JP3832681B2 - ステージ装置及び該装置を備えた露光装置 - Google Patents

ステージ装置及び該装置を備えた露光装置 Download PDF

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Publication number
JP3832681B2
JP3832681B2 JP06578997A JP6578997A JP3832681B2 JP 3832681 B2 JP3832681 B2 JP 3832681B2 JP 06578997 A JP06578997 A JP 06578997A JP 6578997 A JP6578997 A JP 6578997A JP 3832681 B2 JP3832681 B2 JP 3832681B2
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Japan
Prior art keywords
stage
light beam
movable stage
amount
detection system
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Expired - Fee Related
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JP06578997A
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English (en)
Japanese (ja)
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JPH10261570A5 (enExample
JPH10261570A (ja
Inventor
健爾 西
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Nikon Corp
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Nikon Corp
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Priority to JP06578997A priority Critical patent/JP3832681B2/ja
Publication of JPH10261570A publication Critical patent/JPH10261570A/ja
Publication of JPH10261570A5 publication Critical patent/JPH10261570A5/ja
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Publication of JP3832681B2 publication Critical patent/JP3832681B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP06578997A 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置 Expired - Fee Related JP3832681B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06578997A JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06578997A JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

Publications (3)

Publication Number Publication Date
JPH10261570A JPH10261570A (ja) 1998-09-29
JPH10261570A5 JPH10261570A5 (enExample) 2004-12-16
JP3832681B2 true JP3832681B2 (ja) 2006-10-11

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Family Applications (1)

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JP06578997A Expired - Fee Related JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

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JP (1) JP3832681B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19853588B4 (de) * 1998-11-20 2005-04-21 Leica Microsystems Lithography Gmbh Halteeinrichtung für ein Substrat
JP2008012648A (ja) * 2006-07-10 2008-01-24 Dainippon Printing Co Ltd 加工装置
JP5286308B2 (ja) * 2010-02-26 2013-09-11 株式会社日立ハイテクノロジーズ 試料ステージおよび荷電粒子線装置
JP5641210B2 (ja) * 2010-09-03 2014-12-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
WO2012134290A1 (en) * 2011-03-30 2012-10-04 Mapper Lithography Ip B.V. Lithography system with differential interferometer module
CN103454862B (zh) * 2012-06-05 2015-11-18 上海微电子装备有限公司 用于光刻设备的工件台位置误差补偿方法
JP6105901B2 (ja) * 2012-11-08 2017-03-29 キヤノン株式会社 ステージ装置及びその調整方法、露光装置並びにデバイス製造方法

Also Published As

Publication number Publication date
JPH10261570A (ja) 1998-09-29

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