TWI310121B - - Google Patents
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- Publication number
- TWI310121B TWI310121B TW91109164A TW91109164A TWI310121B TW I310121 B TWI310121 B TW I310121B TW 91109164 A TW91109164 A TW 91109164A TW 91109164 A TW91109164 A TW 91109164A TW I310121 B TWI310121 B TW I310121B
- Authority
- TW
- Taiwan
- Prior art keywords
- concentration
- liquid
- supply
- developing
- temperature
- Prior art date
Links
- 239000007788 liquid Substances 0.000 claims description 156
- 239000011347 resin Substances 0.000 claims description 54
- 229920005989 resin Polymers 0.000 claims description 54
- 239000000243 solution Substances 0.000 claims description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 22
- 238000011084 recovery Methods 0.000 claims description 22
- 238000010790 dilution Methods 0.000 claims description 21
- 239000012895 dilution Substances 0.000 claims description 21
- 239000011550 stock solution Substances 0.000 claims description 19
- 239000003513 alkali Substances 0.000 claims description 17
- 238000001514 detection method Methods 0.000 claims description 11
- 235000015073 liquid stocks Nutrition 0.000 claims description 9
- 238000004364 calculation method Methods 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 6
- 239000011344 liquid material Substances 0.000 claims 1
- 238000003384 imaging method Methods 0.000 description 18
- 238000005259 measurement Methods 0.000 description 18
- 238000007726 management method Methods 0.000 description 15
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 11
- 239000000758 substrate Substances 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000002079 cooperative effect Effects 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000006193 liquid solution Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- ZXVOCOLRQJZVBW-UHFFFAOYSA-N azane;ethanol Chemical compound N.CCO ZXVOCOLRQJZVBW-UHFFFAOYSA-N 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002050841A JP4026376B2 (ja) | 2002-02-27 | 2002-02-27 | 現像液の供給装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI310121B true TWI310121B (enExample) | 2009-05-21 |
Family
ID=27784573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW91109164A TWI310121B (enExample) | 2002-02-27 | 2002-05-02 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4026376B2 (enExample) |
| CN (1) | CN1441321A (enExample) |
| TW (1) | TWI310121B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4664818B2 (ja) * | 2004-01-29 | 2011-04-06 | 有限会社Ｎａｓ技研 | 基板検査装置と基板検査方法と回収治具 |
| KR101144643B1 (ko) * | 2004-06-30 | 2012-05-08 | 엘지디스플레이 주식회사 | 칼라 필터 기판 제조 방법 및 포토 장비 |
| US7467939B2 (en) * | 2006-05-03 | 2008-12-23 | 3D Systems, Inc. | Material delivery tension and tracking system for use in solid imaging |
| KR101446619B1 (ko) * | 2006-11-30 | 2014-10-01 | 미츠비시 가가쿠 엔지니어링 가부시키가이샤 | 현상액의 농도 조절 방법과 제조 장치 및 현상액 |
| CN101639633B (zh) * | 2008-07-29 | 2012-02-29 | 和舰科技(苏州)有限公司 | 一种显影液供给管路 |
| US7854558B2 (en) * | 2009-02-16 | 2010-12-21 | Eastman Kodak Company | Developer waste reuse |
| CN102662311B (zh) * | 2012-04-13 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种化学品输送装置、显影设备和显影系统 |
| CN105954983B (zh) * | 2016-07-18 | 2019-11-08 | 京东方科技集团股份有限公司 | 显影方法及系统 |
| JP2018120895A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
| CN107300838A (zh) * | 2017-08-08 | 2017-10-27 | 武汉华星光电技术有限公司 | 显影液稀释系统 |
| CN108803258B (zh) * | 2018-05-31 | 2021-04-27 | 深圳市华星光电半导体显示技术有限公司 | 显影控制系统及显影控制方法 |
| JP7202229B2 (ja) * | 2019-03-20 | 2023-01-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
-
2002
- 2002-02-27 JP JP2002050841A patent/JP4026376B2/ja not_active Expired - Fee Related
- 2002-05-02 TW TW91109164A patent/TWI310121B/zh not_active IP Right Cessation
- 2002-05-24 CN CN 02120200 patent/CN1441321A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN1441321A (zh) | 2003-09-10 |
| JP2003248326A (ja) | 2003-09-05 |
| JP4026376B2 (ja) | 2007-12-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |