JP4033731B2 - ケイ素化合物の製造法 - Google Patents

ケイ素化合物の製造法 Download PDF

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Publication number
JP4033731B2
JP4033731B2 JP2002212992A JP2002212992A JP4033731B2 JP 4033731 B2 JP4033731 B2 JP 4033731B2 JP 2002212992 A JP2002212992 A JP 2002212992A JP 2002212992 A JP2002212992 A JP 2002212992A JP 4033731 B2 JP4033731 B2 JP 4033731B2
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Japan
Prior art keywords
group
general formula
silsesquioxane
cage
ppm
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Expired - Fee Related
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JP2002212992A
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English (en)
Japanese (ja)
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JP2004051848A (ja
JP2004051848A5 (enExample
Inventor
齋藤  秀夫
池田  正紀
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Asahi Kasei Corp
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Asahi Kasei Corp
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Priority to JP2002212992A priority Critical patent/JP4033731B2/ja
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Publication of JP2004051848A5 publication Critical patent/JP2004051848A5/ja
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Publication of JP4033731B2 publication Critical patent/JP4033731B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Silicon Polymers (AREA)
JP2002212992A 2002-07-22 2002-07-22 ケイ素化合物の製造法 Expired - Fee Related JP4033731B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002212992A JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002212992A JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

Publications (3)

Publication Number Publication Date
JP2004051848A JP2004051848A (ja) 2004-02-19
JP2004051848A5 JP2004051848A5 (enExample) 2005-10-27
JP4033731B2 true JP4033731B2 (ja) 2008-01-16

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ID=31935752

Family Applications (1)

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JP2002212992A Expired - Fee Related JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

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JP (1) JP4033731B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006045516A (ja) * 2004-06-28 2006-02-16 Asahi Kasei Corp 含シルセスキオキサン化合物
EP1856190A4 (en) * 2005-03-07 2011-02-09 Hybrid Plastics Inc PROCESS FOR THE PREPARATION OF POSS MONOMERS
JPWO2008041772A1 (ja) * 2006-10-05 2010-02-04 旭化成ケミカルズ株式会社 籠状シルセスキオキサン化合物の粉体の製造方法
JP5275589B2 (ja) 2007-08-02 2013-08-28 日本曹達株式会社 シルセスキオキサンを含有する組成物及びシルセスキオキサン含有ヒドロキシアルキルセルロース樹脂組成物
EP2433978B1 (en) * 2007-09-07 2016-07-27 NeXolve Corporation Polyimide polymer with oligomeric silsesquioxane
JP5119843B2 (ja) * 2007-10-09 2013-01-16 宇部興産株式会社 カゴ型シルセスキオキサン誘導体の製造方法
US8445573B2 (en) 2008-05-12 2013-05-21 Asahi Kasei Chemicals Corporation Polyphenylene ether resin composition having narrow molecular weight distribution

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JP2004051848A (ja) 2004-02-19

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