KR100865832B1 - 중합성 조성물 - Google Patents

중합성 조성물 Download PDF

Info

Publication number
KR100865832B1
KR100865832B1 KR1020027015166A KR20027015166A KR100865832B1 KR 100865832 B1 KR100865832 B1 KR 100865832B1 KR 1020027015166 A KR1020027015166 A KR 1020027015166A KR 20027015166 A KR20027015166 A KR 20027015166A KR 100865832 B1 KR100865832 B1 KR 100865832B1
Authority
KR
South Korea
Prior art keywords
compound
group
colorless
parts
none
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020027015166A
Other languages
English (en)
Korean (ko)
Other versions
KR20020091285A (ko
Inventor
우에스기다카히코
아리시마마사시
야기다다오
Original Assignee
도요 잉키 세이조 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도요 잉키 세이조 가부시끼가이샤 filed Critical 도요 잉키 세이조 가부시끼가이샤
Publication of KR20020091285A publication Critical patent/KR20020091285A/ko
Application granted granted Critical
Publication of KR100865832B1 publication Critical patent/KR100865832B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/22—Esters containing nitrogen
    • C08F222/225—Esters containing nitrogen the ester chains containing seven or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/24—Esters containing sulfur
    • C08F222/245—Esters containing sulfur the ester chains containing seven or more carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020027015166A 2001-03-12 2002-03-12 중합성 조성물 Expired - Fee Related KR100865832B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001067938A JP4019645B2 (ja) 2001-03-12 2001-03-12 重合性組成物
JPJP-P-2001-00067938 2001-03-12

Publications (2)

Publication Number Publication Date
KR20020091285A KR20020091285A (ko) 2002-12-05
KR100865832B1 true KR100865832B1 (ko) 2008-10-28

Family

ID=18926197

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027015166A Expired - Fee Related KR100865832B1 (ko) 2001-03-12 2002-03-12 중합성 조성물

Country Status (6)

Country Link
US (1) US6900250B2 (enExample)
JP (1) JP4019645B2 (enExample)
KR (1) KR100865832B1 (enExample)
CN (1) CN1241950C (enExample)
TW (1) TWI304816B (enExample)
WO (1) WO2002072640A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7510822B2 (en) * 2002-04-10 2009-03-31 Fujifilm Corporation Stimulation sensitive composition and compound
US20040063849A1 (en) * 2002-09-26 2004-04-01 Nippon Paint Co., Ltd. Photosolder resist composition
JP2004217551A (ja) * 2003-01-14 2004-08-05 Sanshin Chem Ind Co Ltd スルホニウム化合物
JP3873931B2 (ja) * 2003-05-30 2007-01-31 ソニーケミカル＆インフォメーションデバイス株式会社 吸液性シート及び非水電解液電池パック
AU2003286758A1 (en) 2003-07-17 2005-03-07 Honeywell International Inc Planarization films for advanced microelectronic applications and devices and methods of production thereof
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
WO2006088101A1 (ja) * 2005-02-18 2006-08-24 Dai Nippon Printing Co., Ltd. 液晶層形成用インキ組成物と、そのインキ組成物を用いて作製した光学フィルム、偏光フィルム及び液晶表示装置
JP4533799B2 (ja) * 2005-05-31 2010-09-01 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
US7674571B2 (en) * 2006-01-21 2010-03-09 Gary Ganghui Teng Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator
JP5312017B2 (ja) * 2006-02-24 2013-10-09 帝国インキ製造株式会社 インクの製造方法、及び、当該方法に基づくインク、印刷物、成形品
KR101345280B1 (ko) * 2006-05-24 2013-12-26 엘지디스플레이 주식회사 패턴형성용 레진 조성물 및 이를 이용하는 인-플레인프린팅 공정방법
KR101341137B1 (ko) * 2007-07-30 2013-12-13 삼성디스플레이 주식회사 밀봉제 및 이를 이용한 표시 장치
JP5483808B2 (ja) * 2007-08-14 2014-05-07 チェイル インダストリーズ インコーポレイテッド 粘着剤組成物及び光学部材
JP5304977B2 (ja) * 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
EP2242774B2 (fr) * 2008-02-15 2018-09-26 Catalyse Composition auto-reparante. materiaux a auto-reparation procedes d' autoreparation et applications
JP2009210870A (ja) * 2008-03-05 2009-09-17 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物、カラーフィルタの製造方法、及びカラーフィルタ
JP5441504B2 (ja) * 2009-06-05 2014-03-12 日東電工株式会社 粘着シート
US20120165227A1 (en) * 2009-07-10 2012-06-28 The Governors Of The University Of Alberta Compounds and methods for detection and quantification of carboxylic acids
TW201233403A (en) * 2011-02-11 2012-08-16 Univ Nat Taiwan Dental composite material and applications thereof
JP6367834B2 (ja) * 2013-01-31 2018-08-01 日東電工株式会社 色覚異常を矯正するための光学素子
JP2014214129A (ja) * 2013-04-26 2014-11-17 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1526923A (en) * 1974-09-18 1978-10-04 Ici Ltd Photopolymerisable compositions
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
JP2803454B2 (ja) 1992-03-13 1998-09-24 東洋インキ製造株式会社 スルホニウム錯体またはオキソスルホニウム錯体
JP2929858B2 (ja) 1992-08-14 1999-08-03 東洋インキ製造株式会社 重合性組成物および重合方法
US5631307A (en) 1994-06-28 1997-05-20 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
US5998496A (en) 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TWI286664B (en) * 2000-06-23 2007-09-11 Sumitomo Chemical Co Chemical amplification type positive resist composition and sulfonium salt

