JP3928902B2 - 基板製造ラインおよび基板製造方法 - Google Patents

基板製造ラインおよび基板製造方法 Download PDF

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Publication number
JP3928902B2
JP3928902B2 JP03921398A JP3921398A JP3928902B2 JP 3928902 B2 JP3928902 B2 JP 3928902B2 JP 03921398 A JP03921398 A JP 03921398A JP 3921398 A JP3921398 A JP 3921398A JP 3928902 B2 JP3928902 B2 JP 3928902B2
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Japan
Prior art keywords
substrate
chamber
robot
processing
loading
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Expired - Lifetime
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JP03921398A
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English (en)
Japanese (ja)
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JPH11238672A (ja
JPH11238672A5 (enExample
Inventor
英二郎 坂本
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Hirata Corp
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Hirata Corp
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Priority to JP03921398A priority Critical patent/JP3928902B2/ja
Publication of JPH11238672A publication Critical patent/JPH11238672A/ja
Publication of JPH11238672A5 publication Critical patent/JPH11238672A5/ja
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Publication of JP3928902B2 publication Critical patent/JP3928902B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP03921398A 1998-02-20 1998-02-20 基板製造ラインおよび基板製造方法 Expired - Lifetime JP3928902B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03921398A JP3928902B2 (ja) 1998-02-20 1998-02-20 基板製造ラインおよび基板製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03921398A JP3928902B2 (ja) 1998-02-20 1998-02-20 基板製造ラインおよび基板製造方法

Publications (3)

Publication Number Publication Date
JPH11238672A JPH11238672A (ja) 1999-08-31
JPH11238672A5 JPH11238672A5 (enExample) 2005-08-25
JP3928902B2 true JP3928902B2 (ja) 2007-06-13

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JP03921398A Expired - Lifetime JP3928902B2 (ja) 1998-02-20 1998-02-20 基板製造ラインおよび基板製造方法

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JP (1) JP3928902B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101184668B1 (ko) * 2009-02-16 2012-09-21 아텔 카부시키카이샤 기판반송장치
US8827621B2 (en) 2010-03-10 2014-09-09 Sokudo Co., Ltd. Substrate processing apparatus, storage device, and method of transporting substrate storing container

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3930244B2 (ja) * 2000-11-10 2007-06-13 東京エレクトロン株式会社 処理装置
JP3943828B2 (ja) * 2000-12-08 2007-07-11 東京エレクトロン株式会社 塗布、現像装置及びパターン形成方法
TW533460B (en) * 2001-03-09 2003-05-21 Tokyo Electron Ltd Processing apparatus
JP4114737B2 (ja) * 2001-03-09 2008-07-09 東京エレクトロン株式会社 処理装置
KR100452317B1 (ko) * 2001-07-11 2004-10-12 삼성전자주식회사 포토리소그래피 공정시스템 및 그 방법
JP2005142372A (ja) * 2003-11-06 2005-06-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
US7656506B2 (en) 2004-12-23 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a substrate handler
US7538857B2 (en) 2004-12-23 2009-05-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a substrate handler
JP4949439B2 (ja) * 2004-12-30 2012-06-06 エーエスエムエル ネザーランズ ビー．ブイ． 基板ハンドラ
JP4870425B2 (ja) * 2004-12-30 2012-02-08 エーエスエムエル ネザーランズ ビー．ブイ． 基板ハンドラ
JP4747618B2 (ja) * 2005-03-16 2011-08-17 パナソニック株式会社 パネル供給装置およびパネル搬送方法
JP5637635B2 (ja) * 2012-10-09 2014-12-10 東亜工業株式会社 多段式加熱炉システム
KR102619630B1 (ko) * 2020-10-29 2024-01-02 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
CN113894027B (zh) * 2021-11-23 2024-03-22 东莞市鑫华智能制造有限公司 一种uv固化设备

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101184668B1 (ko) * 2009-02-16 2012-09-21 아텔 카부시키카이샤 기판반송장치
US8827621B2 (en) 2010-03-10 2014-09-09 Sokudo Co., Ltd. Substrate processing apparatus, storage device, and method of transporting substrate storing container
US9728434B2 (en) 2010-03-10 2017-08-08 Screen Semiconductor Solutions Co., Ltd. Substrate processing apparatus, storage device, and method of transporting substrate storing container

Also Published As

Publication number Publication date
JPH11238672A (ja) 1999-08-31

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