KR100509267B1 - 세륨계 연마재의 제조방법 - Google Patents

세륨계 연마재의 제조방법 Download PDF

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Publication number
KR100509267B1
KR100509267B1 KR10-2003-7008652A KR20037008652A KR100509267B1 KR 100509267 B1 KR100509267 B1 KR 100509267B1 KR 20037008652 A KR20037008652 A KR 20037008652A KR 100509267 B1 KR100509267 B1 KR 100509267B1
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KR
South Korea
Prior art keywords
raw material
cerium
abrasive
grinding
rare earth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-2003-7008652A
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English (en)
Korean (ko)
Other versions
KR20030093193A (ko
Inventor
이토테루노리
와타나베히로유키
우시야마카즈야
쿠와바라시게루
우치노요시츠구
Original Assignee
미쓰이 긴조꾸 고교 가부시키가이샤
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Publication date
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Publication of KR20030093193A publication Critical patent/KR20030093193A/ko
Application granted granted Critical
Publication of KR100509267B1 publication Critical patent/KR100509267B1/ko
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C09K3/1418—Abrasive particles per se obtained by division of a mass agglomerated by sintering
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR10-2003-7008652A 2001-05-29 2002-05-24 세륨계 연마재의 제조방법 Expired - Fee Related KR100509267B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00160644 2001-05-29
JP2001160644A JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法
PCT/JP2002/005051 WO2002097004A1 (fr) 2001-05-29 2002-05-24 Procede de production d'un agent de polissage a base de cerium

Publications (2)

Publication Number Publication Date
KR20030093193A KR20030093193A (ko) 2003-12-06
KR100509267B1 true KR100509267B1 (ko) 2005-08-18

Family

ID=19004023

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7008652A Expired - Fee Related KR100509267B1 (ko) 2001-05-29 2002-05-24 세륨계 연마재의 제조방법

Country Status (8)

Country Link
US (1) US6905527B2 (enExample)
EP (1) EP1391494A1 (enExample)
JP (1) JP4002740B2 (enExample)
KR (1) KR100509267B1 (enExample)
CN (1) CN1239666C (enExample)
MY (1) MY129185A (enExample)
TW (1) TWI293981B (enExample)
WO (1) WO2002097004A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100786961B1 (ko) 2005-09-20 2007-12-17 주식회사 엘지화학 탄산세륨 분말 및 제조방법, 이로부터 제조된 산화세륨분말 및 제조방법, 이를 포함하는 ｃｍｐ 슬러리

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
JP3949147B2 (ja) * 2004-09-03 2007-07-25 昭和電工株式会社 混合希土類酸化物、混合希土類フッ素化物及びそれらを用いたセリウム系研磨材、並びにそれらの製造方法
JP2006206870A (ja) * 2004-12-28 2006-08-10 Mitsui Mining & Smelting Co Ltd セリウム系研摩材用原料及びセリウム系研摩材用原料の製造方法、並びに、セリウム系研摩材及びセリウム系研摩材の製造方法
US8361419B2 (en) 2005-09-20 2013-01-29 Lg Chem, Ltd. Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same
KR101450865B1 (ko) * 2006-10-24 2014-10-14 동우 화인켐 주식회사 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
WO2008114965A1 (en) 2007-03-16 2008-09-25 Lg Chem, Ltd. Method for preparing cerium carbonate powder using urea
WO2008114972A1 (en) * 2007-03-16 2008-09-25 Lg Chem, Ltd. Method for preparing cerium carbonate powder
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
CA2941859A1 (en) 2014-03-07 2015-09-11 Molycorp Minerals, Llc Cerium (iv) oxide with exceptional arsenic removal properties
CN104387989B (zh) * 2014-11-04 2016-08-24 南昌大学 高密度碳酸稀土高温爆裂法制备超细高铈稀土抛光粉的方法
CN111051463B (zh) * 2017-09-11 2022-01-11 昭和电工株式会社 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08267355A (ja) 1995-04-03 1996-10-15 Fujimi Inkooporeetetsudo:Kk 研磨剤微粉末の製造方法
JP2991952B2 (ja) 1995-07-31 1999-12-20 多木化学株式会社 酸化第二セリウム及びその製造方法
CN1323124C (zh) * 1996-09-30 2007-06-27 日立化成工业株式会社 氧化铈研磨剂以及基板的研磨方法
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
JPH11181404A (ja) 1997-12-18 1999-07-06 Hitachi Chem Co Ltd 酸化セリウム研磨剤および基板の研磨法
WO2000039843A1 (en) * 1998-12-25 2000-07-06 Hitachi Chemical Company, Ltd. Cmp abrasive, liquid additive for cmp abrasive and method for polishing substrate
US6428392B1 (en) * 1999-03-23 2002-08-06 Seimi Chemical Co., Ltd. Abrasive
JP2001035818A (ja) 1999-07-16 2001-02-09 Seimi Chem Co Ltd 半導体用研磨剤
CN1177012C (zh) * 2000-10-02 2004-11-24 三井金属鉱业株式会社 铈基磨料和铈基磨料的制造方法
AU2002218517A1 (en) * 2000-11-30 2002-06-11 Showa Denko K K Cerium-based abrasive and production process thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100786961B1 (ko) 2005-09-20 2007-12-17 주식회사 엘지화학 탄산세륨 분말 및 제조방법, 이로부터 제조된 산화세륨분말 및 제조방법, 이를 포함하는 ｃｍｐ 슬러리

Also Published As

Publication number Publication date
EP1391494A1 (en) 2004-02-25
US6905527B2 (en) 2005-06-14
JP2002348563A (ja) 2002-12-04
CN1489625A (zh) 2004-04-14
MY129185A (en) 2007-03-30
WO2002097004A1 (fr) 2002-12-05
KR20030093193A (ko) 2003-12-06
TWI293981B (enExample) 2008-03-01
US20040219791A1 (en) 2004-11-04
JP4002740B2 (ja) 2007-11-07
CN1239666C (zh) 2006-02-01

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