JP3595707B2 - 露光装置および露光方法 - Google Patents

露光装置および露光方法 Download PDF

Info

Publication number
JP3595707B2
JP3595707B2 JP31987698A JP31987698A JP3595707B2 JP 3595707 B2 JP3595707 B2 JP 3595707B2 JP 31987698 A JP31987698 A JP 31987698A JP 31987698 A JP31987698 A JP 31987698A JP 3595707 B2 JP3595707 B2 JP 3595707B2
Authority
JP
Japan
Prior art keywords
shot
amount
measurement
shift amount
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP31987698A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000133579A (ja
JP2000133579A5 (enExample
Inventor
慎一郎 古賀
繁行 鵜澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP31987698A priority Critical patent/JP3595707B2/ja
Priority to US09/422,100 priority patent/US6342703B1/en
Publication of JP2000133579A publication Critical patent/JP2000133579A/ja
Application granted granted Critical
Publication of JP3595707B2 publication Critical patent/JP3595707B2/ja
Publication of JP2000133579A5 publication Critical patent/JP2000133579A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP31987698A 1998-10-23 1998-10-23 露光装置および露光方法 Expired - Fee Related JP3595707B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP31987698A JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法
US09/422,100 US6342703B1 (en) 1998-10-23 1999-10-20 Exposure apparatus, exposure method, and device manufacturing method employing the exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31987698A JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法

Publications (3)

Publication Number Publication Date
JP2000133579A JP2000133579A (ja) 2000-05-12
JP3595707B2 true JP3595707B2 (ja) 2004-12-02
JP2000133579A5 JP2000133579A5 (enExample) 2004-12-09

Family

ID=18115232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31987698A Expired - Fee Related JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法

Country Status (2)

Country Link
US (1) US6342703B1 (enExample)
JP (1) JP3595707B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7106455B2 (en) 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
JP2003017386A (ja) * 2001-06-29 2003-01-17 Canon Inc 位置合わせ方法、露光方法、露光装置及びデバイスの製造方法
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
JP2004265957A (ja) * 2003-02-26 2004-09-24 Nikon Corp 最適位置検出式の検出方法、位置合わせ方法、露光方法、デバイス製造方法及びデバイス
US20050099615A1 (en) * 2003-06-03 2005-05-12 Fusao Ishii System for fabricating electronic modules on substrates having arbitrary and unexpected dimensional changes
US20050105071A1 (en) * 2003-06-03 2005-05-19 Fusao Ishii Methods for patterning substrates having arbitrary and unexpected dimensional changes
JP4603814B2 (ja) * 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
JP3962736B2 (ja) * 2004-10-08 2007-08-22 キヤノン株式会社 露光装置およびデバイス製造方法
US20090042115A1 (en) * 2007-04-10 2009-02-12 Nikon Corporation Exposure apparatus, exposure method, and electronic device manufacturing method
US20090042139A1 (en) * 2007-04-10 2009-02-12 Nikon Corporation Exposure method and electronic device manufacturing method
US20080270970A1 (en) * 2007-04-27 2008-10-30 Nikon Corporation Method for processing pattern data and method for manufacturing electronic device
US8440375B2 (en) 2007-05-29 2013-05-14 Nikon Corporation Exposure method and electronic device manufacturing method
JP5264406B2 (ja) 2008-10-22 2013-08-14 キヤノン株式会社 露光装置、露光方法およびデバイスの製造方法
JP2010103438A (ja) * 2008-10-27 2010-05-06 Canon Inc パターニング方法、露光システム、プログラム及びデバイス製造方法
CN111158220A (zh) * 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
KR102043384B1 (ko) * 2015-04-20 2019-11-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치
US12148181B2 (en) * 2020-08-28 2024-11-19 Canon Kabushiki Kaisha Measurement apparatus that measures position information of measurement target in predetermined direction

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5543921A (en) 1989-05-08 1996-08-06 Canon Kabushiki Kaisha Aligning method utilizing reliability weighting coefficients
JP2829642B2 (ja) 1989-09-29 1998-11-25 キヤノン株式会社 露光装置
US5416562A (en) * 1992-03-06 1995-05-16 Nikon Corporation Method of detecting a position and apparatus therefor
US5521036A (en) * 1992-07-27 1996-05-28 Nikon Corporation Positioning method and apparatus
JP3002351B2 (ja) 1993-02-25 2000-01-24 キヤノン株式会社 位置合わせ方法および装置
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JPH07120621A (ja) 1993-10-27 1995-05-12 Bridgestone Corp 光学素子
JPH07335524A (ja) 1994-06-06 1995-12-22 Canon Inc 位置合わせ方法
DE69521107T2 (de) 1994-11-29 2001-10-31 Canon K.K., Tokio/Tokyo Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3634487B2 (ja) 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
JP3303758B2 (ja) 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
US6285438B1 (en) * 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans

Also Published As

Publication number Publication date
JP2000133579A (ja) 2000-05-12
US6342703B1 (en) 2002-01-29

Similar Documents

Publication Publication Date Title
JP3595707B2 (ja) 露光装置および露光方法
JP3254916B2 (ja) 投影光学系のコマ収差を検出する方法
US6654096B1 (en) Exposure apparatus, and device manufacturing method
JP3634487B2 (ja) 位置合せ方法、位置合せ装置、および露光装置
JP3402750B2 (ja) 位置合わせ方法及びそれを用いた素子の製造方法
JP2007103658A (ja) 露光方法および装置ならびにデバイス製造方法
JP3445045B2 (ja) 投影露光装置及びそれを用いたデバイスの製造方法
JP2001274080A (ja) 走査型投影露光装置及びその位置合わせ方法
JP3720582B2 (ja) 投影露光装置及び投影露光方法
WO2010125813A1 (ja) 露光方法及びデバイス製造方法、並びに重ね合わせ誤差計測方法
JPH08122019A (ja) 位置計測装置、位置合わせ装置、露光装置およびデバイスの製造方法
JPH09166416A (ja) レチクルパターンの相対的位置ずれ量計測方法およびレチクルパターンの相対的位置ずれ量計測装置
JP4227470B2 (ja) 位置検出方法
JP5084432B2 (ja) 露光方法、露光装置およびデバイス製造方法
US6538260B1 (en) Position measuring method, and semiconductor device manufacturing method and apparatus using the same
JP2009170559A (ja) 露光装置およびデバイス製造方法
JP2001085321A (ja) 露光装置及び露光方法並びにマイクロデバイスの製造方法
JP2006310446A (ja) 半導体装置の製造方法、および露光装置
JP2009010139A (ja) 露光装置及びデバイス製造方法
JP3576722B2 (ja) 走査型露光装置及びそれを用いたデバイス製造方法
CN101004554A (zh) 曝光机机差的测量方法
JP3722330B2 (ja) 露光装置およびデバイス製造方法
JPH1174190A (ja) Ｘ線露光装置
JP4158418B2 (ja) レジストパターン幅寸法の調整方法
JP4677180B2 (ja) 半導体製造装置およびデバイス製造方法

Legal Events

Date Code Title Description
A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20040114

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040421

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040621

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20040825

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20040906

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070910

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080910

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090910

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090910

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100910

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100910

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110910

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110910

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120910

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120910

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130910

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees