JP2000260689A5 - - Google Patents

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Publication number
JP2000260689A5
JP2000260689A5 JP1999060708A JP6070899A JP2000260689A5 JP 2000260689 A5 JP2000260689 A5 JP 2000260689A5 JP 1999060708 A JP1999060708 A JP 1999060708A JP 6070899 A JP6070899 A JP 6070899A JP 2000260689 A5 JP2000260689 A5 JP 2000260689A5
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JP
Japan
Prior art keywords
magnification
linear error
pattern
exposure
exposure apparatus
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Application number
JP1999060708A
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English (en)
Japanese (ja)
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JP3929635B2 (ja
JP2000260689A (ja
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Publication date
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Priority to JP06070899A priority Critical patent/JP3929635B2/ja
Priority claimed from JP06070899A external-priority patent/JP3929635B2/ja
Priority to US09/520,630 priority patent/US6542237B1/en
Publication of JP2000260689A publication Critical patent/JP2000260689A/ja
Publication of JP2000260689A5 publication Critical patent/JP2000260689A5/ja
Application granted granted Critical
Publication of JP3929635B2 publication Critical patent/JP3929635B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP06070899A 1999-03-08 1999-03-08 露光方法 Expired - Fee Related JP3929635B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP06070899A JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法
US09/520,630 US6542237B1 (en) 1999-03-08 2000-03-07 Exposure method for making precision patterns on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06070899A JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法

Publications (3)

Publication Number Publication Date
JP2000260689A JP2000260689A (ja) 2000-09-22
JP2000260689A5 true JP2000260689A5 (enExample) 2005-06-30
JP3929635B2 JP3929635B2 (ja) 2007-06-13

Family

ID=13150070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06070899A Expired - Fee Related JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法

Country Status (2)

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US (1) US6542237B1 (enExample)
JP (1) JP3929635B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002224604A (ja) * 2001-01-31 2002-08-13 Hitachi Ltd パターン転写装置，パターン転写方法および転写用原版の製造方法
US7171637B2 (en) * 2005-01-14 2007-01-30 Intel Corporation Translation generation for a mask pattern
JP2017090817A (ja) * 2015-11-16 2017-05-25 キヤノン株式会社 露光装置、及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918320A (en) 1987-03-20 1990-04-17 Canon Kabushiki Kaisha Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment
US5243195A (en) * 1991-04-25 1993-09-07 Nikon Corporation Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
US5798195A (en) * 1993-09-24 1998-08-25 Nikon Corporation Stepping accuracy measuring method
KR100377887B1 (ko) * 1994-02-10 2003-06-18 가부시키가이샤 니콘 정렬방법
JPH07260472A (ja) * 1994-03-22 1995-10-13 Nikon Corp ステージ装置の直交度測定方法
JPH0845814A (ja) * 1994-07-27 1996-02-16 Nikon Corp 露光装置および位置決め方法
JP3261948B2 (ja) * 1995-03-28 2002-03-04 キヤノン株式会社 Ｘ線露光用マスク及びそれを用いた半導体素子の製造方法
KR100471461B1 (ko) * 1996-05-16 2005-07-07 가부시키가이샤 니콘 노광방법및노광장치
WO2000019497A1 (en) * 1998-09-30 2000-04-06 Nikon Corporation Alignment method and method for producing device using the alignment method
JP3751762B2 (ja) * 1998-12-08 2006-03-01 株式会社東芝 半導体装置の製造方法および原板
JP3831138B2 (ja) * 1999-01-28 2006-10-11 株式会社東芝 パターン形成方法

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