JP4012180B2 - Cmp用スラリー、研磨方法、および半導体装置の製造方法 - Google Patents
Cmp用スラリー、研磨方法、および半導体装置の製造方法 Download PDFInfo
- Publication number
- JP4012180B2 JP4012180B2 JP2004231167A JP2004231167A JP4012180B2 JP 4012180 B2 JP4012180 B2 JP 4012180B2 JP 2004231167 A JP2004231167 A JP 2004231167A JP 2004231167 A JP2004231167 A JP 2004231167A JP 4012180 B2 JP4012180 B2 JP 4012180B2
- Authority
- JP
- Japan
- Prior art keywords
- surfactant
- polishing
- slurry
- insulating film
- cmp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76835—Combinations of two or more different dielectric layers having a low dielectric constant
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31058—After-treatment of organic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
- H01L21/76808—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving intermediate temporary filling with material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
Description
第1の界面活性剤のHLB値は3〜7が好ましく、この場合の曇点は19〜32℃程度である。また、第2の界面活性剤のHLB値は12〜18が好ましく、この場合の曇点は63〜80℃程度である。第1および第2の界面活性剤は、それぞれ単独でも、2種以上を組み合わせて用いてもよい。
図1乃至図3を参照して、本実施形態を説明する。
本発明の実施形態にかかるCMP用スラリーは、STI(Shallow trench isolation)の形成に適用することも可能である。図6および図7を参照して、本実施形態を説明する。
本発明の実施形態にかかるCMP用スラリーは、レジストCMPに適用することも可能である。図8乃至図10を参照して、本実施形態を説明する。
B:ポリオキシエチレンラウリルエーテル
C:アセチレングリコールポリエーテル付加物
D:ポリオキシエチレン・メチルポリシロキサン共重合体
表3に示されるように、No.24〜28のスラリーサンプルは、室温HLB値が3〜9の第1の界面活性剤と、室温HLB値が10〜20の第2の界面活性剤を含有しているので、エロージョンを20nm以下に抑えることができた。これらのスラリーサンプルにおいては、第1の界面活性剤の曇点はいずれも37+3℃以下であり、第2の界面活性剤の曇点はいずれも37℃より高い。界面活性剤の疎水部が、アセチレングリコールまたはシロキサンであるNo.25〜28のスラリーサンプルでは、エロージョンは18nm以下であり、特に、第1および第2の界面活性剤の疎水部がいずれもアセチレングリコールであるNo.25のスラリーサンプルでは、エロージョンは16nmとよりいっそう低減されている。このことから、レジスト膜に対しては、疎水部としてアセチレングリコールが効果的であることが確認された。
13…溝パターン; 14…バリアメタル膜; 15…配線材料膜
16…エロージョン; 17…導電性層; 20…ターンテーブル
21…研磨布; 22…半導体基板; 23…トップリング; 24…水供給ノズル
25…スラリー供給ノズル; 26…ドレッサー; 27…スラリー
31…CMPストッパー膜; 32…絶縁膜; 41…レジスト膜; 42…段差
43…露光用レジスト膜; 44…微細ホール; 45…ヴィアホール
46…バリアメタル膜; 47…配線材料膜; 48…導電性層; 49…プラグ
50…配線。
Claims (4)
- 研磨粒子と界面活性剤とを含有し、前記界面活性剤は、疎水部としてシロキサンまたはアセチレングリコールを有し室温でのHLB値が3〜7の第1のポリエーテル型非イオン界面活性剤と、疎水部としてシロキサンまたはアセチレングリコールを有し室温でのHLB値が12〜18の第2のポリエーテル型非イオン界面活性剤とを含むことを特徴とするCMP用スラリー。
- 前記第1のポリエーテル型非イオン界面活性剤は、曇点が19〜32℃であり、前記第2のポリエーテル型非イオン界面活性剤は、曇点が63〜80℃であることを特徴とする請求項1に記載のCMP用スラリー。
- ターンテーブル上に貼付された研磨布に、被研磨面を有する半導体基板を当接させる工程、および
前記研磨布上に、請求項1または2に記載のCMP用スラリーを滴下して、前記被研磨面を研磨する工程を具備することを特徴とする研磨方法。 - 半導体基板上に絶縁膜を形成する工程と、
前記絶縁膜に凹部を形成する工程と、
前記凹部の内部および前記絶縁膜の上に導電性材料を堆積して、導電性を有する層を形成する工程と、
前記絶縁膜の上に堆積された前記導電性材料を除去して前記絶縁膜を露出し、前記導電性材料を前記凹部内部に残置する工程とを具備し、
前記絶縁膜上に堆積された前記導電性材料の除去は、請求項1または2に記載のスラリーを用いたCMPにより行なわれることを特徴とする半導体装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004231167A JP4012180B2 (ja) | 2004-08-06 | 2004-08-06 | Cmp用スラリー、研磨方法、および半導体装置の製造方法 |
US11/170,173 US7459398B2 (en) | 2004-08-06 | 2005-06-30 | Slurry for CMP, polishing method and method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004231167A JP4012180B2 (ja) | 2004-08-06 | 2004-08-06 | Cmp用スラリー、研磨方法、および半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006049709A JP2006049709A (ja) | 2006-02-16 |
JP4012180B2 true JP4012180B2 (ja) | 2007-11-21 |
Family
