-28 Ulvac Inc Cathode unit for sputtering apparatus
JP2022058195A (ja) * 2020-09-30 2022-04-11 芝浦メカトロニクス株式会社 成膜装置
CN112647039A (zh) * 2020-12-08 2021-04-13 长春金工表面工程技术有限公司 用于大型模具表面处理的全自动氮化处理系统
JP7662351B2 (ja) * 2021-02-18 2025-04-15 キヤノントッキ株式会社 成膜装置、電子デバイスの製造方法及び成膜源のメンテナンス方法

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Publication number Publication date
JPH10147863A (ja) 1998-06-02

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