JP3912845B2 - 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法 - Google Patents

窒化ガリウム系化合物半導体発光ダイオード及びその製造方法 Download PDF

Info

Publication number
JP3912845B2
JP3912845B2 JP10729097A JP10729097A JP3912845B2 JP 3912845 B2 JP3912845 B2 JP 3912845B2 JP 10729097 A JP10729097 A JP 10729097A JP 10729097 A JP10729097 A JP 10729097A JP 3912845 B2 JP3912845 B2 JP 3912845B2
Authority
JP
Japan
Prior art keywords
gallium nitride
compound semiconductor
layer
type
nitride compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10729097A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10303502A (ja
JPH10303502A5 (enExample
Inventor
俊雄 幡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP10729097A priority Critical patent/JP3912845B2/ja
Publication of JPH10303502A publication Critical patent/JPH10303502A/ja
Publication of JPH10303502A5 publication Critical patent/JPH10303502A5/ja
Application granted granted Critical
Publication of JP3912845B2 publication Critical patent/JP3912845B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
JP10729097A 1997-04-24 1997-04-24 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法 Expired - Fee Related JP3912845B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10729097A JP3912845B2 (ja) 1997-04-24 1997-04-24 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10729097A JP3912845B2 (ja) 1997-04-24 1997-04-24 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法

Publications (3)

Publication Number Publication Date
JPH10303502A JPH10303502A (ja) 1998-11-13
JPH10303502A5 JPH10303502A5 (enExample) 2005-03-17
JP3912845B2 true JP3912845B2 (ja) 2007-05-09

Family

ID=14455357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10729097A Expired - Fee Related JP3912845B2 (ja) 1997-04-24 1997-04-24 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法

Country Status (1)

Country Link
JP (1) JP3912845B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3459599B2 (ja) 1999-09-24 2003-10-20 三洋電機株式会社 半導体発光素子
JP2002184581A (ja) 2000-12-13 2002-06-28 Sanyo Electric Co Ltd 有機発光素子
US20060002442A1 (en) * 2004-06-30 2006-01-05 Kevin Haberern Light emitting devices having current blocking structures and methods of fabricating light emitting devices having current blocking structures
US7335920B2 (en) 2005-01-24 2008-02-26 Cree, Inc. LED with current confinement structure and surface roughening
JP4951865B2 (ja) * 2005-03-02 2012-06-13 日亜化学工業株式会社 半導体発光素子
JP2008047641A (ja) * 2006-08-11 2008-02-28 Sharp Corp 半導体レーザ素子とその製造方法、光ディスク装置、および光伝送モジュール
JP4985930B2 (ja) * 2006-11-08 2012-07-25 シャープ株式会社 窒化物系化合物半導体発光素子およびその製造方法
JP2015056647A (ja) 2013-09-13 2015-03-23 株式会社東芝 窒化物半導体発光装置

Also Published As

Publication number Publication date
JPH10303502A (ja) 1998-11-13

Similar Documents

Publication Publication Date Title
US6091083A (en) Gallium nitride type compound semiconductor light-emitting device having buffer layer with non-flat surface
US7687294B2 (en) Nitride semiconductor device and method of manufacturing the same
JP3688843B2 (ja) 窒化物系半導体素子の製造方法
JP3728332B2 (ja) 化合物半導体発光素子
JP3517091B2 (ja) 窒化ガリウム系半導体発光素子およびその製造方法
US20040056259A1 (en) Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method
JPH11312840A (ja) 半導体レーザ素子及びその製造方法
JP2002198314A (ja) 窒化物半導体の製造方法、窒化物半導体素子の製造方法及びそれを用いた窒化物半導体素子
JP2002016000A (ja) 窒化物系半導体素子および窒化物系半導体基板
US20050032344A1 (en) Group III nitride compound semiconductor laser
JP3311275B2 (ja) 窒化物系半導体発光素子
CN101714745B (zh) 半导体激光器及其制造方法、光拾波器和光盘驱动装置
JP3898798B2 (ja) 窒化ガリウム系化合物半導体発光素子の製造方法
JP3912845B2 (ja) 窒化ガリウム系化合物半導体発光ダイオード及びその製造方法
JP2010272593A (ja) 窒化物半導体発光素子及びその製造方法
JP3716622B2 (ja) 半導体レーザ
KR100387099B1 (ko) 질화갈륨계 발광다이오드 및 그 제조방법
JP2006313890A (ja) 窒化ガリウム系半導体素子及びその製造方法
JP3963233B2 (ja) 窒化ガリウム系化合物半導体発光素子及びその製造方法
KR100728132B1 (ko) 전류 확산층을 이용한 발광 다이오드
JP3543628B2 (ja) 窒化物系iii−v族化合物半導体の成長方法および半導体発光素子の製造方法
JPH11224859A (ja) 窒化ガリウム系化合物半導体のドーピング方法および半導体素子の製造方法
JP2002374002A (ja) 窒化ガリウム系化合物半導体発光素子及びその製造方法
JP2002076518A (ja) 半導体レーザおよび半導体素子並びにそれらの製造方法
JP4033519B2 (ja) 窒化ガリウム系化合物半導体発光素子

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040422

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040422

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20040422

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061031

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061129

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070123

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070130

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100209

Year of fee payment: 3

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110209

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120209

Year of fee payment: 5

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120209

Year of fee payment: 5

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130209

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130209

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140209

Year of fee payment: 7

LAPS Cancellation because of no payment of annual fees