JP3921953B2 - マスク、マスクの製造方法、微細構造体の製造方法、及び液晶ディスプレイの製造方法 - Google Patents
マスク、マスクの製造方法、微細構造体の製造方法、及び液晶ディスプレイの製造方法 Download PDFInfo
- Publication number
- JP3921953B2 JP3921953B2 JP2001091340A JP2001091340A JP3921953B2 JP 3921953 B2 JP3921953 B2 JP 3921953B2 JP 2001091340 A JP2001091340 A JP 2001091340A JP 2001091340 A JP2001091340 A JP 2001091340A JP 3921953 B2 JP3921953 B2 JP 3921953B2
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- Prior art keywords
- processing
- mask
- layer
- liquid crystal
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000004519 manufacturing process Methods 0.000 title claims description 70
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 62
- 238000000034 method Methods 0.000 claims description 56
- 238000002834 transmittance Methods 0.000 claims description 27
- 230000005540 biological transmission Effects 0.000 claims description 26
- 238000003384 imaging method Methods 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 6
- 238000009792 diffusion process Methods 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 33
- 230000008569 process Effects 0.000 description 20
- 239000000758 substrate Substances 0.000 description 15
- 230000000694 effects Effects 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 210000004027 cell Anatomy 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 210000002858 crystal cell Anatomy 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VAYOSLLFUXYJDT-RDTXWAMCSA-N Lysergic acid diethylamide Chemical compound C1=CC(C=2[C@H](N(C)C[C@@H](C=2)C(=O)N(CC)CC)C2)=C3C2=CNC3=C1 VAYOSLLFUXYJDT-RDTXWAMCSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001091340A JP3921953B2 (ja) | 2001-03-27 | 2001-03-27 | マスク、マスクの製造方法、微細構造体の製造方法、及び液晶ディスプレイの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001091340A JP3921953B2 (ja) | 2001-03-27 | 2001-03-27 | マスク、マスクの製造方法、微細構造体の製造方法、及び液晶ディスプレイの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002287325A JP2002287325A (ja) | 2002-10-03 |
| JP2002287325A5 JP2002287325A5 (https=) | 2005-03-03 |
| JP3921953B2 true JP3921953B2 (ja) | 2007-05-30 |
Family
ID=18945970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001091340A Expired - Fee Related JP3921953B2 (ja) | 2001-03-27 | 2001-03-27 | マスク、マスクの製造方法、微細構造体の製造方法、及び液晶ディスプレイの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3921953B2 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4515012B2 (ja) * | 2002-08-07 | 2010-07-28 | 大日本印刷株式会社 | パターンデータの作製方法およびフォトマスク |
| JP5031173B2 (ja) * | 2003-03-26 | 2012-09-19 | 大日本印刷株式会社 | 撮像装置と撮像装置におけるマイクロレンズの形成方法 |
| JP5200439B2 (ja) * | 2006-07-21 | 2013-06-05 | 大日本印刷株式会社 | カラーフィルタの製造方法 |
| JP5228390B2 (ja) * | 2006-07-21 | 2013-07-03 | 大日本印刷株式会社 | 階調マスク |
| JP5673718B2 (ja) * | 2006-07-21 | 2015-02-18 | 大日本印刷株式会社 | 階調マスク |
| JP2009237419A (ja) * | 2008-03-28 | 2009-10-15 | Hoya Corp | 多階調フォトマスク及びその製造方法、並びにパターン転写方法 |
| JP2010020146A (ja) * | 2008-07-11 | 2010-01-28 | Fujifilm Corp | カラーフィルタ及びその製造方法、並びに液晶表示装置 |
| JP5510865B2 (ja) * | 2009-03-25 | 2014-06-04 | 住友化学株式会社 | 防眩処理方法、防眩フィルムの製造方法および金型の製造方法 |
| JP5671788B2 (ja) * | 2009-07-13 | 2015-02-18 | 凸版印刷株式会社 | カラーフィルタ基板用フォトマスク及びカラーフィルタ基板 |
| CN102054279A (zh) * | 2009-11-02 | 2011-05-11 | 住友化学株式会社 | 随机图案的生成方法 |
| JP2011118328A (ja) * | 2009-11-02 | 2011-06-16 | Sumitomo Chemical Co Ltd | ランダムパターンの作成方法 |
-
2001
- 2001-03-27 JP JP2001091340A patent/JP3921953B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002287325A (ja) | 2002-10-03 |
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