ID=35758179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004231167A Expired - Fee Related JP4012180B2 (ja) | 2004-08-06 | 2004-08-06 | Cmp用スラリー、研磨方法、および半導体装置の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7459398B2 (ja) |
JP (1) | JP4012180B2 (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080265205A1 (en) * | 2005-09-02 | 2008-10-30 | Fujimi Incorporated | Polishing Composition |
US20070077865A1 (en) * | 2005-10-04 | 2007-04-05 | Cabot Microelectronics Corporation | Method for controlling polysilicon removal |
JP5013732B2 (ja) * | 2006-04-03 | 2012-08-29 | Jsr株式会社 | 化学機械研磨用水系分散体、化学機械研磨方法、化学機械研磨用キット、および化学機械研磨用水系分散体を調製するためのキット |
KR100793240B1 (ko) * | 2006-06-02 | 2008-01-10 | 삼성전자주식회사 | 슬러리 조성물, 이를 이용한 연마 방법 및 불휘발성 메모리장치의 제조 방법 |
JP2008041781A (ja) * | 2006-08-02 | 2008-02-21 | Fujimi Inc | 研磨用組成物及び研磨方法 |
JP4811586B2 (ja) * | 2006-09-28 | 2011-11-09 | Jsr株式会社 | 化学機械研磨用水系分散体およびその製造方法ならびに化学機械研磨方法 |
US7456107B2 (en) * | 2006-11-09 | 2008-11-25 | Cabot Microelectronics Corporation | Compositions and methods for CMP of low-k-dielectric materials |
KR101202720B1 (ko) * | 2008-02-29 | 2012-11-19 | 주식회사 엘지화학 | 화학적 기계적 연마용 수계 슬러리 조성물 및 화학적 기계적 연마 방법 |
US8236169B2 (en) * | 2009-07-21 | 2012-08-07 | Chevron U.S.A. Inc | Systems and methods for producing a crude product |
US8088690B2 (en) * | 2009-03-31 | 2012-01-03 | International Business Machines Corporation | CMP method |
US10392531B2 (en) * | 2009-11-30 | 2019-08-27 | Basf Se | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
JP2013041856A (ja) * | 2009-12-21 | 2013-02-28 | Hitachi Chemical Co Ltd | パラジウム研磨用cmp研磨液及び研磨方法 |
JP5492603B2 (ja) * | 2010-03-02 | 2014-05-14 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びそれを用いた研磨方法 |
JP5567926B2 (ja) * | 2010-07-29 | 2014-08-06 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
DE112011103232T5 (de) | 2010-09-27 | 2013-06-27 | Fujimi Incorporated | Oberflächenbehandlungszusammensetzung und Oberflächenbehandlungsverfahren unter Verwendung derselben |
JP5657034B2 (ja) * | 2012-02-14 | 2015-01-21 | キヤノン株式会社 | 液体吐出ヘッドの製造方法及び基板の加工方法 |
JP2014060205A (ja) * | 2012-09-14 | 2014-04-03 | Fujimi Inc | 研磨用組成物 |
WO2014069457A1 (ja) * | 2012-11-02 | 2014-05-08 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
US9530737B1 (en) * | 2015-09-28 | 2016-12-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device and manufacturing method thereof |
KR102022076B1 (ko) * | 2017-09-21 | 2019-09-23 | 한양대학교 에리카산학협력단 | Pva 브러쉬 세정 방법 및 장치 |
CN112714787B (zh) | 2019-03-22 | 2022-08-19 | 株式会社大赛璐 | 半导体布线研磨用组合物 |
CN110791363B (zh) * | 2019-09-27 | 2022-05-27 | 佳化化学(上海)有限公司 | 一种全合成切削液及其制备方法 |
JP2022157907A (ja) * | 2021-03-31 | 2022-10-14 | 出光興産株式会社 | 加工液、加工液用組成物及び脆性材料加工液組成物 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5842910A (en) * | 1997-03-10 | 1998-12-01 | International Business Machines Corporation | Off-center grooved polish pad for CMP |
JP2000109816A (ja) | 1998-10-05 | 2000-04-18 | Okamoto Machine Tool Works Ltd | 研磨剤スラリ−の調製方法 |
US6443812B1 (en) * | 1999-08-24 | 2002-09-03 | Rodel Holdings Inc. | Compositions for insulator and metal CMP and methods relating thereto |
US6872328B2 (en) * | 1999-12-17 | 2005-03-29 | Cabot Microelectronics Corporation | Method of polishing or planarizing a substrate |
