CN1239666C - 铈系研磨材料的制造方法 - Google Patents
铈系研磨材料的制造方法 Download PDFInfo
- Publication number
- CN1239666C CN1239666C CNB028036336A CN02803633A CN1239666C CN 1239666 C CN1239666 C CN 1239666C CN B028036336 A CNB028036336 A CN B028036336A CN 02803633 A CN02803633 A CN 02803633A CN 1239666 C CN1239666 C CN 1239666C
- Authority
- CN
- China
- Prior art keywords
- raw material
- cerium
- pulverization
- abrasive
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
- C01F17/235—Cerium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
- C09K3/1418—Abrasive particles per se obtained by division of a mass agglomerated by sintering
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP160644/01 | 2001-05-29 | ||
| JP2001160644A JP4002740B2 (ja) | 2001-05-29 | 2001-05-29 | セリウム系研摩材の製造方法 |
| JP160644/2001 | 2001-05-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1489625A CN1489625A (zh) | 2004-04-14 |
| CN1239666C true CN1239666C (zh) | 2006-02-01 |
Family
ID=19004023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028036336A Expired - Fee Related CN1239666C (zh) | 2001-05-29 | 2002-05-24 | 铈系研磨材料的制造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6905527B2 (enExample) |
| EP (1) | EP1391494A1 (enExample) |
| JP (1) | JP4002740B2 (enExample) |
| KR (1) | KR100509267B1 (enExample) |
| CN (1) | CN1239666C (enExample) |
| MY (1) | MY129185A (enExample) |
| TW (1) | TWI293981B (enExample) |
| WO (1) | WO2002097004A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6863825B2 (en) | 2003-01-29 | 2005-03-08 | Union Oil Company Of California | Process for removing arsenic from aqueous streams |
| JP3949147B2 (ja) * | 2004-09-03 | 2007-07-25 | 昭和電工株式会社 | 混合希土類酸化物、混合希土類フッ素化物及びそれらを用いたセリウム系研磨材、並びにそれらの製造方法 |
| JP2006206870A (ja) * | 2004-12-28 | 2006-08-10 | Mitsui Mining & Smelting Co Ltd | セリウム系研摩材用原料及びセリウム系研摩材用原料の製造方法、並びに、セリウム系研摩材及びセリウム系研摩材の製造方法 |
| US8361419B2 (en) | 2005-09-20 | 2013-01-29 | Lg Chem, Ltd. | Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same |
| CN101268017A (zh) | 2005-09-20 | 2008-09-17 | Lg化学株式会社 | 碳酸铈粉末及其制备方法、由该碳酸铈粉末制备的氧化铈粉末及其制备方法以及含该氧化铈粉末的cmp浆料 |
| KR101450865B1 (ko) * | 2006-10-24 | 2014-10-14 | 동우 화인켐 주식회사 | 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법 |
| US8066874B2 (en) | 2006-12-28 | 2011-11-29 | Molycorp Minerals, Llc | Apparatus for treating a flow of an aqueous solution containing arsenic |
| WO2008114965A1 (en) | 2007-03-16 | 2008-09-25 | Lg Chem, Ltd. | Method for preparing cerium carbonate powder using urea |
| WO2008114972A1 (en) * | 2007-03-16 | 2008-09-25 | Lg Chem, Ltd. | Method for preparing cerium carbonate powder |
| US8349764B2 (en) | 2007-10-31 | 2013-01-08 | Molycorp Minerals, Llc | Composition for treating a fluid |
| US8252087B2 (en) | 2007-10-31 | 2012-08-28 | Molycorp Minerals, Llc | Process and apparatus for treating a gas containing a contaminant |
| US9233863B2 (en) | 2011-04-13 | 2016-01-12 | Molycorp Minerals, Llc | Rare earth removal of hydrated and hydroxyl species |
| CN103923602A (zh) * | 2013-01-15 | 2014-07-16 | 安阳市岷山有色金属有限责任公司 | 一种铈系研磨材料的制造方法 |
| CA2941859A1 (en) | 2014-03-07 | 2015-09-11 | Molycorp Minerals, Llc | Cerium (iv) oxide with exceptional arsenic removal properties |
| CN104387989B (zh) * | 2014-11-04 | 2016-08-24 | 南昌大学 | 高密度碳酸稀土高温爆裂法制备超细高铈稀土抛光粉的方法 |
| CN111051463B (zh) * | 2017-09-11 | 2022-01-11 | 昭和电工株式会社 | 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08267355A (ja) | 1995-04-03 | 1996-10-15 | Fujimi Inkooporeetetsudo:Kk | 研磨剤微粉末の製造方法 |
| JP2991952B2 (ja) | 1995-07-31 | 1999-12-20 | 多木化学株式会社 | 酸化第二セリウム及びその製造方法 |
| CN1323124C (zh) * | 1996-09-30 | 2007-06-27 | 日立化成工业株式会社 | 氧化铈研磨剂以及基板的研磨方法 |
| US5759917A (en) * | 1996-12-30 | 1998-06-02 | Cabot Corporation | Composition for oxide CMP |
| JPH11181404A (ja) | 1997-12-18 | 1999-07-06 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤および基板の研磨法 |
| WO2000039843A1 (en) * | 1998-12-25 | 2000-07-06 | Hitachi Chemical Company, Ltd. | Cmp abrasive, liquid additive for cmp abrasive and method for polishing substrate |
| US6428392B1 (en) * | 1999-03-23 | 2002-08-06 | Seimi Chemical Co., Ltd. | Abrasive |
| JP2001035818A (ja) | 1999-07-16 | 2001-02-09 | Seimi Chem Co Ltd | 半導体用研磨剤 |
| CN1177012C (zh) * | 2000-10-02 | 2004-11-24 | 三井金属鉱业株式会社 | 铈基磨料和铈基磨料的制造方法 |
| AU2002218517A1 (en) * | 2000-11-30 | 2002-06-11 | Showa Denko K K | Cerium-based abrasive and production process thereof |
-
2001
- 2001-05-29 JP JP2001160644A patent/JP4002740B2/ja not_active Expired - Fee Related
-
2002
- 2002-05-14 TW TW091110040A patent/TWI293981B/zh not_active IP Right Cessation
- 2002-05-15 MY MYPI20021762A patent/MY129185A/en unknown
- 2002-05-24 EP EP02726489A patent/EP1391494A1/en not_active Withdrawn
- 2002-05-24 US US10/433,967 patent/US6905527B2/en not_active Expired - Lifetime
- 2002-05-24 KR KR10-2003-7008652A patent/KR100509267B1/ko not_active Expired - Fee Related
- 2002-05-24 CN CNB028036336A patent/CN1239666C/zh not_active Expired - Fee Related
- 2002-05-24 WO PCT/JP2002/005051 patent/WO2002097004A1/ja not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP1391494A1 (en) | 2004-02-25 |
| US6905527B2 (en) | 2005-06-14 |
| JP2002348563A (ja) | 2002-12-04 |
| CN1489625A (zh) | 2004-04-14 |
| MY129185A (en) | 2007-03-30 |
| WO2002097004A1 (fr) | 2002-12-05 |
| KR20030093193A (ko) | 2003-12-06 |
| TWI293981B (enExample) | 2008-03-01 |
| US20040219791A1 (en) | 2004-11-04 |
| JP4002740B2 (ja) | 2007-11-07 |
| KR100509267B1 (ko) | 2005-08-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060201 Termination date: 20200524 |