JP3837903B2 - 透明導電膜とその製造方法 - Google Patents
透明導電膜とその製造方法 Download PDFInfo
- Publication number
- JP3837903B2 JP3837903B2 JP09789798A JP9789798A JP3837903B2 JP 3837903 B2 JP3837903 B2 JP 3837903B2 JP 09789798 A JP09789798 A JP 09789798A JP 9789798 A JP9789798 A JP 9789798A JP 3837903 B2 JP3837903 B2 JP 3837903B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent conductive
- conductive film
- film
- zno
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09789798A JP3837903B2 (ja) | 1998-04-09 | 1998-04-09 | 透明導電膜とその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09789798A JP3837903B2 (ja) | 1998-04-09 | 1998-04-09 | 透明導電膜とその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11297640A JPH11297640A (ja) | 1999-10-29 |
| JPH11297640A5 JPH11297640A5 (enExample) | 2004-11-11 |
| JP3837903B2 true JP3837903B2 (ja) | 2006-10-25 |
Family
ID=14204546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09789798A Expired - Fee Related JP3837903B2 (ja) | 1998-04-09 | 1998-04-09 | 透明導電膜とその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3837903B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006147325A (ja) * | 2004-11-19 | 2006-06-08 | Nikko Materials Co Ltd | 低抵抗率透明導電体 |
| JP4904934B2 (ja) * | 2006-06-08 | 2012-03-28 | 東ソー株式会社 | 酸化亜鉛系透明導電膜及びそれを用いた液晶ディスプレイ並びに酸化亜鉛系スパッタリングターゲット |
| JP5224229B2 (ja) * | 2006-08-10 | 2013-07-03 | 公立大学法人高知工科大学 | 透明電磁遮蔽膜 |
| TW200834610A (en) * | 2007-01-10 | 2008-08-16 | Nitto Denko Corp | Transparent conductive film and method for producing the same |
| JP4917897B2 (ja) | 2007-01-10 | 2012-04-18 | 日東電工株式会社 | 透明導電フィルムおよびその製造方法 |
| JP5432501B2 (ja) * | 2008-05-13 | 2014-03-05 | 日東電工株式会社 | 透明導電フィルム及びその製造方法 |
| JP2015147983A (ja) * | 2014-02-07 | 2015-08-20 | リンテック株式会社 | 透明導電フィルム、透明導電フィルムの製造方法、および透明導電フィルムを用いてなる電子デバイス |
-
1998
- 1998-04-09 JP JP09789798A patent/JP3837903B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11297640A (ja) | 1999-10-29 |
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