JP4026376B2 - 現像液の供給装置 - Google Patents

現像液の供給装置 Download PDF

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Publication number
JP4026376B2
JP4026376B2 JP2002050841A JP2002050841A JP4026376B2 JP 4026376 B2 JP4026376 B2 JP 4026376B2 JP 2002050841 A JP2002050841 A JP 2002050841A JP 2002050841 A JP2002050841 A JP 2002050841A JP 4026376 B2 JP4026376 B2 JP 4026376B2
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Japan
Prior art keywords
developer
concentration
supply
storage tank
densitometer
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Expired - Fee Related
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JP2002050841A
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English (en)
Japanese (ja)
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JP2003248326A (ja
Inventor
嘉文 板東
崇弘 柴田
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Mitsubishi Chemical Engineering Corp
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Mitsubishi Chemical Engineering Corp
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Priority to JP2002050841A priority Critical patent/JP4026376B2/ja
Priority to TW91109164A priority patent/TWI310121B/zh
Priority to CN 02120200 priority patent/CN1441321A/zh
Publication of JP2003248326A publication Critical patent/JP2003248326A/ja
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Publication of JP4026376B2 publication Critical patent/JP4026376B2/ja
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
JP2002050841A 2002-02-27 2002-02-27 現像液の供給装置 Expired - Fee Related JP4026376B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002050841A JP4026376B2 (ja) 2002-02-27 2002-02-27 現像液の供給装置
TW91109164A TWI310121B (enExample) 2002-02-27 2002-05-02
CN 02120200 CN1441321A (zh) 2002-02-27 2002-05-24 显影液供给装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002050841A JP4026376B2 (ja) 2002-02-27 2002-02-27 現像液の供給装置

Publications (2)

Publication Number Publication Date
JP2003248326A JP2003248326A (ja) 2003-09-05
JP4026376B2 true JP4026376B2 (ja) 2007-12-26

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ID=27784573

Family Applications (1)

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JP2002050841A Expired - Fee Related JP4026376B2 (ja) 2002-02-27 2002-02-27 現像液の供給装置

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JP (1) JP4026376B2 (enExample)
CN (1) CN1441321A (enExample)
TW (1) TWI310121B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7685895B2 (en) * 2004-01-29 2010-03-30 Nas Giken Inc. Substrate inspection device, substrate inspection method, and recovery tool
KR101144643B1 (ko) * 2004-06-30 2012-05-08 엘지디스플레이 주식회사 칼라 필터 기판 제조 방법 및 포토 장비
US7467939B2 (en) * 2006-05-03 2008-12-23 3D Systems, Inc. Material delivery tension and tracking system for use in solid imaging
WO2008065755A1 (fr) * 2006-11-30 2008-06-05 Mitsubishi Chemical Engineering Corporation Procédé de régulation d'une concentration de solution de développement, appareil de préparation de la solution de développement et solution de développement
CN101639633B (zh) * 2008-07-29 2012-02-29 和舰科技(苏州)有限公司 一种显影液供给管路
US7854558B2 (en) * 2009-02-16 2010-12-21 Eastman Kodak Company Developer waste reuse
CN102662311B (zh) * 2012-04-13 2015-12-02 京东方科技集团股份有限公司 一种化学品输送装置、显影设备和显影系统
CN105954983B (zh) * 2016-07-18 2019-11-08 京东方科技集团股份有限公司 显影方法及系统
JP2018120895A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
CN107300838A (zh) * 2017-08-08 2017-10-27 武汉华星光电技术有限公司 显影液稀释系统
CN108803258B (zh) * 2018-05-31 2021-04-27 深圳市华星光电半导体显示技术有限公司 显影控制系统及显影控制方法
JP7202229B2 (ja) * 2019-03-20 2023-01-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

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Publication number Publication date
JP2003248326A (ja) 2003-09-05
TWI310121B (enExample) 2009-05-21
CN1441321A (zh) 2003-09-10

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