JP4002740B2 - セリウム系研摩材の製造方法 - Google Patents

セリウム系研摩材の製造方法 Download PDF

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Publication number
JP4002740B2
JP4002740B2 JP2001160644A JP2001160644A JP4002740B2 JP 4002740 B2 JP4002740 B2 JP 4002740B2 JP 2001160644 A JP2001160644 A JP 2001160644A JP 2001160644 A JP2001160644 A JP 2001160644A JP 4002740 B2 JP4002740 B2 JP 4002740B2
Authority
JP
Japan
Prior art keywords
raw material
pulverization
abrasive
cerium
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001160644A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002348563A (ja
Inventor
昭文 伊藤
広幸 渡辺
和哉 牛山
滋 桑原
義嗣 内野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Kinzoku Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP2001160644A priority Critical patent/JP4002740B2/ja
Priority to TW091110040A priority patent/TWI293981B/zh
Priority to MYPI20021762A priority patent/MY129185A/en
Priority to US10/433,967 priority patent/US6905527B2/en
Priority to CNB028036336A priority patent/CN1239666C/zh
Priority to EP02726489A priority patent/EP1391494A1/en
Priority to PCT/JP2002/005051 priority patent/WO2002097004A1/ja
Priority to KR10-2003-7008652A priority patent/KR100509267B1/ko
Publication of JP2002348563A publication Critical patent/JP2002348563A/ja
Application granted granted Critical
Publication of JP4002740B2 publication Critical patent/JP4002740B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C09K3/1418—Abrasive particles per se obtained by division of a mass agglomerated by sintering
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2001160644A 2001-05-29 2001-05-29 セリウム系研摩材の製造方法 Expired - Fee Related JP4002740B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2001160644A JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法
TW091110040A TWI293981B (enExample) 2001-05-29 2002-05-14
MYPI20021762A MY129185A (en) 2001-05-29 2002-05-15 Method of manufacturing cerium-based polishing agent
CNB028036336A CN1239666C (zh) 2001-05-29 2002-05-24 铈系研磨材料的制造方法
US10/433,967 US6905527B2 (en) 2001-05-29 2002-05-24 Method of manufacturing cerium-based polishing agent
EP02726489A EP1391494A1 (en) 2001-05-29 2002-05-24 Method for producing cerium-based polishing agent
PCT/JP2002/005051 WO2002097004A1 (fr) 2001-05-29 2002-05-24 Procede de production d'un agent de polissage a base de cerium
KR10-2003-7008652A KR100509267B1 (ko) 2001-05-29 2002-05-24 세륨계 연마재의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001160644A JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法

Publications (2)

Publication Number Publication Date
JP2002348563A JP2002348563A (ja) 2002-12-04
JP4002740B2 true JP4002740B2 (ja) 2007-11-07

Family

ID=19004023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001160644A Expired - Fee Related JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法

Country Status (8)

Country Link
US (1) US6905527B2 (enExample)
EP (1) EP1391494A1 (enExample)
JP (1) JP4002740B2 (enExample)
KR (1) KR100509267B1 (enExample)
CN (1) CN1239666C (enExample)
MY (1) MY129185A (enExample)
TW (1) TWI293981B (enExample)
WO (1) WO2002097004A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
US20070258875A1 (en) * 2004-09-03 2007-11-08 Showa Denko K.K. Mixed Rare Earth Oxide, Mixed Rare Earth Fluoride, Cerium-Based Abrasive Using the Materials and Production Processes Thereof
JP2006206870A (ja) * 2004-12-28 2006-08-10 Mitsui Mining & Smelting Co Ltd セリウム系研摩材用原料及びセリウム系研摩材用原料の製造方法、並びに、セリウム系研摩材及びセリウム系研摩材の製造方法
US8361419B2 (en) 2005-09-20 2013-01-29 Lg Chem, Ltd. Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same
JP4917098B2 (ja) 2005-09-20 2012-04-18 エルジー・ケム・リミテッド 炭酸セリウム粉末及び製法、これから製造された酸化セリウム粉末及び製法、これを含むｃｍｐスラリー
KR101450865B1 (ko) * 2006-10-24 2014-10-14 동우 화인켐 주식회사 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
WO2008114972A1 (en) * 2007-03-16 2008-09-25 Lg Chem, Ltd. Method for preparing cerium carbonate powder
CN101641289B (zh) 2007-03-16 2012-11-21 株式会社Lg化学 用尿素制备碳酸铈粉末的方法
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
JP6495316B2 (ja) 2014-03-07 2019-04-03 セキュア ナチュラル リソーシズ エルエルシーＳｅｃｕｒｅ Ｎａｔｕｒａｌ Ｒｅｓｏｕｒｃｅｓ Ｌｌｃ 極めて優れたヒ素除去特性を備える酸化セリウム（ｉｖ）
CN104387989B (zh) * 2014-11-04 2016-08-24 南昌大学 高密度碳酸稀土高温爆裂法制备超细高铈稀土抛光粉的方法
CN111051463B (zh) * 2017-09-11 2022-01-11 昭和电工株式会社 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08267355A (ja) * 1995-04-03 1996-10-15 Fujimi Inkooporeetetsudo:Kk 研磨剤微粉末の製造方法
JP2991952B2 (ja) * 1995-07-31 1999-12-20 多木化学株式会社 酸化第二セリウム及びその製造方法
EP2164095A1 (en) * 1996-09-30 2010-03-17 Hitachi Chemical Co., Ltd. Cerium oxide abrasive and method of polishing substrates
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
JPH11181404A (ja) * 1997-12-18 1999-07-06 Hitachi Chem Co Ltd 酸化セリウム研磨剤および基板の研磨法
KR100851451B1 (ko) * 1998-12-25 2008-08-08 히다치 가세고교 가부시끼가이샤 Ｃｍｐ 연마제, ｃｍｐ 연마제용 첨가액 및 기판의 연마방법
US6428392B1 (en) * 1999-03-23 2002-08-06 Seimi Chemical Co., Ltd. Abrasive
JP2001035818A (ja) 1999-07-16 2001-02-09 Seimi Chem Co Ltd 半導体用研磨剤
WO2002028979A1 (en) * 2000-10-02 2002-04-11 Mitsui Mining & Smelting Co.,Ltd. Cerium based abrasive material and method for producing cerium based abrasive material
US6986798B2 (en) * 2000-11-30 2006-01-17 Showa Denko K.K. Cerium-based abrasive, production process thereof

Also Published As

Publication number Publication date
TWI293981B (enExample) 2008-03-01
CN1489625A (zh) 2004-04-14
WO2002097004A1 (fr) 2002-12-05
EP1391494A1 (en) 2004-02-25
MY129185A (en) 2007-03-30
JP2002348563A (ja) 2002-12-04
KR20030093193A (ko) 2003-12-06
US6905527B2 (en) 2005-06-14
KR100509267B1 (ko) 2005-08-18
US20040219791A1 (en) 2004-11-04
CN1239666C (zh) 2006-02-01

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