JP3755690B2 - ポジ型感光性組成物 - Google Patents
ポジ型感光性組成物 Download PDFInfo
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- JP3755690B2 JP3755690B2 JP11977297A JP11977297A JP3755690B2 JP 3755690 B2 JP3755690 B2 JP 3755690B2 JP 11977297 A JP11977297 A JP 11977297A JP 11977297 A JP11977297 A JP 11977297A JP 3755690 B2 JP3755690 B2 JP 3755690B2
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Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11977297A JP3755690B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
| EP98108461A EP0877293B1 (en) | 1997-05-09 | 1998-05-08 | Positive photosensitive composition |
| DE69821049T DE69821049T2 (de) | 1997-05-09 | 1998-05-08 | Positiv arbeitende lichtempfindliche Zusammensetzung |
| KR1019980016647A KR100516702B1 (ko) | 1997-05-09 | 1998-05-09 | 포지티브감광성조성물 |
| US09/075,246 US6479209B1 (en) | 1997-05-09 | 1998-05-11 | Positive photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11977297A JP3755690B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10307397A JPH10307397A (ja) | 1998-11-17 |
| JPH10307397A5 JPH10307397A5 (enrdf_load_stackoverflow) | 2004-10-14 |
| JP3755690B2 true JP3755690B2 (ja) | 2006-03-15 |
Family
ID=14769835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11977297A Expired - Fee Related JP3755690B2 (ja) | 1997-05-09 | 1997-05-09 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3755690B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100416916B1 (ko) * | 2001-05-11 | 2004-02-05 | 학교법인 한양학원 | 실리콘 함유 고분자 화합물 및 이를 이용한 레지스트 조성물 |
| JP4300843B2 (ja) * | 2003-03-28 | 2009-07-22 | 東レ株式会社 | レジスト用樹脂の製造方法 |
| JP5377042B2 (ja) * | 2009-04-10 | 2013-12-25 | 三菱レイヨン株式会社 | レジスト用共重合体の製造方法。 |
| JP5986825B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| JP5986826B2 (ja) * | 2012-06-29 | 2016-09-06 | 株式会社ダイセル | 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| CN104379617A (zh) * | 2012-06-29 | 2015-02-25 | 株式会社大赛璐 | 高分子化合物、光致抗蚀剂用树脂组合物、及半导体的制造方法 |
-
1997
- 1997-05-09 JP JP11977297A patent/JP3755690B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10307397A (ja) | 1998-11-17 |
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