JPH10261570A5 - - Google Patents

Info

Publication number
JPH10261570A5
JPH10261570A5 JP1997065789A JP6578997A JPH10261570A5 JP H10261570 A5 JPH10261570 A5 JP H10261570A5 JP 1997065789 A JP1997065789 A JP 1997065789A JP 6578997 A JP6578997 A JP 6578997A JP H10261570 A5 JPH10261570 A5 JP H10261570A5
Authority
JP
Japan
Prior art keywords
light beam
movable stage
stage
detection system
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997065789A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10261570A (ja
JP3832681B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP06578997A priority Critical patent/JP3832681B2/ja
Priority claimed from JP06578997A external-priority patent/JP3832681B2/ja
Publication of JPH10261570A publication Critical patent/JPH10261570A/ja
Publication of JPH10261570A5 publication Critical patent/JPH10261570A5/ja
Application granted granted Critical
Publication of JP3832681B2 publication Critical patent/JP3832681B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP06578997A 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置 Expired - Fee Related JP3832681B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06578997A JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06578997A JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

Publications (3)

Publication Number Publication Date
JPH10261570A JPH10261570A (ja) 1998-09-29
JPH10261570A5 true JPH10261570A5 (enExample) 2004-12-16
JP3832681B2 JP3832681B2 (ja) 2006-10-11

Family

ID=13297159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06578997A Expired - Fee Related JP3832681B2 (ja) 1997-03-19 1997-03-19 ステージ装置及び該装置を備えた露光装置

Country Status (1)

Country Link
JP (1) JP3832681B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19853588B4 (de) * 1998-11-20 2005-04-21 Leica Microsystems Lithography Gmbh Halteeinrichtung für ein Substrat
JP2008012648A (ja) * 2006-07-10 2008-01-24 Dainippon Printing Co Ltd 加工装置
JP5286308B2 (ja) * 2010-02-26 2013-09-11 株式会社日立ハイテクノロジーズ 試料ステージおよび荷電粒子線装置
JP5641210B2 (ja) * 2010-09-03 2014-12-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US9261800B2 (en) * 2011-03-30 2016-02-16 Mapper Lithography Ip B.V. Alignment of an interferometer module for use in an exposure tool
CN103454862B (zh) * 2012-06-05 2015-11-18 上海微电子装备有限公司 用于光刻设备的工件台位置误差补偿方法
JP6105901B2 (ja) 2012-11-08 2017-03-29 キヤノン株式会社 ステージ装置及びその調整方法、露光装置並びにデバイス製造方法

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