JP3785418B1 - フッ酸生成装置及びフッ酸生成方法 - Google Patents

フッ酸生成装置及びフッ酸生成方法 Download PDF

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Publication number
JP3785418B1
JP3785418B1 JP2005191784A JP2005191784A JP3785418B1 JP 3785418 B1 JP3785418 B1 JP 3785418B1 JP 2005191784 A JP2005191784 A JP 2005191784A JP 2005191784 A JP2005191784 A JP 2005191784A JP 3785418 B1 JP3785418 B1 JP 3785418B1
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Japan
Prior art keywords
hydrofluoric acid
adsorbent
acid
distillation
silicon dioxide
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Active
Application number
JP2005191784A
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English (en)
Japanese (ja)
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JP2008094630A (ja
Inventor
治一 仲喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAKAIKOUHAN CO.,LTD.
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SAKAIKOUHAN CO.,LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by SAKAIKOUHAN CO.,LTD. filed Critical SAKAIKOUHAN CO.,LTD.
Priority to JP2005191784A priority Critical patent/JP3785418B1/ja
Application granted granted Critical
Publication of JP3785418B1 publication Critical patent/JP3785418B1/ja
Priority to CN2006800203029A priority patent/CN101277899B/zh
Priority to PCT/JP2006/313008 priority patent/WO2007004516A1/ja
Priority to KR1020077027107A priority patent/KR100987041B1/ko
Publication of JP2008094630A publication Critical patent/JP2008094630A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14Fractional distillation or use of a fractionation or rectification column
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/19Fluorine; Hydrogen fluoride
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/009Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in combination with chemical reactions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D5/00Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0003Condensation of vapours; Recovering volatile solvents by condensation by using heat-exchange surfaces for indirect contact between gases or vapours and the cooling medium
    • B01D5/0006Coils or serpentines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D5/00Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0057Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes
    • B01D5/006Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes with evaporation or distillation
    • B01D5/0063Reflux condensation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/19Fluorine; Hydrogen fluoride
    • C01B7/191Hydrogen fluoride
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/19Fluorine; Hydrogen fluoride
    • C01B7/20Fluorine
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • C02F1/281Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • C02F2101/12Halogens or halogen-containing compounds
    • C02F2101/14Fluorine or fluorine-containing compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/10Process efficiency

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Silicon Compounds (AREA)
  • Removal Of Specific Substances (AREA)
  • Water Treatment By Sorption (AREA)
JP2005191784A 2005-06-30 2005-06-30 フッ酸生成装置及びフッ酸生成方法 Active JP3785418B1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005191784A JP3785418B1 (ja) 2005-06-30 2005-06-30 フッ酸生成装置及びフッ酸生成方法
CN2006800203029A CN101277899B (zh) 2005-06-30 2006-06-29 氢氟酸生成装置及氢氟酸生成方法
PCT/JP2006/313008 WO2007004516A1 (ja) 2005-06-30 2006-06-29 フッ酸生成装置及びフッ酸生成方法
KR1020077027107A KR100987041B1 (ko) 2005-06-30 2006-06-29 불화수소산 생성장치 및 불화수소산 생성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005191784A JP3785418B1 (ja) 2005-06-30 2005-06-30 フッ酸生成装置及びフッ酸生成方法

Publications (2)

Publication Number Publication Date
JP3785418B1 true JP3785418B1 (ja) 2006-06-14
JP2008094630A JP2008094630A (ja) 2008-04-24

Family

ID=36635812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005191784A Active JP3785418B1 (ja) 2005-06-30 2005-06-30 フッ酸生成装置及びフッ酸生成方法

Country Status (4)

Country Link
JP (1) JP3785418B1 (ko)
KR (1) KR100987041B1 (ko)
CN (1) CN101277899B (ko)
WO (1) WO2007004516A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5143440B2 (ja) * 2007-02-01 2013-02-13 森田化学工業株式会社 フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置
JP5101121B2 (ja) * 2007-02-01 2012-12-19 森田化学工業株式会社 フッ化水素酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置
JP2010206962A (ja) * 2009-03-04 2010-09-16 Central Res Inst Of Electric Power Ind ガス絶縁電力機器の異常検出方法
CN102774813A (zh) * 2011-05-12 2012-11-14 特力生有限公司 氢氟酸制造方法
CN102515107B (zh) * 2011-10-31 2013-01-02 深圳市新星轻合金材料股份有限公司 一种无水氟化氢安全生产的零污染回收系统
CN102772911A (zh) * 2012-08-02 2012-11-14 浙江诺睿特生物科技有限公司 一种冷阱
GB2571584A (en) * 2018-03-29 2019-09-04 Vexo International Uk Ltd Fluid treatment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615266A (ja) * 1992-07-02 1994-01-25 Japan Organo Co Ltd フッ素含有廃水の濃縮方法
CN2644402Y (zh) * 2003-09-02 2004-09-29 焦作市多氟多化工有限公司 氢氟酸粗酸精制设备
JP2004345949A (ja) * 2004-05-24 2004-12-09 Matsushita Electric Ind Co Ltd フッ酸再生方法およびその装置

Also Published As

Publication number Publication date
CN101277899B (zh) 2011-02-02
CN101277899A (zh) 2008-10-01
JP2008094630A (ja) 2008-04-24
WO2007004516A1 (ja) 2007-01-11
KR20080018870A (ko) 2008-02-28
KR100987041B1 (ko) 2010-10-11

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