JPH10261570A5 - - Google Patents
Info
- Publication number
- JPH10261570A5 JPH10261570A5 JP1997065789A JP6578997A JPH10261570A5 JP H10261570 A5 JPH10261570 A5 JP H10261570A5 JP 1997065789 A JP1997065789 A JP 1997065789A JP 6578997 A JP6578997 A JP 6578997A JP H10261570 A5 JPH10261570 A5 JP H10261570A5
- Authority
- JP
- Japan
- Prior art keywords
- light beam
- movable stage
- stage
- detection system
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06578997A JP3832681B2 (ja) | 1997-03-19 | 1997-03-19 | ステージ装置及び該装置を備えた露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06578997A JP3832681B2 (ja) | 1997-03-19 | 1997-03-19 | ステージ装置及び該装置を備えた露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10261570A JPH10261570A (ja) | 1998-09-29 |
| JPH10261570A5 true JPH10261570A5 (enExample) | 2004-12-16 |
| JP3832681B2 JP3832681B2 (ja) | 2006-10-11 |
Family
ID=13297159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06578997A Expired - Fee Related JP3832681B2 (ja) | 1997-03-19 | 1997-03-19 | ステージ装置及び該装置を備えた露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3832681B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19853588B4 (de) * | 1998-11-20 | 2005-04-21 | Leica Microsystems Lithography Gmbh | Halteeinrichtung für ein Substrat |
| JP2008012648A (ja) * | 2006-07-10 | 2008-01-24 | Dainippon Printing Co Ltd | 加工装置 |
| JP5286308B2 (ja) * | 2010-02-26 | 2013-09-11 | 株式会社日立ハイテクノロジーズ | 試料ステージおよび荷電粒子線装置 |
| JP5641210B2 (ja) * | 2010-09-03 | 2014-12-17 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
| US9261800B2 (en) * | 2011-03-30 | 2016-02-16 | Mapper Lithography Ip B.V. | Alignment of an interferometer module for use in an exposure tool |
| CN103454862B (zh) * | 2012-06-05 | 2015-11-18 | 上海微电子装备有限公司 | 用于光刻设备的工件台位置误差补偿方法 |
| JP6105901B2 (ja) | 2012-11-08 | 2017-03-29 | キヤノン株式会社 | ステージ装置及びその調整方法、露光装置並びにデバイス製造方法 |
-
1997
- 1997-03-19 JP JP06578997A patent/JP3832681B2/ja not_active Expired - Fee Related
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