JP3849091B2 (ja) | 2001-02-28 | 2006-11-22 | Jsr株式会社 | 化学機械研磨用水系分散体 |
US6540935B2 (en) * | 2001-04-05 | 2003-04-01 | Samsung Electronics Co., Ltd. | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same |
US6830503B1 (en) * | 2002-01-11 | 2004-12-14 | Cabot Microelectronics Corporation | Catalyst/oxidizer-based CMP system for organic polymer films |
JP2003289054A (ja) | 2002-03-28 | 2003-10-10 | Asahi Kasei Corp | 金属用研磨組成物の製造方法 |
US6641630B1 (en) * | 2002-06-06 | 2003-11-04 | Cabot Microelectronics Corp. | CMP compositions containing iodine and an iodine vapor-trapping agent |
JP2004189894A (ja) | 2002-12-11 | 2004-07-08 | Asahi Kasei Chemicals Corp | 金属用研磨組成物 |
JP2004247605A (ja) | 2003-02-14 | 2004-09-02 | Toshiba Corp | Cmp用スラリーおよび半導体装置の製造方法 |
JP4130614B2 (ja) * | 2003-06-18 | 2008-08-06 | 株式会社東芝 | 半導体装置の製造方法 |
JP2005093785A (ja) * | 2003-09-18 | 2005-04-07 | Toshiba Corp | Cmp用スラリー、研磨方法、および半導体装置の製造方法 |
JP4768335B2 (ja) * | 2005-06-30 | 2011-09-07 | 株式会社東芝 | 有機膜の化学的機械的研磨方法、半導体装置の製造方法、およびプログラム |
-
2004
- 2004-08-06 JP JP2004231167A patent/JP4012180B2/ja not_active Expired - Fee Related
-
2005
- 2005-06-30 US US11/170,173 patent/US7459398B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20060030503A1 (en) | 2006-02-09 |
JP2006049709A (ja) | 2006-02-16 |
US7459398B2 (en) | 2008-12-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4012180B2 (ja) | Cmp用スラリー、研磨方法、および半導体装置の製造方法 | |
JP4776269B2 (ja) | 金属膜cmp用スラリー、および半導体装置の製造方法 | |
KR101330956B1 (ko) | Cmp 연마액 및 연마 방법 | |
JP4130614B2 (ja) | 半導体装置の製造方法 | |
TW527660B (en) | Slurry for chemical mechanical polishing and manufacturing method of semiconductor device | |
JP3899456B2 (ja) | 研磨用組成物およびそれを用いた研磨方法 | |
JP5329786B2 (ja) | 研磨液および半導体装置の製造方法 | |
WO2016006553A1 (ja) | Cmp用研磨液及び研磨方法 | |
JP2009158810A (ja) | 化学的機械的研磨用スラリーおよび半導体装置の製造方法 | |
KR20130060375A (ko) | 금속막용 연마액 및 연마방법 | |
JP2013074036A (ja) | Cmp用スラリーおよび半導体装置の製造方法 | |
JP2007157841A (ja) | Cmp用水系分散液、研磨方法、および半導体装置の製造方法 | |
TWI399428B (zh) | Cmp研磨液以及使用此cmp研磨液的基板研磨方法 | |
KR20080028790A (ko) | 텅스텐 배선 형성용 슬러리 조성물 및 이를 이용한 반도체소자의 제조 방법 | |
JP4618987B2 (ja) | 研磨液及び研磨方法 | |
JP2004179294A (ja) | 研磨液及び研磨方法 | |
JP2009147394A (ja) | 研磨液及び研磨方法 | |
TWI795674B (zh) | 阻障物化學機械平坦化(cmp)研磨組合物、系統及其研磨方法 | |
JP4263332B2 (ja) | 研磨砥粒、化学機械研磨スラリーおよび銅系金属の研磨方法 | |
JP4878728B2 (ja) | Cmp研磨剤および基板の研磨方法 | |
JP2022010758A (ja) | 研磨剤及び研磨方法 | |
JP2004277620A (ja) | 研磨用組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070606 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070612 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070810 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070904 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070906 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 4012180 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100914 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110914 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110914 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120914 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120914 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130914 Year of fee payment: 6 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |