JP3667270B2 - 基板の熱処理方法およびそのための炉設備 - Google Patents

基板の熱処理方法およびそのための炉設備 Download PDF

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Publication number
JP3667270B2
JP3667270B2 JP2001314623A JP2001314623A JP3667270B2 JP 3667270 B2 JP3667270 B2 JP 3667270B2 JP 2001314623 A JP2001314623 A JP 2001314623A JP 2001314623 A JP2001314623 A JP 2001314623A JP 3667270 B2 JP3667270 B2 JP 3667270B2
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Japan
Prior art keywords
furnace
substrate
temperature
gas
loading
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Expired - Fee Related
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JP2001314623A
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Japanese (ja)
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JP2003123651A (ja
JP2003123651A5 (enExample
Inventor
直子 松田
雅教 鈴木
真登 森田
裕之 中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2001314623A priority Critical patent/JP3667270B2/ja
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Publication of JP2003123651A5 publication Critical patent/JP2003123651A5/ja
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Publication of JP3667270B2 publication Critical patent/JP3667270B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Gas-Filled Discharge Tubes (AREA)
  • Tunnel Furnaces (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Furnace Details (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
JP2001314623A 2001-10-12 2001-10-12 基板の熱処理方法およびそのための炉設備 Expired - Fee Related JP3667270B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001314623A JP3667270B2 (ja) 2001-10-12 2001-10-12 基板の熱処理方法およびそのための炉設備

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001314623A JP3667270B2 (ja) 2001-10-12 2001-10-12 基板の熱処理方法およびそのための炉設備

Publications (3)

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JP2003123651A JP2003123651A (ja) 2003-04-25
JP2003123651A5 JP2003123651A5 (enExample) 2005-03-17
JP3667270B2 true JP3667270B2 (ja) 2005-07-06

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JP2001314623A Expired - Fee Related JP3667270B2 (ja) 2001-10-12 2001-10-12 基板の熱処理方法およびそのための炉設備

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005156016A (ja) * 2003-11-26 2005-06-16 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルの焼成装置
EP1758142A1 (en) * 2004-06-18 2007-02-28 Kabushiki Kaisha Toshiba Method and equipment for manufacturing image display device
JP4915981B2 (ja) * 2005-07-14 2012-04-11 エスペック株式会社 熱処理装置
JP4897256B2 (ja) * 2005-07-26 2012-03-14 昭和鉄工株式会社 加熱炉
KR100722009B1 (ko) 2005-12-02 2007-05-25 (주)와이에스썸텍 열처리로
JP5216246B2 (ja) * 2007-06-04 2013-06-19 光洋サーモシステム株式会社 連続焼成炉
TWI508178B (zh) * 2008-07-16 2015-11-11 Tera Semicon Corp 批量式熱處理裝置
JP5468318B2 (ja) * 2009-06-29 2014-04-09 光洋サーモシステム株式会社 熱処理炉
JP5637635B2 (ja) * 2012-10-09 2014-12-10 東亜工業株式会社 多段式加熱炉システム
JP6409665B2 (ja) * 2015-04-14 2018-10-24 株式会社デンソー 加熱装置
JP6388041B2 (ja) * 2017-01-27 2018-09-12 株式会社九州日昌 加熱装置および加熱方法

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