JP4011566B2 - シリカゾル及びその製造方法 - Google Patents

シリカゾル及びその製造方法 Download PDF

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Publication number
JP4011566B2
JP4011566B2 JP2004217655A JP2004217655A JP4011566B2 JP 4011566 B2 JP4011566 B2 JP 4011566B2 JP 2004217655 A JP2004217655 A JP 2004217655A JP 2004217655 A JP2004217655 A JP 2004217655A JP 4011566 B2 JP4011566 B2 JP 4011566B2
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Japan
Prior art keywords
silica sol
silica
concentration
particle size
producing
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JP2004217655A
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Japanese (ja)
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JP2005060219A (ja
JP2005060219A5 (enExample
Inventor
恭弘 山川
好昭 友田
景司 外山
正年 酒井
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Fuso Chemical Co Ltd
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Fuso Chemical Co Ltd
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Priority to JP2004217655A priority Critical patent/JP4011566B2/ja
Priority to TW094101169A priority patent/TW200604097A/zh
Priority to US11/632,936 priority patent/US20070237701A1/en
Priority to PCT/JP2005/000551 priority patent/WO2006011252A1/ja
Publication of JP2005060219A publication Critical patent/JP2005060219A/ja
Publication of JP2005060219A5 publication Critical patent/JP2005060219A5/ja
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JP2004217655A 2003-07-25 2004-07-26 シリカゾル及びその製造方法 Expired - Lifetime JP4011566B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004217655A JP4011566B2 (ja) 2003-07-25 2004-07-26 シリカゾル及びその製造方法
TW094101169A TW200604097A (en) 2004-07-26 2005-01-14 Silica sol and manufacturing method therefor
US11/632,936 US20070237701A1 (en) 2004-07-26 2005-01-18 Silica Sol and Process for Producing Same
PCT/JP2005/000551 WO2006011252A1 (ja) 2004-07-26 2005-01-18 シリカゾル及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003280475 2003-07-25
JP2004217655A JP4011566B2 (ja) 2003-07-25 2004-07-26 シリカゾル及びその製造方法

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JP2005060219A JP2005060219A (ja) 2005-03-10
JP2005060219A5 JP2005060219A5 (enExample) 2007-04-12
JP4011566B2 true JP4011566B2 (ja) 2007-11-21

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101198316B1 (ko) 2009-11-16 2012-11-06 한국전기연구원 무용제형 실리카졸 및 그 제조방법
DE112021008471T5 (de) 2021-12-23 2024-09-05 Fuso Chemical Co., Ltd. Kolloidales Siliziumdioxid und Herstellungsverfahren dafür

Families Citing this family (28)

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Publication number Priority date Publication date Assignee Title
KR101059677B1 (ko) 2006-07-31 2011-08-25 후소카가쿠코교 가부시키가이샤 실리카 졸 및 그 제조 방법
JPWO2008123373A1 (ja) 2007-03-27 2010-07-15 扶桑化学工業株式会社 コロイダルシリカ及びその製造方法
JP5084670B2 (ja) * 2008-09-01 2012-11-28 日揮触媒化成株式会社 シリカゾルおよびその製造方法
JP2011171689A (ja) 2009-07-07 2011-09-01 Kao Corp シリコンウエハ用研磨液組成物
JP5615529B2 (ja) * 2009-11-16 2014-10-29 日揮触媒化成株式会社 無機酸化物微粒子分散液、研磨用粒子分散液及び研磨用組成物
JP5645702B2 (ja) * 2010-02-19 2014-12-24 株式会社トクヤマ 無機酸化物粒子分散液の濃縮物の製造方法、及び無機酸化物粒子の製造方法
JP5495880B2 (ja) * 2010-03-25 2014-05-21 扶桑化学工業株式会社 コロイダルシリカの二次粒子径調整方法
WO2013085574A1 (en) * 2011-07-29 2013-06-13 Momentive Performance Materials, Inc. Method for making high purity metal oxide particles and materials made thereof
TWI681929B (zh) 2011-12-28 2020-01-11 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
JP5822356B2 (ja) 2012-04-17 2015-11-24 花王株式会社 シリコンウェーハ用研磨液組成物
JP6047395B2 (ja) * 2012-12-20 2016-12-21 日揮触媒化成株式会社 高純度シリカゾルおよびその製造方法
KR102205327B1 (ko) 2013-06-10 2021-01-19 닛산 가가쿠 가부시키가이샤 실리카 졸 및 실리카 졸의 제조 방법
JP5893706B2 (ja) 2013-10-25 2016-03-23 花王株式会社 シリコンウェーハ用研磨液組成物
JP6371193B2 (ja) * 2014-10-22 2018-08-08 日揮触媒化成株式会社 シリカ系複合粒子分散液の製造方法
JP6455142B2 (ja) * 2014-12-26 2019-01-23 三菱マテリアル株式会社 シリカゾル分散液及びシリカ多孔質膜形成用組成物
US10604411B2 (en) 2015-07-31 2020-03-31 Fujimi Incorporated Method for producing silica sol
JP2017171599A (ja) * 2016-03-23 2017-09-28 高化学技術株式会社 固体触媒、及びその固体触媒を用いたエチレングリコールの製造方法
KR102647949B1 (ko) 2017-11-16 2024-03-14 닛키 쇼쿠바이카세이 가부시키가이샤 실리카 입자의 분산액 및 그 제조 방법
JP7213234B2 (ja) * 2018-03-30 2023-01-26 日揮触媒化成株式会社 シリカ粒子分散液、研磨組成物及びシリカ粒子分散液の製造方法
JP7181142B2 (ja) * 2019-03-28 2022-11-30 株式会社フジミインコーポレーテッド シリカゾルの製造方法
JP7516763B2 (ja) * 2020-01-28 2024-07-17 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、中間生成物の除去方法及び研磨方法
JP7552019B2 (ja) * 2020-01-28 2024-09-18 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
JP7581910B2 (ja) * 2020-02-04 2024-11-13 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
CN111646479B (zh) * 2020-06-12 2022-01-07 河北宇天昊远纳米材料有限公司 一种制备大粒径硅溶胶的方法
JP7622443B2 (ja) * 2021-01-15 2025-01-28 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
JP7782173B2 (ja) * 2021-09-15 2025-12-09 三菱ケミカル株式会社 シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
JP7782174B2 (ja) * 2021-09-15 2025-12-09 三菱ケミカル株式会社 シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
CN115924922B (zh) * 2023-02-13 2024-11-19 山东大学 一种化学机械抛光用硅溶胶及其制备方法与应用

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101198316B1 (ko) 2009-11-16 2012-11-06 한국전기연구원 무용제형 실리카졸 및 그 제조방법
DE112021008471T5 (de) 2021-12-23 2024-09-05 Fuso Chemical Co., Ltd. Kolloidales Siliziumdioxid und Herstellungsverfahren dafür

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