CN101277899B - 氢氟酸生成装置及氢氟酸生成方法 - Google Patents

氢氟酸生成装置及氢氟酸生成方法 Download PDF

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Publication number
CN101277899B
CN101277899B CN2006800203029A CN200680020302A CN101277899B CN 101277899 B CN101277899 B CN 101277899B CN 2006800203029 A CN2006800203029 A CN 2006800203029A CN 200680020302 A CN200680020302 A CN 200680020302A CN 101277899 B CN101277899 B CN 101277899B
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CN
China
Prior art keywords
hydrofluoric acid
acid
distillation
hexafluorosilicic
sorbent material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006800203029A
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English (en)
Chinese (zh)
Other versions
CN101277899A (zh
Inventor
仲喜治一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Apex Japan Inc
Sakaikouhan Co., Ltd.
Original Assignee
SAKAIKOUHAN CO Ltd
J-TOP SERVICE Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAKAIKOUHAN CO Ltd, J-TOP SERVICE Co Ltd filed Critical SAKAIKOUHAN CO Ltd
Publication of CN101277899A publication Critical patent/CN101277899A/zh
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Publication of CN101277899B publication Critical patent/CN101277899B/zh
Expired - Fee Related legal-status Critical Current
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14—Fractional distillation or use of a fractionation or rectification column
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/009—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in combination with chemical reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0003—Condensation of vapours; Recovering volatile solvents by condensation by using heat-exchange surfaces for indirect contact between gases or vapours and the cooling medium
    • B01D5/0006—Coils or serpentines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0057—Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes
    • B01D5/006—Condensation of vapours; Recovering volatile solvents by condensation in combination with other processes with evaporation or distillation
    • B01D5/0063—Reflux condensation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/12—Halogens or halogen-containing compounds
    • C02F2101/14—Fluorine or fluorine-containing compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/10—Process efficiency

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Silicon Compounds (AREA)
  • Removal Of Specific Substances (AREA)
  • Water Treatment By Sorption (AREA)
CN2006800203029A 2005-06-30 2006-06-29 氢氟酸生成装置及氢氟酸生成方法 Expired - Fee Related CN101277899B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005191784A JP3785418B1 (ja) 2005-06-30 2005-06-30 フッ酸生成装置及びフッ酸生成方法
JP191784/2005 2005-06-30
PCT/JP2006/313008 WO2007004516A1 (ja) 2005-06-30 2006-06-29 フッ酸生成装置及びフッ酸生成方法

Publications (2)

Publication Number Publication Date
CN101277899A CN101277899A (zh) 2008-10-01
CN101277899B true CN101277899B (zh) 2011-02-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800203029A Expired - Fee Related CN101277899B (zh) 2005-06-30 2006-06-29 氢氟酸生成装置及氢氟酸生成方法

Country Status (4)

Country Link
JP (1) JP3785418B1 (ko)
KR (1) KR100987041B1 (ko)
CN (1) CN101277899B (ko)
WO (1) WO2007004516A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5143440B2 (ja) * 2007-02-01 2013-02-13 森田化学工業株式会社 フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置
JP5101121B2 (ja) * 2007-02-01 2012-12-19 森田化学工業株式会社 フッ化水素酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置
JP2010206962A (ja) * 2009-03-04 2010-09-16 Central Res Inst Of Electric Power Ind ガス絶縁電力機器の異常検出方法
CN102774813A (zh) * 2011-05-12 2012-11-14 特力生有限公司 氢氟酸制造方法
CN102515107B (zh) * 2011-10-31 2013-01-02 深圳市新星轻合金材料股份有限公司 一种无水氟化氢安全生产的零污染回收系统
CN102772911A (zh) * 2012-08-02 2012-11-14 浙江诺睿特生物科技有限公司 一种冷阱
GB2571584A (en) * 2018-03-29 2019-09-04 Vexo International Uk Ltd Fluid treatment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2644402Y (zh) * 2003-09-02 2004-09-29 焦作市多氟多化工有限公司 氢氟酸粗酸精制设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615266A (ja) * 1992-07-02 1994-01-25 Japan Organo Co Ltd フッ素含有廃水の濃縮方法
JP2004345949A (ja) * 2004-05-24 2004-12-09 Matsushita Electric Ind Co Ltd フッ酸再生方法およびその装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2644402Y (zh) * 2003-09-02 2004-09-29 焦作市多氟多化工有限公司 氢氟酸粗酸精制设备

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2004-345949A 2004.12.09
JP特开平6-15266A 1994.01.25

Also Published As

Publication number Publication date
CN101277899A (zh) 2008-10-01
JP2008094630A (ja) 2008-04-24
WO2007004516A1 (ja) 2007-01-11
KR20080018870A (ko) 2008-02-28
JP3785418B1 (ja) 2006-06-14
KR100987041B1 (ko) 2010-10-11

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: JAPAN VERTEX CO., LTD.

Free format text: FORMER NAME: J-TOP SERVICE CO., LTD.

CP01 Change in the name or title of a patent holder

Address after: Osaka Japan

Co-patentee after: Sakaikouhan Co., Ltd.

Patentee after: Apex Japan Ltd

Address before: Osaka Japan

Co-patentee before: Sakaikouhan Co., Ltd.

Patentee before: J-top Service Co., Ltd.

C56 Change in the name or address of the patentee

Owner name: TOP CO., LTD.

Free format text: FORMER NAME: JAPAN VERTEX CO., LTD.

CP01 Change in the name or title of a patent holder

Address after: Osaka Japan

Patentee after: Apex Japan Inc

Patentee after: Sakaikouhan Co., Ltd.

Address before: Osaka Japan

Patentee before: Apex Japan Ltd

Patentee before: Sakaikouhan Co., Ltd.

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110202

Termination date: 20130629