JP3940967B2 - 電子材料用洗浄水の製造方法及び電子材料の洗浄方法 - Google Patents

電子材料用洗浄水の製造方法及び電子材料の洗浄方法 Download PDF

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Publication number
JP3940967B2
JP3940967B2 JP19778297A JP19778297A JP3940967B2 JP 3940967 B2 JP3940967 B2 JP 3940967B2 JP 19778297 A JP19778297 A JP 19778297A JP 19778297 A JP19778297 A JP 19778297A JP 3940967 B2 JP3940967 B2 JP 3940967B2
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Prior art keywords
cleaning
water
fine particles
electronic material
electronic
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Expired - Fee Related
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JP19778297A
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English (en)
Japanese (ja)
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JPH1129794A5 (enExample
JPH1129794A (ja
Inventor
博志 森田
哲夫 水庭
純一 井田
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Priority to JP19778297A priority Critical patent/JP3940967B2/ja
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Publication of JPH1129794A5 publication Critical patent/JPH1129794A5/ja
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Publication of JP3940967B2 publication Critical patent/JP3940967B2/ja
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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Detergent Compositions (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP19778297A 1997-07-08 1997-07-08 電子材料用洗浄水の製造方法及び電子材料の洗浄方法 Expired - Fee Related JP3940967B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19778297A JP3940967B2 (ja) 1997-07-08 1997-07-08 電子材料用洗浄水の製造方法及び電子材料の洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19778297A JP3940967B2 (ja) 1997-07-08 1997-07-08 電子材料用洗浄水の製造方法及び電子材料の洗浄方法

Publications (3)

Publication Number Publication Date
JPH1129794A JPH1129794A (ja) 1999-02-02
JPH1129794A5 JPH1129794A5 (enExample) 2005-04-07
JP3940967B2 true JP3940967B2 (ja) 2007-07-04

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JP19778297A Expired - Fee Related JP3940967B2 (ja) 1997-07-08 1997-07-08 電子材料用洗浄水の製造方法及び電子材料の洗浄方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101255895B1 (ko) * 2009-12-10 2013-04-17 가부시키가이샤 코아테크노로지 포화 가스 함유 나노 버블수의 제조 방법

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4506909B2 (ja) * 1999-02-17 2010-07-21 栗田工業株式会社 シリコン基板表面酸化膜の平坦化処理方法
TW464970B (en) 1999-04-21 2001-11-21 Sharp Kk Ultrasonic cleaning device and resist-stripping device
JP4484980B2 (ja) 1999-05-20 2010-06-16 株式会社ルネサステクノロジ フォトマスクの洗浄方法、洗浄装置およびフォトマスクの洗浄液
JP4683314B2 (ja) * 2000-08-01 2011-05-18 栗田工業株式会社 半導体用シリコン基板の洗浄方法
CN1444259A (zh) 2002-03-12 2003-09-24 株式会社东芝 半导体器件的制造方法
JP4967001B2 (ja) * 2009-03-13 2012-07-04 ミズ株式会社 水素含有生体適用液の製造方法、及びそのための装置
JP5353730B2 (ja) * 2010-01-25 2013-11-27 信越半導体株式会社 超音波洗浄方法と超音波洗浄装置、および超音波洗浄に用いる伝播水の製造方法
JP5266267B2 (ja) * 2010-02-26 2013-08-21 ミズ株式会社 水素含有生体適用液の製造方法及び製造装置
JP6154860B2 (ja) * 2015-07-17 2017-06-28 野村マイクロ・サイエンス株式会社 洗浄用水素水の製造方法及び製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101255895B1 (ko) * 2009-12-10 2013-04-17 가부시키가이샤 코아테크노로지 포화 가스 함유 나노 버블수의 제조 방법

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JPH1129794A (ja) 1999-02-02

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