JP4019645B2 - 重合性組成物 - Google Patents

重合性組成物 Download PDF

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Publication number
JP4019645B2
JP4019645B2 JP2001067938A JP2001067938A JP4019645B2 JP 4019645 B2 JP4019645 B2 JP 4019645B2 JP 2001067938 A JP2001067938 A JP 2001067938A JP 2001067938 A JP2001067938 A JP 2001067938A JP 4019645 B2 JP4019645 B2 JP 4019645B2
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JP
Japan
Prior art keywords
group
acrylate
methacrylate
parts
examples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001067938A
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English (en)
Japanese (ja)
Other versions
JP2002265512A (ja
Inventor
隆彦 上杉
真史 有島
弾生 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP2001067938A priority Critical patent/JP4019645B2/ja
Priority to TW091104454A priority patent/TWI304816B/zh
Priority to PCT/JP2002/002303 priority patent/WO2002072640A1/ja
Priority to KR1020027015166A priority patent/KR100865832B1/ko
Priority to US10/276,307 priority patent/US6900250B2/en
Priority to CNB028006216A priority patent/CN1241950C/zh
Publication of JP2002265512A publication Critical patent/JP2002265512A/ja
Application granted granted Critical
Publication of JP4019645B2 publication Critical patent/JP4019645B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/22—Esters containing nitrogen
    • C08F222/225—Esters containing nitrogen the ester chains containing seven or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/24—Esters containing sulfur
    • C08F222/245—Esters containing sulfur the ester chains containing seven or more carbon atoms

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2001067938A 2001-03-12 2001-03-12 重合性組成物 Expired - Fee Related JP4019645B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001067938A JP4019645B2 (ja) 2001-03-12 2001-03-12 重合性組成物
TW091104454A TWI304816B (enExample) 2001-03-12 2002-03-11
PCT/JP2002/002303 WO2002072640A1 (fr) 2001-03-12 2002-03-12 Composition polymerisable
KR1020027015166A KR100865832B1 (ko) 2001-03-12 2002-03-12 중합성 조성물
US10/276,307 US6900250B2 (en) 2001-03-12 2002-03-12 Polymerizable composition
CNB028006216A CN1241950C (zh) 2001-03-12 2002-03-12 聚合性组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001067938A JP4019645B2 (ja) 2001-03-12 2001-03-12 重合性組成物

Publications (2)

Publication Number Publication Date
JP2002265512A JP2002265512A (ja) 2002-09-18
JP4019645B2 true JP4019645B2 (ja) 2007-12-12

Family

ID=18926197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001067938A Expired - Fee Related JP4019645B2 (ja) 2001-03-12 2001-03-12 重合性組成物

Country Status (6)

Country Link
US (1) US6900250B2 (enExample)
JP (1) JP4019645B2 (enExample)
KR (1) KR100865832B1 (enExample)
CN (1) CN1241950C (enExample)
TW (1) TWI304816B (enExample)
WO (1) WO2002072640A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7510822B2 (en) * 2002-04-10 2009-03-31 Fujifilm Corporation Stimulation sensitive composition and compound
US20040063849A1 (en) * 2002-09-26 2004-04-01 Nippon Paint Co., Ltd. Photosolder resist composition
JP2004217551A (ja) * 2003-01-14 2004-08-05 Sanshin Chem Ind Co Ltd スルホニウム化合物
JP3873931B2 (ja) * 2003-05-30 2007-01-31 ソニーケミカル＆インフォメーションデバイス株式会社 吸液性シート及び非水電解液電池パック
US7910223B2 (en) 2003-07-17 2011-03-22 Honeywell International Inc. Planarization films for advanced microelectronic applications and devices and methods of production thereof
JP4533639B2 (ja) 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
US20090033834A1 (en) * 2005-02-18 2009-02-05 Takashi Kuroda Liquid crystal layer forming ink composition, and optical film, polarizing film and liquid crystal display produced with the ink composition
JP4533799B2 (ja) * 2005-05-31 2010-09-01 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
US7674571B2 (en) * 2006-01-21 2010-03-09 Gary Ganghui Teng Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator
CN102352155B (zh) * 2006-02-24 2014-04-02 帝国油墨制造股份公司 油墨的制造方法，以及基于该方法的油墨、印刷物、成型品
KR101345280B1 (ko) 2006-05-24 2013-12-26 엘지디스플레이 주식회사 패턴형성용 레진 조성물 및 이를 이용하는 인-플레인프린팅 공정방법
KR101341137B1 (ko) * 2007-07-30 2013-12-13 삼성디스플레이 주식회사 밀봉제 및 이를 이용한 표시 장치
JP5483808B2 (ja) * 2007-08-14 2014-05-07 チェイル インダストリーズ インコーポレイテッド 粘着剤組成物及び光学部材
JP5304977B2 (ja) * 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
WO2009115671A1 (fr) * 2008-02-15 2009-09-24 Catalyse Composition auto-reparante. materiaux a auto-reparation procedes d' autoreparation et applications
JP2009210870A (ja) * 2008-03-05 2009-09-17 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物、カラーフィルタの製造方法、及びカラーフィルタ
JP5441504B2 (ja) * 2009-06-05 2014-03-12 日東電工株式会社 粘着シート
WO2011003193A1 (en) * 2009-07-10 2011-01-13 The Governors Of The University Of Alberta Compounds and methods for detection and quantification of carboxylic acids
TW201233403A (en) * 2011-02-11 2012-08-16 Univ Nat Taiwan Dental composite material and applications thereof
EP2951620B1 (en) * 2013-01-31 2017-03-01 Nitto Denko Corporation Optical element for correcting color blindness
JP2014214129A (ja) * 2013-04-26 2014-11-17 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1526923A (en) * 1974-09-18 1978-10-04 Ici Ltd Photopolymerisable compositions
US5500453A (en) 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
JP2803454B2 (ja) 1992-03-13 1998-09-24 東洋インキ製造株式会社 スルホニウム錯体またはオキソスルホニウム錯体
JP2929858B2 (ja) 1992-08-14 1999-08-03 東洋インキ製造株式会社 重合性組成物および重合方法
US5631307A (en) 1994-06-28 1997-05-20 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
US5998496A (en) 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TWI286664B (en) * 2000-06-23 2007-09-11 Sumitomo Chemical Co Chemical amplification type positive resist composition and sulfonium salt

Also Published As

Publication number Publication date
US6900250B2 (en) 2005-05-31
JP2002265512A (ja) 2002-09-18
WO2002072640A1 (fr) 2002-09-19
CN1458938A (zh) 2003-11-26
CN1241950C (zh) 2006-02-15
KR20020091285A (ko) 2002-12-05
TWI304816B (enExample) 2009-01-01
KR100865832B1 (ko) 2008-10-28
US20030212162A1 (en) 2003-11-13

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