JP4025384B2 - ３−メタクリロキシプロピルジメチルハロシランまたは３−メタクリロキシプロピルメチルジハロシランの精製方法 - Google Patents
３−メタクリロキシプロピルジメチルハロシランまたは３−メタクリロキシプロピルメチルジハロシランの精製方法 Download PDFInfo
- Publication number
- JP4025384B2 JP4025384B2 JP33633296A JP33633296A JP4025384B2 JP 4025384 B2 JP4025384 B2 JP 4025384B2 JP 33633296 A JP33633296 A JP 33633296A JP 33633296 A JP33633296 A JP 33633296A JP 4025384 B2 JP4025384 B2 JP 4025384B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- methyl
- methacryloxypropylmethyldihalosilane
- methacryloxypropyldimethylhalosilane
- fraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 13
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 16
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 13
- -1 copper halide Chemical class 0.000 claims description 12
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 claims description 11
- 239000005750 Copper hydroxide Substances 0.000 claims description 11
- 229910001956 copper hydroxide Inorganic materials 0.000 claims description 11
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical group [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 9
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 claims description 9
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 claims description 9
- 239000005751 Copper oxide Substances 0.000 claims description 8
- 150000001879 copper Chemical class 0.000 claims description 8
- 229910000431 copper oxide Inorganic materials 0.000 claims description 8
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 8
- 239000005749 Copper compound Substances 0.000 claims description 7
- 150000001880 copper compounds Chemical class 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 239000000047 product Substances 0.000 description 22
- 238000005481 NMR spectroscopy Methods 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 15
- HTWBOBMJMMBRQW-UHFFFAOYSA-N 2-[chloro(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound C[Si](Cl)(C)C(C)COC(=O)C(C)=C HTWBOBMJMMBRQW-UHFFFAOYSA-N 0.000 description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 238000004508 fractional distillation Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- OKQXCDUCLYWRHA-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)Cl OKQXCDUCLYWRHA-UHFFFAOYSA-N 0.000 description 7
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 7
- GORVXBAZVHVBDL-UHFFFAOYSA-N 3-[dimethyl(2-methylprop-2-enoyloxy)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)OC(=O)C(C)=C GORVXBAZVHVBDL-UHFFFAOYSA-N 0.000 description 6
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 6
- AAGGQHFQJFTHCM-UHFFFAOYSA-N [chloro(dimethyl)silyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)Cl AAGGQHFQJFTHCM-UHFFFAOYSA-N 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(i) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 2
- 239000005048 methyldichlorosilane Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- XPUBCCUJVHXZCV-UHFFFAOYSA-N (3,5-ditert-butyl-4-hydroxyphenyl)methyl-dimethylazanium;chloride Chemical compound Cl.CN(C)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 XPUBCCUJVHXZCV-UHFFFAOYSA-N 0.000 description 1
- ZUZHGZTULWBCHC-UHFFFAOYSA-N 2-[chloro(dimethyl)silyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC[Si](C)(C)Cl ZUZHGZTULWBCHC-UHFFFAOYSA-N 0.000 description 1
- DQGVKXOSDKTVKS-UHFFFAOYSA-N C[SiH](C)Br Chemical compound C[SiH](C)Br DQGVKXOSDKTVKS-UHFFFAOYSA-N 0.000 description 1
- HZVNXTPPWQVJAZ-UHFFFAOYSA-N C[SiH](C)I Chemical compound C[SiH](C)I HZVNXTPPWQVJAZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical class [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000336 copper(I) sulfate Inorganic materials 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- WIVXEZIMDUGYRW-UHFFFAOYSA-L copper(i) sulfate Chemical compound [Cu+].[Cu+].[O-]S([O-])(=O)=O WIVXEZIMDUGYRW-UHFFFAOYSA-L 0.000 description 1
- XKBAVCUSVIEVHR-UHFFFAOYSA-N dibromo(methyl)silane Chemical compound C[SiH](Br)Br XKBAVCUSVIEVHR-UHFFFAOYSA-N 0.000 description 1
- HBDHEULZOVVYQR-UHFFFAOYSA-N difluoro(methyl)silicon Chemical compound C[Si](F)F HBDHEULZOVVYQR-UHFFFAOYSA-N 0.000 description 1
- WJBRDUUEBCBFDS-UHFFFAOYSA-N diiodo(methyl)silane Chemical compound C[SiH](I)I WJBRDUUEBCBFDS-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- JMEWTHPANUTEHG-UHFFFAOYSA-N fluoro(dimethyl)silicon Chemical compound C[Si](C)F JMEWTHPANUTEHG-UHFFFAOYSA-N 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33633296A JP4025384B2 (ja) | 1996-12-02 | 1996-12-02 | ３−メタクリロキシプロピルジメチルハロシランまたは３−メタクリロキシプロピルメチルジハロシランの精製方法 |
| US08/982,768 US5847178A (en) | 1996-12-02 | 1997-12-02 | Method for purifying 3-methacryloxypropyldimethylhalosilanes and 3-methacryloxypropylmethyldihalosilanes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33633296A JP4025384B2 (ja) | 1996-12-02 | 1996-12-02 | ３−メタクリロキシプロピルジメチルハロシランまたは３−メタクリロキシプロピルメチルジハロシランの精製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10158282A JPH10158282A (ja) | 1998-06-16 |
| JPH10158282A5 JPH10158282A5 (enExample) | 2004-11-11 |
| JP4025384B2 true JP4025384B2 (ja) | 2007-12-19 |
Family
ID=18298031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33633296A Expired - Fee Related JP4025384B2 (ja) | 1996-12-02 | 1996-12-02 | ３−メタクリロキシプロピルジメチルハロシランまたは３−メタクリロキシプロピルメチルジハロシランの精製方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US5847178A (enExample) |
| JP (1) | JP4025384B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016005757A1 (en) * | 2014-07-11 | 2016-01-14 | Geo Specialty Chemicals Uk Limited | Process for preparation of 3-methacryloxypropyldimethylchlorosilane in continuous flow reactor |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7290009B1 (en) * | 1999-08-25 | 2007-10-30 | The Trustees Of Columbia University In The City Of New York | System and method for allocating resources using spot market and derivative market techniques |
| DE102008042679A1 (de) * | 2008-10-08 | 2010-04-15 | Wacker Chemie Ag | Verfahren zur Darstellung von (Meth-)Acrylsilanen |
| CR20240287A (es) * | 2021-12-15 | 2024-10-04 | Gelest Inc | Macrómeros de polisiloxano de alta pureza y método para fabricar los mismos |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2851477B2 (ja) * | 1992-03-25 | 1999-01-27 | 東レ・ダウコーニング・シリコーン株式会社 | アクリロキシ基またはメタクリロキシ基含有有機ケイ素化合物の製造方法 |
| JP2980514B2 (ja) * | 1994-03-31 | 1999-11-22 | 信越化学工業株式会社 | アクリル官能性有機ケイ素化合物の蒸留時の安定化方法 |
-
1996
- 1996-12-02 JP JP33633296A patent/JP4025384B2/ja not_active Expired - Fee Related
-
1997
- 1997-12-02 US US08/982,768 patent/US5847178A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016005757A1 (en) * | 2014-07-11 | 2016-01-14 | Geo Specialty Chemicals Uk Limited | Process for preparation of 3-methacryloxypropyldimethylchlorosilane in continuous flow reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10158282A (ja) | 1998-06-16 |
| US5847178A (en) | 1998-12-08 |
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