JP3613288B2 - 露光装置用のクリーニング装置 - Google Patents

露光装置用のクリーニング装置 Download PDF

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Publication number
JP3613288B2
JP3613288B2 JP25224394A JP25224394A JP3613288B2 JP 3613288 B2 JP3613288 B2 JP 3613288B2 JP 25224394 A JP25224394 A JP 25224394A JP 25224394 A JP25224394 A JP 25224394A JP 3613288 B2 JP3613288 B2 JP 3613288B2
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JP
Japan
Prior art keywords
substrate holding
holding member
wafer
wafer holder
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25224394A
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English (en)
Japanese (ja)
Other versions
JPH08115868A (ja
Inventor
勝弥 町野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP25224394A priority Critical patent/JP3613288B2/ja
Priority to KR19950035952A priority patent/KR960015707A/ko
Publication of JPH08115868A publication Critical patent/JPH08115868A/ja
Application granted granted Critical
Publication of JP3613288B2 publication Critical patent/JP3613288B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP25224394A 1994-10-18 1994-10-18 露光装置用のクリーニング装置 Expired - Lifetime JP3613288B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP25224394A JP3613288B2 (ja) 1994-10-18 1994-10-18 露光装置用のクリーニング装置
KR19950035952A KR960015707A (enrdf_load_stackoverflow) 1994-10-18 1995-10-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25224394A JP3613288B2 (ja) 1994-10-18 1994-10-18 露光装置用のクリーニング装置

Publications (2)

Publication Number Publication Date
JPH08115868A JPH08115868A (ja) 1996-05-07
JP3613288B2 true JP3613288B2 (ja) 2005-01-26

Family

ID=17234512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25224394A Expired - Lifetime JP3613288B2 (ja) 1994-10-18 1994-10-18 露光装置用のクリーニング装置

Country Status (2)

Country Link
JP (1) JP3613288B2 (enrdf_load_stackoverflow)
KR (1) KR960015707A (enrdf_load_stackoverflow)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001319872A (ja) * 2000-03-01 2001-11-16 Nikon Corp 露光装置
KR101503992B1 (ko) 2003-04-09 2015-03-18 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
SG10201803122UA (en) 2003-04-11 2018-06-28 Nikon Corp Immersion lithography apparatus and device manufacturing method
TWI503865B (zh) 2003-05-23 2015-10-11 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101512884B1 (ko) 2004-06-09 2015-04-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP2006147776A (ja) * 2004-11-18 2006-06-08 Nikon Corp メンテナンス装置及びメンテナンス方法並びに露光装置
KR101524964B1 (ko) 2005-05-12 2015-06-01 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP4835976B2 (ja) * 2006-01-31 2011-12-14 株式会社ニコン 保持装置及び露光装置
US7894037B2 (en) 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5104280B2 (ja) * 2007-12-17 2012-12-19 株式会社ニコン クリーニング装置、クリーニング方法、露光装置、露光方法及びデバイス製造方法
TWI417980B (zh) * 2009-02-04 2013-12-01 Hoya Corp 載台清潔器、描繪裝置及基板處理裝置
NL2004153A (en) 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
JP6313585B2 (ja) * 2013-12-10 2018-04-18 キヤノン株式会社 露光装置及び物品の製造方法
JP6942562B2 (ja) 2017-08-25 2021-09-29 キヤノン株式会社 リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
KR960015707A (enrdf_load_stackoverflow) 1996-05-22
JPH08115868A (ja) 1996-05-07

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