JP3992488B2 - 液処理装置および液処理方法 - Google Patents

液処理装置および液処理方法 Download PDF

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Publication number
JP3992488B2
JP3992488B2 JP2001378543A JP2001378543A JP3992488B2 JP 3992488 B2 JP3992488 B2 JP 3992488B2 JP 2001378543 A JP2001378543 A JP 2001378543A JP 2001378543 A JP2001378543 A JP 2001378543A JP 3992488 B2 JP3992488 B2 JP 3992488B2
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chamber
cleaning
processing
liquid
wafer
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Japanese (ja)
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JP2002246361A5 (https=
JP2002246361A (ja
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裕二 上川
太一 坂口
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Cleaning Or Drying Semiconductors (AREA)
JP2001378543A 2000-12-15 2001-12-12 液処理装置および液処理方法 Expired - Fee Related JP3992488B2 (ja)

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JP2001378543A JP3992488B2 (ja) 2000-12-15 2001-12-12 液処理装置および液処理方法

Applications Claiming Priority (3)

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JP2000381716 2000-12-15
JP2000-381716 2000-12-15
JP2001378543A JP3992488B2 (ja) 2000-12-15 2001-12-12 液処理装置および液処理方法

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JP2002246361A JP2002246361A (ja) 2002-08-30
JP2002246361A5 JP2002246361A5 (https=) 2005-06-23
JP3992488B2 true JP3992488B2 (ja) 2007-10-17

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120016011A (ko) * 2010-08-12 2012-02-22 도쿄엘렉트론가부시키가이샤 액 처리 장치, 액 처리 방법 및 기억 매체

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4907310B2 (ja) * 2006-11-24 2012-03-28 東京エレクトロン株式会社 処理装置、処理方法及び記録媒体
JP5800705B2 (ja) * 2011-12-22 2015-10-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置及び基板処理方法
JP6876417B2 (ja) * 2016-12-02 2021-05-26 東京エレクトロン株式会社 基板処理装置の洗浄方法および基板処理装置の洗浄システム
JP7277137B2 (ja) * 2018-12-28 2023-05-18 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および搬送モジュール

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120016011A (ko) * 2010-08-12 2012-02-22 도쿄엘렉트론가부시키가이샤 액 처리 장치, 액 처리 방법 및 기억 매체

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