JP3853781B2 - 燃焼ヒータ及び排ガス燃焼装置 - Google Patents
燃焼ヒータ及び排ガス燃焼装置 Download PDFInfo
- Publication number
- JP3853781B2 JP3853781B2 JP2003394449A JP2003394449A JP3853781B2 JP 3853781 B2 JP3853781 B2 JP 3853781B2 JP 2003394449 A JP2003394449 A JP 2003394449A JP 2003394449 A JP2003394449 A JP 2003394449A JP 3853781 B2 JP3853781 B2 JP 3853781B2
- Authority
- JP
- Japan
- Prior art keywords
- heater
- combustion
- source
- holder
- combustible gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000002485 combustion reaction Methods 0.000 title claims description 204
- 238000010438 heat treatment Methods 0.000 claims description 74
- 239000000919 ceramic Substances 0.000 claims description 20
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 10
- 239000010453 quartz Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000007789 gas Substances 0.000 description 184
- 239000002184 metal Substances 0.000 description 20
- 238000010892 electric spark Methods 0.000 description 15
- 239000001257 hydrogen Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010292 electrical insulation Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000567 combustion gas Substances 0.000 description 2
- 238000009841 combustion method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23C—METHODS OR APPARATUS FOR COMBUSTION USING FLUID FUEL OR SOLID FUEL SUSPENDED IN A CARRIER GAS OR AIR
- F23C3/00—Combustion apparatus characterised by the shape of the combustion chamber
- F23C3/002—Combustion apparatus characterised by the shape of the combustion chamber the chamber having an elongated tubular form, e.g. for a radiant tube
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23C—METHODS OR APPARATUS FOR COMBUSTION USING FLUID FUEL OR SOLID FUEL SUSPENDED IN A CARRIER GAS OR AIR
- F23C7/00—Combustion apparatus characterised by arrangements for air supply
- F23C7/02—Disposition of air supply not passing through burner
- F23C7/06—Disposition of air supply not passing through burner for heating the incoming air
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23Q—IGNITION; EXTINGUISHING-DEVICES
- F23Q7/00—Incandescent ignition; Igniters using electrically-produced heat, e.g. lighters for cigarettes; Electrically-heated glowing plugs
- F23Q7/06—Incandescent ignition; Igniters using electrically-produced heat, e.g. lighters for cigarettes; Electrically-heated glowing plugs structurally associated with fluid-fuel burners
- F23Q7/10—Incandescent ignition; Igniters using electrically-produced heat, e.g. lighters for cigarettes; Electrically-heated glowing plugs structurally associated with fluid-fuel burners for gaseous fuel, e.g. in welding appliances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Combustion & Propulsion (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Thermal Sciences (AREA)
- Resistance Heating (AREA)
- Incineration Of Waste (AREA)
- Control Of Resistance Heating (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003394449A JP3853781B2 (ja) | 2003-11-25 | 2003-11-25 | 燃焼ヒータ及び排ガス燃焼装置 |
TW093135173A TWI278590B (en) | 2003-11-25 | 2004-11-17 | Combustion heater and exhaust gas combustion device |
KR1020040097040A KR100682709B1 (ko) | 2003-11-25 | 2004-11-24 | 연소 히터 및 배기가스 연소장치 |
CNB2004100962347A CN100357664C (zh) | 2003-11-25 | 2004-11-25 | 燃烧加热器及排气燃烧装置 |
CN2007101850840A CN101220958B (zh) | 2003-11-25 | 2004-11-25 | 燃烧加热器及排气燃烧装置 |
