JP3991608B2 - レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 - Google Patents
レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 Download PDFInfo
- Publication number
- JP3991608B2 JP3991608B2 JP2001094075A JP2001094075A JP3991608B2 JP 3991608 B2 JP3991608 B2 JP 3991608B2 JP 2001094075 A JP2001094075 A JP 2001094075A JP 2001094075 A JP2001094075 A JP 2001094075A JP 3991608 B2 JP3991608 B2 JP 3991608B2
- Authority
- JP
- Japan
- Prior art keywords
- cutting
- panel
- glass substrate
- laser
- irradiation intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title description 15
- 239000000758 substrate Substances 0.000 claims description 245
- 238000005520 cutting process Methods 0.000 claims description 154
- 239000011521 glass Substances 0.000 claims description 126
- 238000003698 laser cutting Methods 0.000 claims description 36
- 238000007689 inspection Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 11
- 230000003247 decreasing effect Effects 0.000 claims description 9
- 238000003384 imaging method Methods 0.000 claims description 8
- 230000007423 decrease Effects 0.000 claims description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 41
- 239000003566 sealing material Substances 0.000 description 20
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 14
- 238000010586 diagram Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 229910002092 carbon dioxide Inorganic materials 0.000 description 8
- 239000001569 carbon dioxide Substances 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 230000008646 thermal stress Effects 0.000 description 4
- 230000010365 information processing Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000000382 optic material Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
- C03B33/093—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam using two or more focussed radiation beams
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/07—Cutting armoured, multi-layered, coated or laminated, glass products
- C03B33/076—Laminated glass comprising interlayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Liquid Crystal (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001094075A JP3991608B2 (ja) | 2001-03-28 | 2001-03-28 | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001094075A JP3991608B2 (ja) | 2001-03-28 | 2001-03-28 | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007120581A Division JP4775313B2 (ja) | 2007-05-01 | 2007-05-01 | レーザ切断方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002293560A JP2002293560A (ja) | 2002-10-09 |
| JP2002293560A5 JP2002293560A5 (enExample) | 2005-02-24 |
| JP3991608B2 true JP3991608B2 (ja) | 2007-10-17 |
Family
ID=18948325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001094075A Expired - Fee Related JP3991608B2 (ja) | 2001-03-28 | 2001-03-28 | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3991608B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100906543B1 (ko) * | 2004-12-08 | 2009-07-07 | 가부시키가이샤 레이져 솔루션즈 | 피분할체에 있어서의 분할 기점 형성 방법, 피분할체의 분할 방법, 및 펄스 레이저광에 의한 피가공물의 가공방법 |
| CN100481337C (zh) * | 2004-12-08 | 2009-04-22 | 雷射先进科技株式会社 | 被分割体的分割起点形成方法、被分割体的分割方法 |
| KR100693947B1 (ko) | 2006-05-17 | 2007-03-12 | 케이 이엔지(주) | 레이저를 이용한 대형 유리의 절단 방법 |
| DE102007008634B3 (de) * | 2007-02-16 | 2008-08-07 | Jenoptik Automatisierungstechnik Gmbh | Verfahren und Vorrichtung zum Trennen von Verbundglasscheiben |
| JP5171294B2 (ja) * | 2008-02-06 | 2013-03-27 | 株式会社ディスコ | レーザ加工方法 |
| JP2009255114A (ja) * | 2008-04-15 | 2009-11-05 | Linkstar Japan Co Ltd | 脆性材料基板の加工装置および切断方法 |
| JP5074272B2 (ja) * | 2008-04-15 | 2012-11-14 | 株式会社リンクスタージャパン | 脆性材料基板の加工装置および切断方法 |
| JP5220465B2 (ja) * | 2008-04-15 | 2013-06-26 | 株式会社リンクスタージャパン | 脆性材料基板の加工装置および加工方法 |
| KR101010310B1 (ko) * | 2008-05-06 | 2011-01-25 | 세메스 주식회사 | 스크라이빙 장치, 그리고 이를 이용한 기판 절단 장치 및방법 |
| JP2012221912A (ja) * | 2011-04-14 | 2012-11-12 | Nissan Motor Co Ltd | 電極製造方法および電極製造装置 |
| CN113369712B (zh) * | 2021-06-23 | 2023-03-24 | 业成科技(成都)有限公司 | 镭射切割方法、装置及计算机可读存储介质 |
-
2001
- 2001-03-28 JP JP2001094075A patent/JP3991608B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002293560A (ja) | 2002-10-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6563082B2 (en) | Laser cutting method, laser cutting apparatus, and method and apparatus for manufacturing liquid crystal device | |
| US8791387B2 (en) | Laser cutting method, display apparatus manufacturing method, and display apparatus | |
| JP4775313B2 (ja) | レーザ切断方法 | |
| JP4260219B2 (ja) | 表示パネルの製造方法、表示パネルの製造装置、及び表示パネル | |
| US6295110B1 (en) | Liquid crystal display device having orientation film oriented by light | |
| JP3991608B2 (ja) | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 | |
| JP2002316829A (ja) | ガラス基板の切断方法、電気光学装置の製造方法、電気光学装置、電子機器、およびスクライブ溝形成装置 | |
| KR100539971B1 (ko) | 엘씨디 글래스 절단 장치, 엘씨디 글래스 절단방법 및 이를이용한 대형 평판 표시 소자 제조 방법 | |
| JP2002224871A (ja) | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 | |
| US20090316081A1 (en) | Method for manufacturing a liquid crystal display device and mother substrate for manufacturing the same | |
| KR101999336B1 (ko) | 액정표시장치 및 그 제조 방법 | |
| JP2002224870A (ja) | レーザ切断方法、電気光学装置の製造方法、電気光学装置、および電子機器 | |
| US20070153219A1 (en) | Apparatus and method for cutting liquid crystal display device and method for fabricating liquid crystal display device using the same | |
| KR20010017690A (ko) | 레이저 커팅 장치 및 이를 이용한 유리 기판 커팅 방법 | |
| WO2020124872A1 (zh) | 蚀刻监测装置及蚀刻监测方法 | |
| JP2000031013A5 (enExample) | ||
| JP2003146679A (ja) | レーザ切断方法、レーザ切断装置、電気光学パネルの製造方法、電気光学装置及び電子機器 | |
| JP2002224872A (ja) | レーザ切断方法、電気光学装置の製造方法、電気光学装置、電子機器およびレーザ切断装置 | |
| JP2003034543A (ja) | スクライブ溝形成装置、スクライブ溝形成方法、ガラス基板の切断方法、電気光学装置の製造方法、電気光学装置、及び、電子機器 | |
| KR100623970B1 (ko) | 레이저 커팅 설비 및 이를 이용한 커팅 방법 | |
| JP2003137573A (ja) | ガラス基板の切断方法、電気光学装置の製造方法、電気光学装置、および電子機器 | |
| JP4710732B2 (ja) | 基板及びその分断方法、電気光学装置及びその製造方法、ならびに電子機器 | |
| CN101004491B (zh) | 液晶面板及其修补方法 | |
| JP2007319882A (ja) | 積層体の製造方法、レーザ加工装置、表示装置、電気光学装置、電子機器 | |
| JP2001075110A (ja) | 電気光学装置とその製造方法および電子機器 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040325 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040325 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060818 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20061121 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070119 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070306 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070502 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070703 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070716 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100803 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110803 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120803 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130803 Year of fee payment: 6 |
|
| LAPS | Cancellation because of no payment of annual fees |