JP3602279B2 - アクティブマトリクス型表示回路およびその作製方法 - Google Patents

アクティブマトリクス型表示回路およびその作製方法 Download PDF

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Publication number
JP3602279B2
JP3602279B2 JP30868496A JP30868496A JP3602279B2 JP 3602279 B2 JP3602279 B2 JP 3602279B2 JP 30868496 A JP30868496 A JP 30868496A JP 30868496 A JP30868496 A JP 30868496A JP 3602279 B2 JP3602279 B2 JP 3602279B2
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Japan
Prior art keywords
film
silicon nitride
nitride film
gate insulating
active layer
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Expired - Fee Related
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JP30868496A
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English (en)
Japanese (ja)
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JPH10133233A (ja
JPH10133233A5 (enExample
Inventor
舜平 山崎
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP30868496A priority Critical patent/JP3602279B2/ja
Priority to US08/962,047 priority patent/US6262438B1/en
Publication of JPH10133233A publication Critical patent/JPH10133233A/ja
Priority to US09/906,883 priority patent/US6660549B2/en
Application granted granted Critical
Publication of JP3602279B2 publication Critical patent/JP3602279B2/ja
Publication of JPH10133233A5 publication Critical patent/JPH10133233A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
JP30868496A 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法 Expired - Fee Related JP3602279B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP30868496A JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法
US08/962,047 US6262438B1 (en) 1996-11-04 1997-10-31 Active matrix type display circuit and method of manufacturing the same
US09/906,883 US6660549B2 (en) 1996-11-04 2001-07-16 Method of manufacturing an active matrix type display circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30868496A JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法

Publications (3)

Publication Number Publication Date
JPH10133233A JPH10133233A (ja) 1998-05-22
JP3602279B2 true JP3602279B2 (ja) 2004-12-15
JPH10133233A5 JPH10133233A5 (enExample) 2004-12-24

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Application Number Title Priority Date Filing Date
JP30868496A Expired - Fee Related JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法

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JP (1) JP3602279B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012864A (ja) 1998-06-22 2000-01-14 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
JP3127894B2 (ja) * 1998-07-24 2001-01-29 日本電気株式会社 アクティブマトリクス型液晶表示装置
JP4476390B2 (ja) 1998-09-04 2010-06-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7317438B2 (en) 1998-10-30 2008-01-08 Semiconductor Energy Laboratory Co., Ltd. Field sequential liquid crystal display device and driving method thereof, and head mounted display
JP2000221524A (ja) * 1999-01-29 2000-08-11 Sanyo Electric Co Ltd カラー液晶表示装置
JP4651777B2 (ja) * 1999-06-02 2011-03-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
EP1058310A3 (en) * 1999-06-02 2009-11-18 Sel Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP6111398B2 (ja) * 2011-12-20 2017-04-12 株式会社Ｊｏｌｅｄ 表示装置および電子機器
JP6063766B2 (ja) 2013-02-20 2017-01-18 株式会社ジャパンディスプレイ 半導体装置
KR102110226B1 (ko) * 2013-09-11 2020-05-14 삼성디스플레이 주식회사 표시패널 및 그 제조방법

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Publication number Publication date
JPH10133233A (ja) 1998-05-22

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