KR1020060105711A KR100830029B1 (ko) | 2003-11-25 | 2006-10-30 | 배기가스 연소장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003394449A JP3853781B2 (ja) | 2003-11-25 | 2003-11-25 | 燃焼ヒータ及び排ガス燃焼装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006188441A Division JP4063852B2 (ja) | 2006-07-07 | 2006-07-07 | 排ガス燃焼装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005156007A JP2005156007A (ja) | 2005-06-16 |
JP3853781B2 true JP3853781B2 (ja) | 2006-12-06 |
Family
ID=34720513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003394449A Expired - Lifetime JP3853781B2 (ja) | 2003-11-25 | 2003-11-25 | 燃焼ヒータ及び排ガス燃焼装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3853781B2 (ko) |
KR (2) | KR100682709B1 (ko) |
CN (2) | CN101220958B (ko) |
TW (1) | TWI278590B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103075725A (zh) * | 2013-02-01 | 2013-05-01 | 浙江特富锅炉有限公司 | 燃用化工废气锅炉炉膛 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102914617B (zh) * | 2012-10-16 | 2015-01-07 | 上海天科化工检测有限公司 | 一种便携式固液物料燃烧危险性的筛选装置 |
CN103591592B (zh) * | 2013-10-25 | 2016-04-27 | 包秀敏 | 基于氢气和氧气的废气焚烧装置 |
KR102368562B1 (ko) * | 2020-02-11 | 2022-02-28 | 주식회사 포스코 | 가스 검사 장치 및 방법 |
CN115007085B (zh) * | 2022-08-04 | 2022-12-02 | 江苏铧德氢能源科技有限公司 | 制氢装置中的气体分布器 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5657855A (en) * | 1979-10-16 | 1981-05-20 | Aisin Chem Co Ltd | Thick coating paint |
FR2591509B1 (fr) * | 1985-12-17 | 1989-10-27 | Labo Electronique Physique | Dispositif antipollution pour l'elimination des gaz toxiques utilises dans l'elaboration des materiaux semiconducteurs du groupe iii-v. |
EP0410151A1 (de) * | 1989-07-28 | 1991-01-30 | Heraeus Quarzglas GmbH | Infrarot-Strahler mmit elektrischer Heizwendel |
JPH05240028A (ja) * | 1992-02-28 | 1993-09-17 | Asahi Glass Co Ltd | 電気シースヒータおよびこれが組み込まれたディーゼル機関用パティキュレートトラップ |
JP3016690B2 (ja) * | 1994-05-30 | 2000-03-06 | カンケンテクノ株式会社 | 半導体製造排ガス除害方法とその装置 |
DE4436908A1 (de) * | 1994-10-15 | 1996-04-18 | Philips Patentverwaltung | Düse für eine Verbrennungsvorrichtung |
JPH10162850A (ja) * | 1996-11-27 | 1998-06-19 | Sanyo Electric Co Ltd | 燃料電池の未反応ガス燃焼処理装置 |
GB9719512D0 (en) * | 1997-09-12 | 1997-11-19 | Boc Group Plc | Treatment of a combustible gas stream |
JP2002162296A (ja) * | 2000-11-27 | 2002-06-07 | Nippon Dennetsu Co Ltd | 温度感知センサー付きヒータ |
KR100399793B1 (ko) * | 2001-11-22 | 2003-09-29 | (주) 윈테크 | 수소 가스 연소 방법 및 이를 수행하기 위한 시스템 |
JP4810227B2 (ja) * | 2005-12-28 | 2011-11-09 | シャープ株式会社 | 電子機器のキャビネットをインサート成形する方法及び布製カバーによって覆われたキャビネットを有する電子機器 |
-
2003
- 2003-11-25 JP JP2003394449A patent/JP3853781B2/ja not_active Expired - Lifetime
-
2004
- 2004-11-17 TW TW093135173A patent/TWI278590B/zh active
- 2004-11-24 KR KR1020040097040A patent/KR100682709B1/ko active IP Right Grant
- 2004-11-25 CN CN2007101850840A patent/CN101220958B/zh active Active
- 2004-11-25 CN CNB2004100962347A patent/CN100357664C/zh active Active
-
2006
- 2006-10-30 KR KR1020060105711A patent/KR100830029B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103075725A (zh) * | 2013-02-01 | 2013-05-01 | 浙江特富锅炉有限公司 | 燃用化工废气锅炉炉膛 |
CN103075725B (zh) * | 2013-02-01 | 2015-02-25 | 浙江特富锅炉有限公司 | 燃用化工废气锅炉炉膛 |
Also Published As
Publication number | Publication date |
---|---|
KR20050050576A (ko) | 2005-05-31 |
TWI278590B (en) | 2007-04-11 |
KR100682709B1 (ko) | 2007-02-15 |
CN101220958A (zh) | 2008-07-16 |
CN1641265A (zh) | 2005-07-20 |
TW200526903A (en) | 2005-08-16 |
JP2005156007A (ja) | 2005-06-16 |
CN100357664C (zh) | 2007-12-26 |
KR20060127821A (ko) | 2006-12-13 |
KR100830029B1 (ko) | 2008-05-15 |
CN101220958B (zh) | 2011-06-01 |
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