JP3837903B2 - 透明導電膜とその製造方法 - Google Patents

透明導電膜とその製造方法 Download PDF

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Publication number
JP3837903B2
JP3837903B2 JP09789798A JP9789798A JP3837903B2 JP 3837903 B2 JP3837903 B2 JP 3837903B2 JP 09789798 A JP09789798 A JP 09789798A JP 9789798 A JP9789798 A JP 9789798A JP 3837903 B2 JP3837903 B2 JP 3837903B2
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Japan
Prior art keywords
transparent conductive
conductive film
film
zno
atmosphere
Prior art date
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Expired - Fee Related
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JP09789798A
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English (en)
Japanese (ja)
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JPH11297640A5 (enExample
JPH11297640A (ja
Inventor
正美 宮崎
一夫 佐藤
彰 光井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP09789798A priority Critical patent/JP3837903B2/ja
Publication of JPH11297640A publication Critical patent/JPH11297640A/ja
Publication of JPH11297640A5 publication Critical patent/JPH11297640A5/ja
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Publication of JP3837903B2 publication Critical patent/JP3837903B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP09789798A 1998-04-09 1998-04-09 透明導電膜とその製造方法 Expired - Fee Related JP3837903B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09789798A JP3837903B2 (ja) 1998-04-09 1998-04-09 透明導電膜とその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09789798A JP3837903B2 (ja) 1998-04-09 1998-04-09 透明導電膜とその製造方法

Publications (3)

Publication Number Publication Date
JPH11297640A JPH11297640A (ja) 1999-10-29
JPH11297640A5 JPH11297640A5 (enExample) 2004-11-11
JP3837903B2 true JP3837903B2 (ja) 2006-10-25

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Family Applications (1)

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JP09789798A Expired - Fee Related JP3837903B2 (ja) 1998-04-09 1998-04-09 透明導電膜とその製造方法

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JP (1) JP3837903B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006147325A (ja) * 2004-11-19 2006-06-08 Nikko Materials Co Ltd 低抵抗率透明導電体
JP4904934B2 (ja) * 2006-06-08 2012-03-28 東ソー株式会社 酸化亜鉛系透明導電膜及びそれを用いた液晶ディスプレイ並びに酸化亜鉛系スパッタリングターゲット
JP5224229B2 (ja) * 2006-08-10 2013-07-03 公立大学法人高知工科大学 透明電磁遮蔽膜
TW200834610A (en) * 2007-01-10 2008-08-16 Nitto Denko Corp Transparent conductive film and method for producing the same
JP4917897B2 (ja) 2007-01-10 2012-04-18 日東電工株式会社 透明導電フィルムおよびその製造方法
JP5432501B2 (ja) * 2008-05-13 2014-03-05 日東電工株式会社 透明導電フィルム及びその製造方法
JP2015147983A (ja) * 2014-02-07 2015-08-20 リンテック株式会社 透明導電フィルム、透明導電フィルムの製造方法、および透明導電フィルムを用いてなる電子デバイス

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Publication number Publication date
JPH11297640A (ja) 1999-10-29

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