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Maromolecules, 32, 6545-6551(1999)*

Also Published As

Publication number Publication date
CN1458938A (zh) 2003-11-26
JP4019645B2 (ja) 2007-12-12
JP2002265512A (ja) 2002-09-18
TWI304816B (enExample) 2009-01-01
US20030212162A1 (en) 2003-11-13
US6900250B2 (en) 2005-05-31
KR20020091285A (ko) 2002-12-05
CN1241950C (zh) 2006-02-15
WO2002072640A1 (fr) 2002-09-19

Similar Documents

Publication Publication Date Title
KR100865832B1 (ko) 중합성 조성물
CN100523008C (zh) 硫醇化合物、光聚合引发剂组合物和光敏组合物
JP4600600B1 (ja) 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法
KR102362859B1 (ko) 중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도
EP1031579B1 (en) Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter
JP5223365B2 (ja) 光重合開始剤、重合性組成物、および重合物の製造方法。
JP2009191179A (ja) 光重合開始剤、重合性組成物、および重合物の製造方法。
JP7421169B2 (ja) チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物
JP5481856B2 (ja) 光重合開始剤、重合性組成物、および重合物の製造方法
JP5359354B2 (ja) 光重合開始剤、重合性組成物、および重合物の製造方法
JP2009029859A (ja) 重合性組成物、および重合物の製造方法
JP2009203299A (ja) 無黄変性重合性組成物、および重合物の製造方法。
JP4132709B2 (ja) 重合性組成物
JP5298570B2 (ja) 光重合開始剤、重合性組成物、および重合物の製造方法。
JP3955219B2 (ja) 光重合開始剤および感光性組成物
JP7382010B2 (ja) 重合開始剤混合物、重合性組成物、硬化物、および硬化物の製造方法
JP2000344812A (ja) 重合性組成物
JP2001213909A (ja) 重合性組成物
JP2001206903A (ja) 重合性組成物
JP4244487B2 (ja) 重合性組成物
JP4438636B2 (ja) ラジカル重合開始剤、重合性組成物、および重合物の製造方法。
JP7371554B2 (ja) ビスオキシムエステル系光重合開始剤、重合性組成物、ならびに硬化物およびその製造方法
JP2001261728A (ja) 重合性組成物
JP2001261727A (ja) 重合性組成物
JPH11269212A (ja) 重合性組成物およびその硬化物

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20121002

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20131001

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20141007

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20151023

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20151023

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301