JP2000133579A5 - - Google Patents

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Publication number
JP2000133579A5
JP2000133579A5 JP1998319876A JP31987698A JP2000133579A5 JP 2000133579 A5 JP2000133579 A5 JP 2000133579A5 JP 1998319876 A JP1998319876 A JP 1998319876A JP 31987698 A JP31987698 A JP 31987698A JP 2000133579 A5 JP2000133579 A5 JP 2000133579A5
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JP
Japan
Prior art keywords
exposure
representative point
positional deviation
position error
deviation amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998319876A
Other languages
English (en)
Japanese (ja)
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JP2000133579A (ja
JP3595707B2 (ja
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Publication date
Application filed filed Critical
Priority to JP31987698A priority Critical patent/JP3595707B2/ja
Priority claimed from JP31987698A external-priority patent/JP3595707B2/ja
Priority to US09/422,100 priority patent/US6342703B1/en
Publication of JP2000133579A publication Critical patent/JP2000133579A/ja
Application granted granted Critical
Publication of JP3595707B2 publication Critical patent/JP3595707B2/ja
Publication of JP2000133579A5 publication Critical patent/JP2000133579A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP31987698A 1998-10-23 1998-10-23 露光装置および露光方法 Expired - Fee Related JP3595707B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP31987698A JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法
US09/422,100 US6342703B1 (en) 1998-10-23 1999-10-20 Exposure apparatus, exposure method, and device manufacturing method employing the exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31987698A JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法

Publications (3)

Publication Number Publication Date
JP2000133579A JP2000133579A (ja) 2000-05-12
JP3595707B2 JP3595707B2 (ja) 2004-12-02
JP2000133579A5 true JP2000133579A5 (enExample) 2004-12-09

Family

ID=18115232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31987698A Expired - Fee Related JP3595707B2 (ja) 1998-10-23 1998-10-23 露光装置および露光方法

Country Status (2)

Country Link
US (1) US6342703B1 (enExample)
JP (1) JP3595707B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7106455B2 (en) 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
JP2003017386A (ja) * 2001-06-29 2003-01-17 Canon Inc 位置合わせ方法、露光方法、露光装置及びデバイスの製造方法
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
JP2004265957A (ja) * 2003-02-26 2004-09-24 Nikon Corp 最適位置検出式の検出方法、位置合わせ方法、露光方法、デバイス製造方法及びデバイス
US20050099615A1 (en) * 2003-06-03 2005-05-12 Fusao Ishii System for fabricating electronic modules on substrates having arbitrary and unexpected dimensional changes
US20050105071A1 (en) * 2003-06-03 2005-05-19 Fusao Ishii Methods for patterning substrates having arbitrary and unexpected dimensional changes
JP4603814B2 (ja) * 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
JP3962736B2 (ja) * 2004-10-08 2007-08-22 キヤノン株式会社 露光装置およびデバイス製造方法
US20090042115A1 (en) * 2007-04-10 2009-02-12 Nikon Corporation Exposure apparatus, exposure method, and electronic device manufacturing method
US20090042139A1 (en) * 2007-04-10 2009-02-12 Nikon Corporation Exposure method and electronic device manufacturing method
US20080270970A1 (en) * 2007-04-27 2008-10-30 Nikon Corporation Method for processing pattern data and method for manufacturing electronic device
US8440375B2 (en) 2007-05-29 2013-05-14 Nikon Corporation Exposure method and electronic device manufacturing method
JP5264406B2 (ja) 2008-10-22 2013-08-14 キヤノン株式会社 露光装置、露光方法およびデバイスの製造方法
JP2010103438A (ja) * 2008-10-27 2010-05-06 Canon Inc パターニング方法、露光システム、プログラム及びデバイス製造方法
CN111158220A (zh) * 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
KR102043384B1 (ko) * 2015-04-20 2019-11-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치
US12148181B2 (en) * 2020-08-28 2024-11-19 Canon Kabushiki Kaisha Measurement apparatus that measures position information of measurement target in predetermined direction

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5543921A (en) 1989-05-08 1996-08-06 Canon Kabushiki Kaisha Aligning method utilizing reliability weighting coefficients
JP2829642B2 (ja) 1989-09-29 1998-11-25 キヤノン株式会社 露光装置
US5416562A (en) * 1992-03-06 1995-05-16 Nikon Corporation Method of detecting a position and apparatus therefor
US5521036A (en) * 1992-07-27 1996-05-28 Nikon Corporation Positioning method and apparatus
JP3002351B2 (ja) 1993-02-25 2000-01-24 キヤノン株式会社 位置合わせ方法および装置
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JPH07120621A (ja) 1993-10-27 1995-05-12 Bridgestone Corp 光学素子
JPH07335524A (ja) 1994-06-06 1995-12-22 Canon Inc 位置合わせ方法
DE69521107T2 (de) 1994-11-29 2001-10-31 Canon K.K., Tokio/Tokyo Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3634487B2 (ja) 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
JP3303758B2 (ja) 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
US6285438B1 (en) * 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans

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